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    WAFER-SHAPED TOOL CONFIGURED TO MONITOR PLASMA CHARACTERISTICS AND PLASMA MONITORING SYSTEM USING THE SAME
    2.
    发明申请
    WAFER-SHAPED TOOL CONFIGURED TO MONITOR PLASMA CHARACTERISTICS AND PLASMA MONITORING SYSTEM USING THE SAME 审中-公开
    配置为监视器等离子体特性和等离子体监测系统的波形工具

    公开(公告)号：US20150076328A1

    公开(公告)日：2015-03-19

    申请号：US14324652

    申请日：2014-07-07

    申请人： Jaechul JUNG ,  Dong Ok SHIN ,  Sangheon LEE

    发明人： Jaechul JUNG ,  Dong Ok SHIN ,  Sangheon LEE

    IPC分类号： H05H1/00

    CPC分类号： H05H1/0025

    摘要： Provided are tools and systems to monitor plasma characteristics. The tool may include a housing, and a sensor array, a signal processor, and a data-transferring device provided in the housing. The sensor array may include a plurality of measurement sensors two-dimensionally arranged in the housing, each of the measurement sensors including a shielding layer configured to prevent an electrical interaction with charged particles in plasma, the signal processor may be configured to process electrical signals produced by the measurement sensors, and thereby generate measurement data, and the data-transferring device may be configured to transmit the measurement data to the outside.

    摘要翻译： 提供了监测等离子体特性的工具和系统。 工具可以包括壳体，传感器阵列，信号处理器和设置在壳体中的数据传送装置。 传感器阵列可以包括在壳体中二维布置的多个测量传感器，每个测量传感器包括被配置为防止与等离子体中带电粒子的电相互作用的屏蔽层，信号处理器可以被配置为处理产生的电信号 通过测量传感器，从而生成测量数据，并且数据传送装置可以被配置为将测量数据发送到外部。