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    SEMICONDUCTOR PROCESSING REACTOR AND COMPONENTS THEREOF
    2.
    发明申请
    SEMICONDUCTOR PROCESSING REACTOR AND COMPONENTS THEREOF 有权
    半导体加工反应器及其组件

    公开(公告)号：US20100307415A1

    公开(公告)日：2010-12-09

    申请号：US12754223

    申请日：2010-04-05

    申请人： Eric Shero ,  Mohith E. Verghese ,  Carl L. White ,  Herbert Terhorst ,  Dan Maurice

    发明人： Eric Shero ,  Mohith E. Verghese ,  Carl L. White ,  Herbert Terhorst ,  Dan Maurice

    IPC分类号： H01L21/46 ,  C23C16/00

    CPC分类号： C23C16/45502 ,  C23C16/45504 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/45561 ,  C23C16/45591 ,  H01L21/0228 ,  Y10T137/85938

    摘要： A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber. The reaction chamber defines a reaction space in which a semiconductor substrate is disposed for processing. The exhaust assembly is operatively connected to the reaction chamber for withdrawing unreacted process gases and effluent from the reaction space.

    摘要翻译： 一种具有壳体的反应器，其包围可操作地连接到反应室和排气组件的气体输送系统。 气体输送系统包括用于向反应室提供至少一种处理气体的多条气体管线。 气体输送系统还包括用于接收至少一种处理气体的混合器。 混合器可操作地连接到被配置成扩散工艺气体的扩散器。 扩散器直接附接到反应室的上表面，从而在它们之间形成扩散体。 扩散器包括至少一个分配表面，该分配表面被配置为当工艺气体在被引入反应室之前通过扩散器体积时向流化气体提供流量限制。 反应室限定反应空间，其中半导体衬底被设置用于处理。 排气组件可操作地连接到反应室，用于从反应空间抽出未反应的工艺气体和流出物。

    Semiconductor processing reactor and components thereof
    3.
    发明授权
    Semiconductor processing reactor and components thereof 有权
    半导体处理反应器及其组件

    公开(公告)号：US09394608B2

    公开(公告)日：2016-07-19

    申请号：US12754223

    申请日：2010-04-05

    申请人： Eric Shero ,  Mohith E. Verghese ,  Carl L. White ,  Herbert Terhorst ,  Dan Maurice

    发明人： Eric Shero ,  Mohith E. Verghese ,  Carl L. White ,  Herbert Terhorst ,  Dan Maurice

    IPC分类号： C23C16/455

    CPC分类号： C23C16/45502 ,  C23C16/45504 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/45561 ,  C23C16/45591 ,  H01L21/0228 ,  Y10T137/85938

    摘要： A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.

    摘要翻译： 一种具有壳体的反应器，其包围可操作地连接到反应室和排气组件的气体输送系统。 气体输送系统包括用于向反应室提供至少一种处理气体的多条气体管线。 气体输送系统还包括用于接收至少一种处理气体的混合器。 混合器可操作地连接到被配置成扩散工艺气体的扩散器。 扩散器直接附接到反应室的上表面，从而在它们之间形成扩散体。 扩散器包括至少一个分配表面，该分配表面被配置为当工艺气体在被引入反应室之前通过扩散器体积时向流化气体提供流量限制。