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公开(公告)号：US20160047516A1
公开(公告)日：2016-02-18
申请号：US14813936
申请日：2015-07-30
申请人： Darren Taylor
发明人： Darren Taylor
CPC分类号： F21S8/036 , F21S4/10 , F21S4/20 , F21S4/28 , F21V21/02 , F21V21/08 , F21V31/005 , F21W2121/004 , F21W2131/10 , F21Y2113/17 , F21Y2115/10
摘要： The present invention extends to lighting system providing a year round, seasonal decorative lighting solution that is both customizable and essentially permanently installed. A light strand includes a plurality of lighting assemblies containing lighting elements and having posts with exterior attachment mechanisms. The lighting elements emit light through the post such that the light is externally visible. A post of each lighting assembly can be placed through a corresponding hole in a building feature (e.g., a gutter or flashing). In one aspect, the post is self-securing to the building feature. In another aspect, a cap is attached to each post (e.g., screwed or snapped) to secure the lighting assembly to the building feature. A lighting control device can individually address lighting assemblies to control lighting sequences, patterns, colors, hours of operation, etc. of the plurality of lighting assemblies.
摘要翻译： 本发明延伸到提供可定制且基本上永久地安装的全年的季节性装饰照明解决方案的照明系统。 轻链包括多个包含照明元件的照明组件，并具有具有外部附接机构的柱。 照明元件通过柱子发光，使得光从外部可见。 每个照明组件的柱可以通过建筑物特征（例如，沟槽或闪光）中的相应孔放置。 在一个方面，该帖子是自建至建筑特征的。 在另一方面，盖子连接到每个支柱（例如，拧紧或卡扣）以将照明组件固定到建筑物特征。 照明控制装置可以单独地处理照明组件以控制多个照明组件的照明顺序，图案，颜色，操作时间等。
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2.发明申请公开(公告)号：US20050053847A1
公开(公告)日：2005-03-10
申请号：US10658039
申请日：2003-09-09
CPC分类号： G03F1/30
摘要： The present invention generally relates, to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the present invention utilizes an internal etch stop layer and either a deposited substantially transparent layer, deposited partially transparent layer or deposited opaque thereon in an otherwise conventional photomask. The photomask of the present invention is used to make semiconductor devices or integrated circuits. In a preferred embodiment of the present invention is directed to an aaPSM comprising: a patterned opaque layer with a first set of at least one light transmitting openings and a second set of at least one light transmitting openings; a deposited substantially transparent layer underlying the opaque layer wherein the deposited substantially transparent layer has corresponding light transmitting openings to each of the openings of the first set of at least one light transmitting openings, a substantially transparent etch stop layer underlying the deposited substantially transparent layer, and a substantially transparent substrate underlying the transparent etch stop layer. In a preferred embodiment, the internal substantially transparent etch stop layer of the present invention is comprised of MgFx and even more particularly may be comprised of MgF2 deposited under evaporation. Other materials that may be used for the substantially transparent etch stop layer of the present invention include but are not limited to Al2O3 and AlxNy.
摘要翻译： 本发明一般涉及光学光刻技术，更具体地说，涉及用于制造半导体器件的透明或半透明相移掩模的制造。 特别地，本发明利用内部蚀刻停止层和沉积的基本上透明的层，沉积的部分透明的层或在其它常规光掩模中沉积的不透明的层。 本发明的光掩模用于制造半导体器件或集成电路。 在本发明的优选实施例中，涉及aaPSM，其包括：图案化不透明层，其具有第一组至少一个透光开口和第二组至少一个透光开口; 在不透明层下面沉积的基本上透明的层，其中沉积的基本上透明的层具有到第一组至少一个透光开口的每个开口的对应的透光开口，沉积的基本上透明的层下面的基本透明的蚀刻停止层， 以及位于透明蚀刻停止层下面的基本上透明的基底。 在优选的实施方案中，本发明的内部基本上透明的蚀刻停止层由MgF x组成，甚至更特别地可以由在蒸发下沉积的MgF 2组成。 可用于本发明的基本上透明的蚀刻停止层的其它材料包括但不限于Al 2 O 3和Al x N y。
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3.发明申请公开(公告)号：US20050026053A1
公开(公告)日：2005-02-03
申请号：US10936026
申请日：2004-09-08
摘要： The present invention generally relates to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the present invention utilizes an internal etch stop layer and either a deposited substantially transparent layer, deposited partially transparent layer or deposited opaque thereon in an otherwise conventional photomask. The photomask of the present invention is used to make semiconductor devices or integrated circuits. In a preferred embodiment of the present invention is directed to an aaPSM comprising: a patterned opaque layer with a first set of at least one light transmitting openings and a second set of at least one light transmitting openings; a deposited substantially transparent layer underlying the opaque layer wherein the deposited substantially transparent layer has corresponding light transmitting openings to each of the openings of the first set of at least one light transmitting openings, a substantially transparent etch stop layer underlying the deposited substantially transparent layer, and a substantially transparent substrate underlying the transparent etch stop layer. In a preferred embodiment, the internal substantially transparent etch stop layer of the present invention is comprised of MgFx and even more particularly may be comprised of MgF2 deposited under evaporation. Other materials that may be used for the substantially transparent etch stop layer of the present invention include but are not limited to Al2O3 and AlxNy.
摘要翻译： 本发明一般涉及光学光刻术，更具体地说涉及制造用于制造半导体器件的透明或半透明相移掩模。 特别地，本发明利用内部蚀刻停止层和沉积的基本上透明的层，沉积的部分透明的层或在其它常规光掩模中沉积的不透明的层。 本发明的光掩模用于制造半导体器件或集成电路。 在本发明的优选实施例中，涉及aaPSM，其包括：图案化不透明层，其具有第一组至少一个透光开口和第二组至少一个透光开口; 在不透明层下面沉积的基本上透明的层，其中沉积的基本上透明的层具有到第一组至少一个透光开口的每个开口的对应的透光开口，沉积的基本上透明的层下面的基本透明的蚀刻停止层， 以及位于透明蚀刻停止层下面的基本上透明的基底。 在优选的实施方案中，本发明的内部基本上透明的蚀刻停止层由MgF x组成，甚至更特别地可以由在蒸发下沉积的MgF 2组成。 可用于本发明的基本上透明的蚀刻停止层的其它材料包括但不限于Al 2 O 3和Al x N y。
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公开(公告)号：US08712226B2
公开(公告)日：2014-04-29
申请号：US12965772
申请日：2010-12-10
申请人： Jeremy R. Lee , Darren Taylor
发明人： Jeremy R. Lee , Darren Taylor
CPC分类号： B29C65/12 , A47G27/0437 , B05C17/00526 , B29C66/112 , B29C66/114 , B29C66/43421 , B29C66/71 , B29C66/721 , B29C66/73921 , B29C66/836 , B29L2031/732 , B32B27/30 , B32B2471/00 , E04F15/02005 , E04F15/105 , E04F15/163 , E04F19/049 , E04F2019/0422 , Y10T428/2973 , B29K2027/06
摘要： A method of flooring installation includes positioning a welding tip having a v-shaped plastic welding rod therein adjacent to a v-shaped joint formed between plastic flooring and plastic trim and heating the flooring, trim, and welding rod to flow the welding rod into the v-shaped joint to form a plastic weld bead and seal the joint. A welding tip and a welding rod are also disclosed.
摘要翻译： 地板安装方法包括将具有v形塑料焊接杆的焊接尖端定位在与塑料地板和塑料装饰件之间形成的V形接头附近，并加热地板，装饰和焊接杆以使焊条流入 V形接头形成一个塑料焊缝并密封接头。 还公开了焊接头和焊条。
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公开(公告)号：US20110139339A1
公开(公告)日：2011-06-16
申请号：US12965772
申请日：2010-12-10
申请人： Jeremy R. Lee , Darren Taylor
发明人： Jeremy R. Lee , Darren Taylor
CPC分类号： B29C65/12 , A47G27/0437 , B05C17/00526 , B29C66/112 , B29C66/114 , B29C66/43421 , B29C66/71 , B29C66/721 , B29C66/73921 , B29C66/836 , B29L2031/732 , B32B27/30 , B32B2471/00 , E04F15/02005 , E04F15/105 , E04F15/163 , E04F19/049 , E04F2019/0422 , Y10T428/2973 , B29K2027/06
摘要： A method of flooring installation includes positioning a welding tip having a v-shaped plastic welding rod therein adjacent to a v-shaped joint formed between plastic flooring and plastic trim and heating the flooring, trim, and welding rod to flow the welding rod into the v-shaped joint to form a plastic weld bead and seal the joint. A welding tip and a welding rod are also disclosed.
摘要翻译： 地板安装方法包括将具有v形塑料焊接杆的焊接尖端定位在与塑料地板和塑料装饰件之间形成的V形接头附近，并加热地板，装饰和焊接杆以使焊条流入 V形接头形成一个塑料焊缝并密封接头。 还公开了焊接头和焊条。
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6.发明授权Method and computer program product for electronically managing payment media 失效用于电子管理支付媒体的方法和计算机程序产品公开(公告)号：US07537153B2
公开(公告)日：2009-05-26
申请号：US11117563
申请日：2005-04-29
申请人： Harlan A Hurwitz , James H Halpin , Robert M Pickles, Jr. , Daniel Wobser , Corneliu C Chirnoaga , Mark Ladwig , Steven Antonelli , Darren Taylor
发明人： Harlan A Hurwitz , James H Halpin , Robert M Pickles, Jr. , Daniel Wobser , Corneliu C Chirnoaga , Mark Ladwig , Steven Antonelli , Darren Taylor
CPC分类号： G06Q20/02 , G06Q10/087 , G06Q20/023 , G06Q20/04 , G06Q20/042 , G06Q20/1085 , G06Q20/203 , G06Q20/40
摘要： A method of electronically managing payment media, includes the steps of: (i) determining an amount of payment media dispensed from a payment media dispensing device, based on electronic point-of-sale data received from a point-of-sale register associated with the payment media dispensing device; and (ii) determining an inventory amount of the payment media remaining in the payment media dispensing device based on the determined amount of payment media dispensed from the payment media dispensing device. A computer program product can store a computer executable program that includes instructions to cause a controller of a transactions processing system to perform the above steps.
摘要翻译： 一种电子管理支付媒体的方法，包括以下步骤：（i）基于从与销售销售点相关联的销售点寄存器接收到的电子销售点数据来确定从支付媒体分发装置分配的支付媒体的数量 支付媒体分配装置; 以及（ii）基于从支付媒体分配装置分配的确定的支付媒体量来确定剩余在支付媒体分配装置中的支付媒体的库存量。 计算机程序产品可以存储包括使交易处理系统的控制器执行上述步骤的指令的计算机可执行程序。
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公开(公告)号：US20060112006A1
公开(公告)日：2006-05-25
申请号：US10524109
申请日：2003-09-05
申请人： Harlan Hurwitz , Stewart Kautsch , Brendan Murphy , Robert Pickles , Daniel Wobser , Darren Taylor
发明人： Harlan Hurwitz , Stewart Kautsch , Brendan Murphy , Robert Pickles , Daniel Wobser , Darren Taylor
IPC分类号： G06Q40/00
CPC分类号： G07F19/201 , G06Q20/102 , G06Q30/06 , G06Q40/02 , G07F9/02 , G07F19/20
摘要： This invention provides systems and methods that minimize or remove human intervention during the payment media handling process on the shop floor, in the back office and at the cash-in-transit place. By automating processes and providing physical, tamper evident secure means for transporting the payment media, it is possible to limit, if not remove, the need for retail staff to handle payment media. This invention also provides systems and methods that enable the retailer to count, reconcile and prepare the payment media in a format that is acceptable to the commercial banks. This invention further provides systems and methods for a secure audit trail that detail payment media movement from the payment media originating source to the bank.
摘要翻译： 本发明提供了在车间，后台和现金转运场所的支付媒体处理过程中最小化或消除人为干预的系统和方法。 通过自动化流程并提供用于运输支付媒体的物理，篡改的安全手段，可以限制（如果不是除去）零售人员处理支付媒体的需要。 本发明还提供使零售商能够以商业银行可接受的格式对支付媒体进行计数，协调和准备的系统和方法。 本发明还提供了用于安全审计跟踪的系统和方法，其详细说明从支付媒体始发来源到银行的支付媒体移动。
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公开(公告)号：US20060051681A1
公开(公告)日：2006-03-09
申请号：US10936071
申请日：2004-09-08
申请人： Darren Taylor
发明人： Darren Taylor
摘要： A method of repairing a photomask having a pattern layer, an internal etch stop layer underlying the pattern layer and a substantially transparent substrate. After the mask has been partially or fully processed, the mask is inspected for defects. Defects which are appropriate to be repaired are identified, and openings associated with each defect are written into jobdeck instructions. A new layer of photoresist material is then deposited on the photomask after cleansing, and openings associated with each defect to be repaired are written into the new layer of photoresist. After the openings are developed and rinsed so that the defects to be repaired are exposed, the photomask is again etched to remove the exposed defects. Since there is an etch stop layer underlying the defects in the exposed areas, only the defect is removed and no further damage is caused to the photomask. The photoresist may then be removed, and the photomask may then be inspected to insure that the defects have been sufficiently repaired. Further processing of the photomask may then continue in the usual manner.
摘要翻译： 修复具有图案层的光掩模，图案层下面的内部蚀刻停止层和基本上透明的基板的方法。 在面罩部分或完全处理之后，检查面罩的缺陷。 确定适合修复的缺陷，并将与每个缺陷相关联的开口写入作业指示。 然后在清洁之后将光致抗蚀剂材料的新层沉积在光掩模上，并且与待修复的每个缺陷相关联的开口被写入新的光致抗蚀剂层中。 在开口开口并冲洗以使得要修复的缺陷暴露之后，再次蚀刻光掩模以除去暴露的缺陷。 由于在暴露区域的缺陷之下存在蚀刻停止层，所以仅去除缺陷并且不会对光掩模造成进一步的损坏。 然后可以除去光致抗蚀剂，然后可以检查光掩模，以确保缺陷已被充分修复。 然后可以以通常的方式继续进行光掩模的进一步处理。
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公开(公告)号：US20050096986A1
公开(公告)日：2005-05-05
申请号：US10933289
申请日：2004-09-03
申请人： Darren Taylor , Harlan Hurwitz , Keith MacBeath , James Halpin
发明人： Darren Taylor , Harlan Hurwitz , Keith MacBeath , James Halpin
摘要： A method of electronically managing payment media in a retail store, the method including automatically determining the possibility of providing a proposed payment media management solution in response to a payment media processing request and providing the proposed payment media management solution, if possible, in response to the request. The proposed payment media management solution includes one or more of at least a start fund solution, a payment media change dispensing solution, a payment media advance solution, a bank deposit solution, a coupon redemption solution, a payment media acceptance operation solution, a payment media reconciliation solution and a payment media audit solution. A retail store includes one or more of at least a single store, multiple stores, one or more third party concession stands located within a single store and two or more stores located within a mall.
摘要翻译： 一种在零售商店中电子管理支付媒体的方法，所述方法包括自动确定响应于支付媒体处理请求提供所提出的支付媒体管理解决方案的可能性，并且如果可能的话提供所提出的支付媒体管理解决方案，以响应于 请求。 所提出的支付媒体管理解决方案包括至少一个起始资金解决方案，支付媒体改变分配解决方案，支付媒体提前解决方案，银行存款解决方案，优惠券兑换解决方案，支付媒体接受操作解决方案，支付 媒体对帐解决方案和支付媒体审计解决方案。 零售商店包括位于单个商店内的至少一个商店，多个商店，一个或多个第三方特许经营场所中的一个或多个，以及位于商场内的两个或更多个商店。
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10.发明授权公开(公告)号：US07049034B2
公开(公告)日：2006-05-23
申请号：US10658039
申请日：2003-09-09
IPC分类号： G01F9/00
CPC分类号： G03F1/30
摘要： The present invention generally relates, to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the present invention utilizes an internal etch stop layer and either a deposited substantially transparent layer, deposited partially transparent layer or deposited opaque thereon in an otherwise conventional photomask. The photomask of the present invention is used to make semiconductor devices or integrated circuits. In a preferred embodiment of the present invention is directed to an aaPSM comprising: a patterned opaque layer with a first set of at least one light transmitting openings and a second set of at least one light transmitting openings; a deposited substantially transparent layer underlying the opaque layer wherein the deposited substantially transparent layer has corresponding light transmitting openings to each of the openings of the first set of at least one light transmitting openings, a substantially transparent etch stop layer underlying the deposited substantially transparent layer, and a substantially transparent substrate underlying the transparent etch stop layer. In a preferred embodiment, the internal substantially transparent etch stop layer of the present invention is comprised of MgFx and even more particularly may be comprised of MgF2 deposited under evaporation. Other materials that may be used for the substantially transparent etch stop layer of the present invention include but are not limited to Al2O3 and AlxNy.
摘要翻译： 本发明一般涉及光学光刻技术，更具体地说，涉及用于制造半导体器件的透明或半透明相移掩模的制造。 特别地，本发明利用内部蚀刻停止层和沉积的基本上透明的层，沉积的部分透明的层或在其它常规光掩模中沉积的不透明的层。 本发明的光掩模用于制造半导体器件或集成电路。 在本发明的优选实施例中，涉及aaPSM，其包括：图案化不透明层，其具有第一组至少一个透光开口和第二组至少一个透光开口; 在不透明层下面沉积的基本上透明的层，其中沉积的基本上透明的层具有到第一组至少一个透光开口的每个开口的对应的透光开口，沉积的基本上透明的层下面的基本透明的蚀刻停止层， 以及位于透明蚀刻停止层下面的基本上透明的基底。 在优选的实施方案中，本发明的内部基本上透明的蚀刻停止层由MgF x X x组成，甚至更具体地可以由蒸发下沉积的MgF 2组成。 可用于本发明的基本上透明的蚀刻停止层的其它材料包括但不限于Al 2 O 3 O 3和N 2 O 3 > N 。
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