公开(公告)号：US08560981B2

公开(公告)日：2013-10-15

申请号：US12330506

申请日：2008-12-08

申请人： Emile Y. Sahouria

发明人： Emile Y. Sahouria

IPC分类号： G06F17/50

CPC分类号： G06F17/5068

摘要： A method of parsing integrated circuit layout design data. According to some implementations, the segment boundaries are designated by first identifying data in the integrated circuit layout design data that matches a cell record start value. Next, the subsequent data is parsed, until a threshold amount of subsequent data has been parsed without identifying another cell record start value. When the threshold amount of subsequent data has been parsed without identifying another cell record start value, the next data in the integrated circuit layout design data matching a cell record start value is designated as a segment boundary. Integrated circuit layout design data can be segmented sequentially, or by using dyadic division. Once the integrated circuit layout design data has been broken up into segments, the segments can be provided to a parallel processing computing system for parsing in parallel.

摘要翻译： 解析集成电路布局设计数据的方法。 根据一些实施方式，通过与集合电路布局设计数据中匹配单元记录开始值的第一识别数据指定段边界。 接下来，解析后续数据，直到已经解析了阈值量的后续数据而不识别另一个单元记录开始值。 当已经解析了后续数据的阈值量而不识别另一个单元记录开始值时，将与单元记录开始值相匹配的集成电路布局设计数据中的下一个数据指定为段边界。 集成电路布局设计数据可以顺序分割，也可以通过二进制划分。 一旦集成电路布局设计数据已经被分解成段，则可将这些段提供给并行处理计算系统以并行解析。

公开(公告)号：US20120141924A1

公开(公告)日：2012-06-07

申请号：US13175823

申请日：2011-07-01

申请人： Emile Y. Sahouria

发明人： Emile Y. Sahouria

IPC分类号： G03F1/76

CPC分类号： G03F1/76

摘要： Mask writing techniques that employ multiple masking writing passes. A first writing pass is made to write a first shot pattern having a first resolution. A second writing pass is then made to write a second shot pattern having a second resolution finer than the first resolution, such that the second shot pattern substantially overlaps with the first shot pattern on the mask substrate.

摘要翻译： 使用多重掩蔽写作通行的掩码写入技术。 进行第一写入通道以写入具有第一分辨率的第一拍摄图案。 然后进行第二写入通道以写入具有比第一分辨率更精细的第二分辨率的第二拍摄图案，使得第二拍摄图案基本上与掩模基板上的第一拍摄图案重叠。

公开(公告)号：US20080307381A1

公开(公告)日：2008-12-11

申请号：US11758510

申请日：2007-06-05

申请人： Alexander Tritchkov ,  Emile Y. Sahouria ,  Le Hong

发明人： Alexander Tritchkov ,  Emile Y. Sahouria ,  Le Hong

IPC分类号： G06F9/455

CPC分类号： G03F1/70 ,  G03F1/26

摘要： A method for separating features in a target layout into different mask layouts for use in a photolithographic process. Features of a target layer are searched for features having a predefined shape. In one embodiment, portions of the feature having the predefined shape divided into two or more sub-features and at least one sub-feature are not considered when separating the features into two or more mask layouts. In another embodiment, features having a predefined shape are cut to form two or more sub-features and all features and sub-features are considered when separating the features of the target layout into the two or more mask layouts.

摘要翻译： 用于将目标布局中的特征分离成用于光刻工艺的不同掩模布局的方法。 搜索具有预定义形状的特征的目标层的特征。 在一个实施例中，当将特征分成两个或更多个掩模布局时，不考虑具有划分为两个或更多个子特征和至少一个子特征的预定形状的特征的部分。 在另一个实施例中，切割具有预定形状的特征以形成两个或更多个子特征，并且当将目标布局的特征分成两个或更多个掩模布局时，考虑所有特征和子特征。

公开(公告)号：US20080166639A1

公开(公告)日：2008-07-10

申请号：US11621077

申请日：2007-01-08

申请人： Jea-Woo Park ,  Emile Y. Sahouria

发明人： Jea-Woo Park ,  Emile Y. Sahouria

IPC分类号： G03F1/00

CPC分类号： G03F1/70 ,  G03F1/68

摘要： A method for preparing data to create two or more masks required to print a desired feature pattern with a multiple mask technique. In one embodiment of the invention, a target feature pattern is separated into two or more groups or data layers with a coloring algorithm. Coloring conflicts or adjacent features that are within a predetermined distance of each other and are assigned to the same group or data layer are identified. Cutting boxes are added to a feature to divide a feature into two or more smaller features. A coloring algorithm is re-applied to the layout including the cutting boxes to assign the features into different groups or data layers. Data in each group or data layer is used to define a mask to print the target feature pattern.

摘要翻译： 一种用于制备数据以创建用多重掩模技术打印所需特征图案所需的两个或更多个掩模的方法。 在本发明的一个实施例中，目标特征图案被分成具有着色算法的两个或多个组或数据层。 识别彼此在预定距离内并被分配给相同组或数据层的着色冲突或相邻特征。 将切割箱添加到特征中以将特征分成两个或更多个较小的特征。 着色算法重新应用于包括切割框的布局，以将特征分配到不同的组或数据层。 每个组或数据层中的数据用于定义一个掩码以打印目标特征图案。

公开(公告)号：US20100023914A1

公开(公告)日：2010-01-28

申请号：US12390306

申请日：2009-02-20

申请人： Emile Y. Sahouria ,  Petr E. Glotov

发明人： Emile Y. Sahouria ,  Petr E. Glotov

IPC分类号： G06F17/50

CPC分类号： G03F1/70

摘要： Techniques are disclosed for determining if the decomposition of layout design data is feasible, and for optimizing the segmentation of polygons in decomposable layout design data. Layout design data is analyzed to identify the edges of polygons that should be imaged by separate lithographic masks. In addition, proposed cut paths are generated to cut the polygons in the layout design data into a plurality of polygon segments. Once the separated edges and cut paths have been selected, a conflict graph is constructed that reflects these relationships. Next, a dual of the conflict graph is constructed. This dual graph will have a corresponding separation dual graph edge for each separated polygon edge pair in the layout design data. The dual graph also will have a corresponding cut path dual graph edge for each proposed cut path generated for the layout design data. After the dual graph has been constructed, it is analyzed to determine which of the proposed cut paths should be kept and which should be discarded. The layout design data is then modified to include the cut paths corresponding to the selected cut path dual graph edges. Alternately or additionally, separate sets of layout design data may be decomposed from original layout design data using the selected cut paths.

摘要翻译： 公开了用于确定布局设计数据的分解是否可行的技术，并且用于优化可分解布局设计数据中的多边形的分割。 分析布局设计数据以识别应由单独的光刻掩模成像的多​​边形的边缘。 此外，生成所提出的切割路径以将布局设计数据中的多边形切割成多个多边形片段。 一旦选择了分离的边和切割路径，就构建了反映这些关系的冲突图。 接下来，构建冲突图的双重。 该双图将在布局设计数据中为每个分离的多边形边对提供相应的分离双图边。 对于为布局设计数据生成的每个提出的切割路径，双曲线图还将具有相应的切割路径双图形边缘。 在构建双曲线图之后，对其进行分析，以确定哪些建议的切割路径应该被保留，哪些应被丢弃。 然后修改布局设计数据以包括对应于所选切割路径双图形边缘的切割路径。 替代地或另外地，可以使用所选择的切割路径从原始布局设计数据分解单独的布局设计数据集。

公开(公告)号：US07069534B2

公开(公告)日：2006-06-27

申请号：US10738624

申请日：2003-12-17

申请人： Emile Y. Sahouria ,  Weidong Zhang

发明人： Emile Y. Sahouria ,  Weidong Zhang

IPC分类号： G06F17/50

CPC分类号： G06F17/5068

摘要： A method and apparatus for translating a hierarchical IC layout file into a format that can be used by a mask writer that accepts files having a limited hierarchy. Cover cells of the original IC layout file or a modified file are designated, and the hierarchical file is redefined to include only those designated cover cells. Non-designated cover cells and other geometric data are flattened into the designated cover cells. The hierarchy of the modified file is then redefined to be less than or equal to the hierarchy limit of the mask writing tool.

公开(公告)号：US09292643B2

公开(公告)日：2016-03-22

申请号：US12776981

申请日：2010-05-10

申请人： Emile Y. Sahouria ,  Weidong Zhang

发明人： Emile Y. Sahouria ,  Weidong Zhang

IPC分类号： G06F17/50

CPC分类号： G06F17/5068

摘要： A method and apparatus for translating a hierarchical IC layout file into a format that can be used by a mask writer that accepts files having a limited hierarchy. Cover cells of the original IC layout file or a modified file are designated, and the hierarchical file is redefined to include only those designated cover cells. Non-designated cover cells and other geometric data are flattened into the designated cover cells. The hierarchy of the modified file is then redefined to be less than or equal to the hierarchy limit of the mask writing tool.

公开(公告)号：US08815473B2

公开(公告)日：2014-08-26

申请号：US13501446

申请日：2010-10-12

申请人： Emile Y. Sahouria ,  Steffen F. Schulze

发明人： Emile Y. Sahouria ,  Steffen F. Schulze

IPC分类号： G03F1/50 ,  G03F7/20

摘要： Techniques for reducing the number of shots required by a radiation beam writing tool to write a pattern, such as fractured layout design, onto a substrate. One or more apertures are employed by a radiation beam writing tool to write a desired pattern onto a substrate using L-shaped images, T-shaped images, or some combination of both. By reducing the number of shots required to write a pattern onto a substrate, various implementations of the invention may reduce the write time and/or write complexity of the write process.

公开(公告)号：US08713483B2

公开(公告)日：2014-04-29

申请号：US11758510

申请日：2007-06-05

申请人： Alexander Tritchkov ,  Emile Y. Sahouria ,  Le Hong

发明人： Alexander Tritchkov ,  Emile Y. Sahouria ,  Le Hong

IPC分类号： G06F17/50

CPC分类号： G03F1/70 ,  G03F1/26

摘要： A method for separating features in a target layout into different mask layouts for use in a photolithographic process. Features of a target layer are searched for features having a predefined shape. In one embodiment, portions of the feature having the predefined shape divided into two or more sub-features and at least one sub-feature are not considered when separating the features into two or more mask layouts. In another embodiment, features having a predefined shape are cut to form two or more sub-features and all features and sub-features are considered when separating the features of the target layout into the two or more mask layouts.

摘要翻译： 用于将目标布局中的特征分离成用于光刻工艺的不同掩模布局的方法。 搜索具有预定义形状的特征的目标层的特征。 在一个实施例中，当将特征分成两个或更多个掩模布局时，不考虑具有划分为两个或更多个子特征和至少一个子特征的预定形状的特征的部分。 在另一个实施例中，切割具有预定形状的特征以形成两个或更多个子特征，并且当将目标布局的特征分成两个或更多个掩模布局时，考虑所有特征和子特征。

公开(公告)号：US08640059B2

公开(公告)日：2014-01-28

申请号：US12183046

申请日：2008-07-30

申请人： Emile Y. Sahouria ,  Alexander V. Tritchkov

发明人： Emile Y. Sahouria ,  Alexander V. Tritchkov

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/70 ,  G06F2217/12 ,  Y02P90/265

摘要： Separation directives for integrated circuit layout design data are formed based upon one or more printing feasibility analyses performed on the layout design data. At least one printing feasibility analysis is performed on layout design data to identify portions of the design that may not be correctly formed or “printed” during a photolithographic process. The geometric element edges involved in a potential printing defect are then identified as edges to be formed using separate masks. Further, separation directives may be created to specifically designate the identified edges as edges to be formed using separate masks in a photolithographic manufacturing process.

摘要翻译： 基于对布局设计数据执行的一个或多个打印可行性分析，形成用于集成电路布局设计数据的分离指令。 对布图设计数据执行至少一个打印可行性分析，以识别在光刻工艺期间可能未正确形成或“印刷”的设计部分。 涉及潜在打印缺陷的几何元素边缘然后被识别为将使用分开的掩模形成的边缘。 此外，可以产生分离指令，以在光刻制造过程中将识别的边缘特定地指定为使用分离的掩模形成的边缘。