BACKLIGHT MODULE
    1.
    发明申请
    BACKLIGHT MODULE 有权
    背光模组

    公开(公告)号:US20130336002A1

    公开(公告)日:2013-12-19

    申请号:US13523636

    申请日:2012-06-14

    CPC classification number: G02B6/0021 G02B6/0033

    Abstract: A backlight module has a light guide plate, a notch structure, a light absorption layer, and at least one light source. The light guide plate has a light-emitting surface and at least one side surface forming an angle with the light-emitting surface. The notch structure is continuously formed on the side surface and concave towards the inside of the light guide plate. The light absorption layer is distributed on an area substantially overlapping the notch structure, and the light source is stored in the notch structure.

    Abstract translation: 背光模块具有导光板,凹口结构,光吸收层和至少一个光源。 导光板具有发光面和与发光面形成一定角度的至少一个侧面。 凹口结构在侧表面上连续地形成,并且朝向导光板的内侧凹陷。 光吸收层分布在基本上与切口结构重叠的区域上,光源被存储在凹口结构中。

    Washing apparatus with bubbling reaction and a washing method of using bubbling reaction
    3.
    发明申请
    Washing apparatus with bubbling reaction and a washing method of using bubbling reaction 审中-公开
    具有鼓泡反应的洗涤装置和使用鼓泡反应的洗涤方法

    公开(公告)号:US20070131254A1

    公开(公告)日:2007-06-14

    申请号:US11417032

    申请日:2006-05-04

    CPC classification number: B08B3/10 B08B3/08 B08B3/102 G03F7/423 H01L21/67057

    Abstract: The present invention relates to a washing apparatus with bubbling reaction and a washing method of using bubbling reaction which are based on compression technology of an interface diffusion layer with bubbling, by the aid of using a bubble wall generated by a pneumatic means as a reaction interface in a gas-liquid-solid heterogeneous system and utilizing a pulling force generated by bubbles when climbing up along the surface of a material to be washed, to compress thickness of the liquid-solid interface and optimize mass transfer efficiency in multiphase that can remove organic matter from the material surface.

    Abstract translation: 本发明涉及一种具有鼓泡反应的洗涤装置和使用鼓泡反应的洗涤方法,该方法基于通过鼓泡的界面扩散层的压缩技术,借助于使用由气动装置产生的气泡壁作为反应界面 在气 - 液 - 固体异质系统中,当沿着待洗涤材料的表面上升时,利用由气泡产生的拉力,以压缩液 - 固界面的厚度,并优化能够去除有机物的多相中的传质效率 物质表面。

    METHOD FOR TRACKING POLLUTION SOURCE IN PROCESS WATER
    4.
    发明申请
    METHOD FOR TRACKING POLLUTION SOURCE IN PROCESS WATER 有权
    跟踪污水处理过程中的污染源的方法

    公开(公告)号:US20100121491A1

    公开(公告)日:2010-05-13

    申请号:US12615707

    申请日:2009-11-10

    Abstract: A method for tracking a pollution source in process water is presented. Firstly, variation curves of drain water drained from different rinsing tanks are respectively obtained, and a water quality concentration of the drain water drained to a buffer tank is detected, so as to output a water quality variation curve. Then, an analytical comparison is performed on each drain water amount variation curve and the water quality variation curve within a same time interval, so as to output an analytical result of each flow of drain water in a range exceeding a predetermined water quality standard. In this manner, the drain water that exceeds the predetermined water quality standard can be tracked in real-time according to the analytical result, thereby quickly improving the process for discharging the drain water.

    Abstract translation: 提出了一种追踪过程水污染源的方法。 首先,分别获得从不同冲洗槽排出的排水的变化曲线,并检测排放到缓冲罐的排水的水质浓度,从而输出水质变化曲线。 然后,对各排水量变化曲线和水质变化曲线在同一时间间隔内进行分析比较,从而将排水的每个流量的分析结果输出在超过规定水质标准的范围内。 以这种方式,可以根据分析结果实时地跟踪超过预定水质标准的排水,从而快速改进排水的过程。

    Method and apparatus for treating a substrate surface by bubbling
    5.
    发明授权
    Method and apparatus for treating a substrate surface by bubbling 有权
    用于通过鼓泡处理基材表面的方法和设备

    公开(公告)号:US07202175B2

    公开(公告)日:2007-04-10

    申请号:US10702442

    申请日:2003-11-07

    Abstract: The present invention discloses a technique of removing a substance from a substrate surface, such as stripping photoresist from a wafer, or forming a substance on a substrate surface. Substrates to be treated are parallel arranged at an equal interval and are immersed in a liquid with only a lower portion thereof being below the liquid surface. Gas such as ozone is introduced into the liquid and is continuously bubbling below the substrates. The bubbles will ascend between two adjacent substrates and climb on the surfaces of the substrates before they burst. The liquid boundary layers on the substrate surfaces are compressed and refreshed in the course of a dragging ascent of the bubbles, enhancing mass transfer between gas/liquid/solid substances across the liquid boundary layer, thereby resulting in a fast reaction and a fast treatment of the surface of the substrates.

    Abstract translation: 本发明公开了从基板表面去除物质的技术,例如从晶片剥离光致抗蚀剂,或在基板表面上形成物质。 待处理的基板以相等的间隔平行布置,并浸没在液体中,其下部仅在液体表面下方。 将诸如臭氧的气体引入液体中,并且在基底之下连续鼓泡。 气泡将在两个相邻的基板之间上升,并在它们爆裂之前爬上基板的表面。 衬底表面上的液体边界层在气泡上升的过程中被压缩和刷新,增强液体/液体/固体物质在液体边界层之间的传质,从而导致快速反应和快速处理 基片的表面。

    Method and apparatus for treating a substrate surface by bubbling
    6.
    发明申请
    Method and apparatus for treating a substrate surface by bubbling 有权
    用于通过鼓泡处理基材表面的方法和设备

    公开(公告)号:US20050101144A1

    公开(公告)日:2005-05-12

    申请号:US10702442

    申请日:2003-11-07

    Abstract: The present invention discloses a technique of removing a substance from a substrate surface, such as stripping photoresist from a wafer, or forming a substance on a substrate surface. Substrates to be treated are parallel arranged at an equal interval and are immersed in a liquid with only a lower portion thereof being below the liquid surface. Gas such as ozone is introduced into the liquid and is continuously bubbling below the substrates. The bubbles will ascend between two adjacent substrates and climb on the surfaces of the substrates before they burst. The liquid boundary layers on the substrate surfaces are compressed and refreshed in the course of a dragging ascent of the bubbles, enhancing mass transfer between gas/liquid/solid substances across the liquid boundary layer, thereby resulting in a fast reaction and a fast treatment of the surface of the substrates.

    Abstract translation: 本发明公开了从基板表面去除物质的技术,例如从晶片剥离光致抗蚀剂,或在基板表面上形成物质。 待处理的基板以相等的间隔平行布置,并浸没在液体中,其下部仅在液体表面下方。 将诸如臭氧的气体引入液体中,并且在基底之下连续鼓泡。 气泡将在两个相邻的基板之间上升,并在它们爆裂之前爬上基板的表面。 衬底表面上的液体边界层在气泡上升的过程中被压缩和刷新,增强液体/液体/固体物质在液体边界层之间的传质,从而导致快速反应和快速处理 基片的表面。

    Backlight module
    7.
    发明授权
    Backlight module 有权
    背光模组

    公开(公告)号:US08696183B2

    公开(公告)日:2014-04-15

    申请号:US13523636

    申请日:2012-06-14

    CPC classification number: G02B6/0021 G02B6/0033

    Abstract: A backlight module has a light guide plate, a notch structure, a light absorption layer, and at least one light source. The light guide plate has a light-emitting surface and at least one side surface forming an angle with the light-emitting surface. The notch structure is continuously formed on the side surface and concave towards the inside of the light guide plate. The light absorption layer is distributed on an area substantially overlapping the notch structure, and the light source is stored in the notch structure.

    Abstract translation: 背光模块具有导光板,凹口结构,光吸收层和至少一个光源。 导光板具有发光面和与发光面形成一定角度的至少一个侧面。 凹口结构在侧表面上连续地形成,并且朝向导光板的内侧凹陷。 光吸收层分布在基本上与切口结构重叠的区域上,光源被存储在凹口结构中。

    COLLIMATED SYSTEM WITH MULTI-BACKLIGHT SOURCE
    9.
    发明申请
    COLLIMATED SYSTEM WITH MULTI-BACKLIGHT SOURCE 审中-公开
    具有多背光源的收缩系统

    公开(公告)号:US20110026250A1

    公开(公告)日:2011-02-03

    申请号:US12550527

    申请日:2009-08-31

    CPC classification number: G02B27/30

    Abstract: A multi-backlight collimated system at least comprises a plurality of light sources, a plurality of reflection elements, and at least a collimation element. The light sources are for providing light. Each reflection element has a reflective surface corresponding to one of the light sources and is disposed to reflect light from the corresponding light source. The reflective surface reflects light being emitted in a predetermined direction by the corresponding light source to form a projection area on a screen. The adjacent projection areas on the screen are joined at adjacent side edges. The collimation element is disposed on the screen for altering a path of light penetrating the screen and emitting light in a specific direction The multi-backlight collimated system is easily fabricated into large sizes and is beneficial for products having large display areas.

    Abstract translation: 多背光准直系统至少包括多个光源,多个反射元件和至少准直元件。 光源用于提供光。 每个反射元件具有对应于一个光源的反射表面,并被设置成反射来自相应光源的光。 反射表面反射由相应的光源沿预定方向发射的光,以在屏幕上形成投影区域。 屏幕上的相邻投影区域在相邻的侧边缘处连接。 准直元件设置在屏幕上,用于改变穿透屏幕的光线的路径并沿特定方向发光。多背光准直系统容易制造成大尺寸,对于具有大显示区域的产品是有益的。

    Method for tracking pollution source in process water
    10.
    发明授权
    Method for tracking pollution source in process water 有权
    跟踪工艺用水中污染源的方法

    公开(公告)号:US08196596B2

    公开(公告)日:2012-06-12

    申请号:US13315112

    申请日:2011-12-08

    Abstract: A method for tracking a pollution source in process water is presented. Firstly, variation curves of drain water drained from different rinsing tanks are respectively obtained, and a water quality concentration of the drain water drained to a buffer tank is detected, so as to output a water quality variation curve. Then, an analytical comparison is performed on each drain water amount variation curve and the water quality variation curve within a same time interval, so as to output an analytical result of each flow of drain water in a range exceeding a predetermined water quality standard. In this manner, the drain water that exceeds the predetermined water quality standard can be tracked in real-time according to the analytical result, thereby quickly improving the process for discharging the drain water.

    Abstract translation: 提出了一种追踪过程水污染源的方法。 首先,分别获得从不同冲洗槽排出的排水的变化曲线,并检测排放到缓冲罐的排水的水质浓度,从而输出水质变化曲线。 然后,对各排水量变化曲线和水质变化曲线在同一时间间隔内进行分析比较,从而将排水的每个流量的分析结果输出在超过规定水质标准的范围内。 以这种方式,可以根据分析结果实时地跟踪超过预定水质标准的排水,从而快速改进排水的过程。

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