公开(公告)号：US06729935B2

公开(公告)日：2004-05-04

申请号：US10170674

申请日：2002-06-13

申请人： Shang-Ting Tsai ,  Ping Chuang ,  Henry Lo ,  Chao-Jung Chang ,  Ping-Hsu Chen ,  Yu-Liang Lin ,  Yu-Huei Chen ,  Ai-Sen Liu ,  Syun-Ming Jang

发明人： Shang-Ting Tsai ,  Ping Chuang ,  Henry Lo ,  Chao-Jung Chang ,  Ping-Hsu Chen ,  Yu-Liang Lin ,  Yu-Huei Chen ,  Ai-Sen Liu ,  Syun-Ming Jang

IPC分类号： B24B4900

CPC分类号： B24B57/02 ,  B24B37/042 ,  B24B49/12

摘要： A method and system for monitoring the quality of a slurry utilized in a chemical mechanical polishing operation. A slurry is generally delivered through a tubular path during a chemical mechanical polishing operation. A laser light is generally transmitted from a laser light source, such that the laser light comes into contact with the slurry during the chemical mechanical polishing operation. The laser light can then be detected, after the laser light comes into contact with the slurry to thereby monitor the quality of the slurry utilized during the chemical mechanical polishing operation. The laser light that comes into contact with the slurry can be also be utilized to monitor a mixing ratio associated with the slurry.

公开(公告)号：US06860723B2

公开(公告)日：2005-03-01

申请号：US10264404

申请日：2002-10-09

申请人： Ben-Shu Chen ,  Chao-Jung Chang ,  Jui-Cheng Lo ,  Chin-Hsin Peng ,  Chien-Kuo Lu

发明人： Ben-Shu Chen ,  Chao-Jung Chang ,  Jui-Cheng Lo ,  Chin-Hsin Peng ,  Chien-Kuo Lu

IPC分类号： F04B49/20 ,  F04B49/00

CPC分类号： F04B49/20 ,  F04B2205/09

摘要： A system for controlling and monitoring a rate of flow of a fluid, such as a CMP slurry, comprising a pump for pumping the slurry; a flow meter for monitoring the rate of flow of the slurry; and a controller operably connected to the flow meter and the pump. The controller receives signals from the flow meter indicating the rate of flow of the slurry and controls the operational speed of the pump responsive to the flow meter signals. A degasser equipped with a level sensor may be further provided in the system for removing gas bubbles from the slurry.

摘要翻译： 一种用于控制和监测诸如CMP浆料的流体流速的系统，包括用于泵送浆料的泵; 用于监测浆料流速的流量计; 以及可操作地连接到流量计和泵的控制器。 控制器从流量计接收指示泥浆流量的信号，并根据流量计信号控制泵的操作速度。 可以在系统中进一步设置装备有液位传感器的脱气机，以从浆料中除去气泡。

公开(公告)号：US20050202763A1

公开(公告)日：2005-09-15

申请号：US10797315

申请日：2004-03-09

申请人： Ping-Hsu Chen ,  Chao-Jung Chang ,  Jui-Cheng Lo ,  Yu-Liang Lin ,  Shang-Ting Tsai ,  Ping Chuang

发明人： Ping-Hsu Chen ,  Chao-Jung Chang ,  Jui-Cheng Lo ,  Yu-Liang Lin ,  Shang-Ting Tsai ,  Ping Chuang

IPC分类号： B24B1/00

CPC分类号： B24B57/02 ,  B24B37/044

摘要： A method and system for delivering a mixed slurry for use chemical mechanical polishing operation. A first slurry may be mixed with a second slurry to provide a mixed slurry thereof. A flow rate and a mixing ratio associated with the mixed slurry can be controlled to provide an accurate flow rate control and adjustable mixing ratio thereof. The first slurry and the second slurry may be mixed in-line utilizing an in-line mixing mechanism to provide a mixed slurry thereof. Alternatively, the first and second slurries may be pre-mixed utilizing a pre-mixing mechanism to provide a mixed slurry there.

摘要翻译： 一种用于输送用于化学机械抛光操作的混合浆料的方法和系统。 可以将第一浆料与第二浆料混合以提供其混合浆料。 可以控制与混合浆料相关的流速和混合比，以提供精确的流速控制和可调混合比。 可以使用在线混合机构将第一浆料和第二浆料在线混合以提供其混合浆料。 或者，第一和第二浆料可以使用预混合机构预混合以在其中提供混合浆料。

公开(公告)号：US06926584B2

公开(公告)日：2005-08-09

申请号：US10267614

申请日：2002-10-09

申请人： Chao-Jung Chang ,  Ping-Hsu Chen ,  Chin-Hsin Peng ,  Jui-Cheng Lo ,  Chien-Kuo Lu ,  Chien-Ling Huang

发明人： Chao-Jung Chang ,  Ping-Hsu Chen ,  Chin-Hsin Peng ,  Jui-Cheng Lo ,  Chien-Kuo Lu ,  Chien-Ling Huang

IPC分类号： B24B37/04 ,  B24B57/02 ,  B24B49/00

CPC分类号： B24B37/04 ,  B24B57/02

摘要： A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.

摘要翻译： 一种DMHC（双模式混合控制）系统和方法，其有助于增强抛光浆料输送到CMP（化学机械抛光）装置中的控制。 DMHC包括线性工作台和可操作地连接到浆料泵的PID（比例积分微分）控制器，所述浆料泵设置在将抛光浆料输送到CMP设备的浆料流动管道中。 设置在泥浆泵下游的泥浆流动管道中的气泡阱和流量计可操作地连接到PID控制器，并且CMP设备位于流量计的下游。

公开(公告)号：US06884149B2

公开(公告)日：2005-04-26

申请号：US10833720

申请日：2004-04-27

申请人： Shang-Ting Tsai ,  Ping Chuang ,  Henry Lo ,  Chao-Jung Chang ,  Ping-Hsu Chen ,  Yu-Liang Lin ,  Yu-Huei Chen ,  Ai-Sen Liu ,  Syun-Ming Jang

发明人： Shang-Ting Tsai ,  Ping Chuang ,  Henry Lo ,  Chao-Jung Chang ,  Ping-Hsu Chen ,  Yu-Liang Lin ,  Yu-Huei Chen ,  Ai-Sen Liu ,  Syun-Ming Jang

IPC分类号： B24B37/04 ,  B24B49/12 ,  B24B1/00

CPC分类号： B24B57/02 ,  B24B37/042 ,  B24B49/12

摘要： A method and system for monitoring the quality of a slurry utilized in a chemical mechanical polishing operation. A slurry is generally delivered through a tubular path during a chemical mechanical polishing operation. A laser light is generally transmitted from a laser light source, such that the laser light comes into contact with the slurry during the chemical mechanical polishing operation. The laser light can then be detected, after the laser light comes into contact with the slurry to thereby monitor the quality of the slurry utilized during the chemical mechanical polishing operation. The laser light that comes into contact with the slurry can be also be utilized to monitor a mixing ratio associated with the slurry.

摘要翻译： 一种用于监测在化学机械抛光操作中使用的浆料的质量的方法和系统。 在化学机械抛光操作期间，浆料通常通过管状路径输送。 激光通常从激光源传输，使得激光在化学机械抛光操作期间与浆料接触。 然后可以在激光与浆料接触之后检测激光，从而监测在化学机械抛光操作期间所利用的浆料的质量。 与浆料接触的激光也可用于监测与浆料相关的混合比例。