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    Particle detector
    1.
    发明授权
    Particle detector 有权
    粒子检测器

    公开(公告)号：US07714299B2

    公开(公告)日：2010-05-11

    申请号：US11501142

    申请日：2006-08-08

    申请人： Yi-Sheng Wang ,  Shang-Ting Tsai

    发明人： Yi-Sheng Wang ,  Shang-Ting Tsai

    IPC分类号： H01J37/244

    CPC分类号： G01T1/362 ,  H01J49/025 ,  H01J2237/244

    摘要： A particle detector for detecting a particle beam includes a negatively charged electrode plate having a first side facing the particle beam, a second side opposite to the first side, and a through-hole extending from the first side to the second side for receiving the particle beam. A detection device adjacent to the second side of the electrode plate detects signals corresponding to the particle beam approaching the through-hole.

    摘要翻译： 用于检测粒子束的粒子检测器包括具有面向粒子束的第一侧的带负电荷的电极板，与第一侧相对的第二侧，以及从第一侧延伸到第二侧的用于接收粒子的通孔 光束。 与电极板的第二侧相邻的检测装置检测与接近通孔的粒子束相对应的信号。

    Method to solve alignment mark blinded issues and technology for application of semiconductor etching at a tiny area
    2.
    发明授权
    Method to solve alignment mark blinded issues and technology for application of semiconductor etching at a tiny area 有权
    解决对准标记盲法问题的方法和在微小区域应用半导体蚀刻技术

    公开(公告)号：US07125521B2

    公开(公告)日：2006-10-24

    申请号：US10831894

    申请日：2004-04-26

    申请人： Chung-Long Chang ,  Jui-Cheng Lo ,  Shang-Ting Tsai ,  Yu-Liang Lin

    发明人： Chung-Long Chang ,  Jui-Cheng Lo ,  Shang-Ting Tsai ,  Yu-Liang Lin

    IPC分类号： B01L3/02 ,  G01N1/10 ,  G01N1/32

    CPC分类号： H01L21/31111 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084

    摘要： A method of unblinding an alignment mark comprising the following steps. A substrate having a cell area and an alignment mark within an alignment area is provided. An STI trench is formed into the substrate within the cell area. A silicon oxide layer is formed over the substrate, filling the STI trench and the alignment mark. The silicon oxide layer is planarized to form a planarized STI within the STI trench and leaving silicon oxide within the alignment mark to form a blinded alignment mark. A wet chemical etchant is applied within the alignment mark area over the blinded alignment mark to at least partially remove the silicon oxide within the alignment mark. The remaining silicon oxide is removed from within the blinded alignment mark to unblind the alignment mark. A drop etcher apparatus is also disclosed.

    摘要翻译： 一种解开对准标记的方法，包括以下步骤。 提供了在对准区域内具有单元区域和对准标记的基板。 在沟槽区内形成STI沟槽。 在衬底上形成氧化硅层，填充STI沟槽和对准标记。 将氧化硅层平坦化以在STI沟槽内形成平坦化的STI，并使对准标记内的氧化硅形成盲目的对准标记。 湿法化学蚀刻剂施加在对准标记区域内的盲目对准标记上，以至少部分地去除对准标记内的氧化硅。 剩余的氧化硅从盲目的对准标记中移除，以对准对准标记。 还公开了一种滴蚀蚀刻装置。

    Dual-polarity mass spectrometer
    3.
    发明授权
    Dual-polarity mass spectrometer 有权
    双极性质谱仪

    公开(公告)号：US07649170B2

    公开(公告)日：2010-01-19

    申请号：US11542568

    申请日：2006-10-03

    申请人： Yi-Sheng Wang ,  Chung-Hsuan Chen ,  Shang-Ting Tsai ,  Chiu Wen Chen

    发明人： Yi-Sheng Wang ,  Chung-Hsuan Chen ,  Shang-Ting Tsai ,  Chiu Wen Chen

    IPC分类号： H01J49/10

    CPC分类号： H01J49/40 ,  H01J49/0095

    摘要： A dual-polarity mass spectrometer includes an ion source, a negative ion mass analyzer, and a positive ion mass analyzer to measure both the negative and positive ion spectra of a sample material simultaneously. The ion source includes a sample surface on which the sample material is positioned, the sample material providing positive ions and negative ions when excited by a laser beam or an energetic particle stream. A first extraction electrode is connected to a voltage higher than the sample surface to attract the negative ions from the sample electrode. A second extraction electrode is connected to a voltage lower than the sample surface to attract the positive ions from the sample electrode. The negative and positive ions are analyzed simultaneously by the negative ion mass analyzer and the positive ion mass analyzer, respectively.

    摘要翻译： 双极性质谱仪包括离子源，负离子质量分析仪和正离子质量分析仪，以同时测量样品材料的负离子和正离子光谱。 离子源包括其上放置样品材料的样品表面，当由激光束或能量粒子流激发时，样品材料提供正离子和负离子。 第一引出电极连接到高于样品表面的电压以吸引来自样品电极的负离子。 第二提取电极连接到低于样品表面的电压，以吸引来自样品电极的正离子。 负离子和正离子分别通过负离子质量分析仪和正离子质量分析仪同时分析。

    Dual-polarity mass spectrometer
    6.
    发明申请
    Dual-polarity mass spectrometer 有权
    双极性质谱仪

    公开(公告)号：US20080078928A1

    公开(公告)日：2008-04-03

    申请号：US11542568

    申请日：2006-10-03

    申请人： Yi-Sheng Wang ,  Chung-Hsuan Chen ,  Shang-Ting Tsai ,  Chiu Wen Chen

    发明人： Yi-Sheng Wang ,  Chung-Hsuan Chen ,  Shang-Ting Tsai ,  Chiu Wen Chen

    IPC分类号： H01J49/40

    CPC分类号： H01J49/40 ,  H01J49/0095

    摘要： A dual-polarity mass spectrometer includes an ion source, a negative ion mass analyzer, and a positive ion mass analyzer to measure both the negative and positive ion spectra of a sample material simultaneously. The ion source includes a sample surface on which the sample material is positioned, the sample material providing positive ions and negative ions when excited by a laser beam or an energetic particle stream. A first extraction electrode is connected to a voltage higher than the sample surface to attract the negative ions from the sample electrode. A second extraction electrode is connected to a voltage lower than the sample surface to attract the positive ions from the sample electrode. The negative and positive ions are analyzed simultaneously by the negative ion mass analyzer and the positive ion mass analyzer, respectively.

    摘要翻译： 双极性质谱仪包括离子源，负离子质量分析仪和正离子质量分析仪，以同时测量样品材料的负离子和正离子光谱。 离子源包括其上放置样品材料的样品表面，当由激光束或能量粒子流激发时，样品材料提供正离子和负离子。 第一引出电极连接到高于样品表面的电压以吸引来自样品电极的负离子。 第二提取电极连接到低于样品表面的电压，以吸引来自样品电极的正离子。 负离子和正离子分别通过负离子质量分析仪和正离子质量分析仪同时分析。

    Particle detector
    7.
    发明申请
    Particle detector 有权
    粒子检测器

    公开(公告)号：US20080035855A1

    公开(公告)日：2008-02-14

    申请号：US11501142

    申请日：2006-08-08

    申请人： Yi-Sheng Wang ,  Shang-Ting Tsai

    发明人： Yi-Sheng Wang ,  Shang-Ting Tsai

    IPC分类号： H01J37/244

    CPC分类号： G01T1/362 ,  H01J49/025 ,  H01J2237/244

    摘要： A particle detector for detecting a particle beam includes a negatively charged electrode plate having a first side facing the particle beam, a second side opposite to the first side, and a through-hole extending from the first side to the second side for receiving the particle beam. A detection device adjacent to the second side of the electrode plate detects signals corresponding to the particle beam approaching the through-hole.

    摘要翻译： 用于检测粒子束的粒子检测器包括具有面向粒子束的第一侧的带负电荷的电极板，与第一侧相对的第二侧，以及从第一侧延伸到第二侧的用于接收粒子的通孔 光束。 与电极板的第二侧相邻的检测装置检测与接近通孔的粒子束相对应的信号。

    Multi-function slurry delivery system
    8.
    发明申请
    Multi-function slurry delivery system 审中-公开
    多功能浆料输送系统

    公开(公告)号：US20050202763A1

    公开(公告)日：2005-09-15

    申请号：US10797315

    申请日：2004-03-09

    申请人： Ping-Hsu Chen ,  Chao-Jung Chang ,  Jui-Cheng Lo ,  Yu-Liang Lin ,  Shang-Ting Tsai ,  Ping Chuang

    发明人： Ping-Hsu Chen ,  Chao-Jung Chang ,  Jui-Cheng Lo ,  Yu-Liang Lin ,  Shang-Ting Tsai ,  Ping Chuang

    IPC分类号： B24B1/00

    CPC分类号： B24B57/02 ,  B24B37/044

    摘要： A method and system for delivering a mixed slurry for use chemical mechanical polishing operation. A first slurry may be mixed with a second slurry to provide a mixed slurry thereof. A flow rate and a mixing ratio associated with the mixed slurry can be controlled to provide an accurate flow rate control and adjustable mixing ratio thereof. The first slurry and the second slurry may be mixed in-line utilizing an in-line mixing mechanism to provide a mixed slurry thereof. Alternatively, the first and second slurries may be pre-mixed utilizing a pre-mixing mechanism to provide a mixed slurry there.

    摘要翻译： 一种用于输送用于化学机械抛光操作的混合浆料的方法和系统。 可以将第一浆料与第二浆料混合以提供其混合浆料。 可以控制与混合浆料相关的流速和混合比，以提供精确的流速控制和可调混合比。 可以使用在线混合机构将第一浆料和第二浆料在线混合以提供其混合浆料。 或者，第一和第二浆料可以使用预混合机构预混合以在其中提供混合浆料。

    Method to solve alignment mark blinded issues and a technology for application of semiconductor etching at a tiny area
    9.
    发明授权
    Method to solve alignment mark blinded issues and a technology for application of semiconductor etching at a tiny area 失效
    解决对准标记盲目问题的方法和在微小区域应用半导体蚀刻技术

    公开(公告)号：US06746966B1

    公开(公告)日：2004-06-08

    申请号：US10353229

    申请日：2003-01-28

    申请人： Chung-Long Chang ,  Henry Lo ,  Shang-Ting Tsai ,  Yu-Liang Lin

    发明人： Chung-Long Chang ,  Henry Lo ,  Shang-Ting Tsai ,  Yu-Liang Lin

    IPC分类号： H01L21302

    CPC分类号： H01L21/31111 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084

    摘要： A method of unblinding an alignment mark comprising the following steps. A substrate having a cell area and an alignment mark within an alignment area is provided. An STI trench is formed into the substrate within the cell area. A silicon oxide layer is formed over the substrate, filling the STI trench and the alignment mark. The silicon oxide layer is planarized to form a planarized STI within the STI trench and leaving silicon oxide within the alignment mark to form a blinded alignment mark. A wet chemical etchant is applied within the alignment mark area over the blinded alignment mark to at least partially remove the silicon oxide within the alignment mark. The remaining silicon oxide is removed from within the blinded alignment mark to unblind the alignment mark. A drop etcher apparatus is also disclosed.

    摘要翻译： 一种解开对准标记的方法，包括以下步骤。 提供了在对准区域内具有单元区域和对准标记的基板。 在沟槽区内形成STI沟槽。 在衬底上形成氧化硅层，填充STI沟槽和对准标记。 将氧化硅层平坦化以在STI沟槽内形成平坦化的STI，并使对准标记内的氧化硅形成盲目的对准标记。 湿法化学蚀刻剂施加在对准标记区域内的盲目对准标记上，以至少部分地去除对准标记内的氧化硅。 剩余的氧化硅从盲目的对准标记中移除，以对准对准标记。 还公开了一种滴蚀蚀刻装置。