公开(公告)号：US06392787B1

公开(公告)日：2002-05-21

申请号：US09653916

申请日：2000-09-01

申请人： Raymond A. Cirelli ,  Omkaram Nalamasu ,  Sanjay Patel ,  Stanley Pau ,  George P Watson ,  Christopher Alan White ,  Robert Waverly Zehner

发明人： Raymond A. Cirelli ,  Omkaram Nalamasu ,  Sanjay Patel ,  Stanley Pau ,  George P Watson ,  Christopher Alan White ,  Robert Waverly Zehner

IPC分类号： G02F100

CPC分类号： G02B6/1225 ,  B82Y20/00

摘要： An improved lithographic process for fabricating articles comprising photonic band gap materials with micron-scale periodicities is provided, the process readily capable of being performed by current lithographic processes and equipment. The process involves providing a three-dimensional structure made up of a plurality of stacked layers, where each layer contains a substantially planar lattice of shapes of a first material, typically silicon, with interstices between the shapes. Each shape contacts at least one shape of an adjacent layer, the interstices throughout the plurality of layers are interconnected, and the interstices comprise a second material, e.g., silicon dioxide. Typically, the second material is etched from the interconnected interstices to provide a structure of the first material and air, this structure designed to provide a particular photonic band gap.

摘要翻译： 提供了用于制造包含具有微米级周期性的光子带隙材料的制品的改进的光刻工艺，该工艺容易地由当前的光刻工艺和设备执行。 该方法包括提供由多个堆叠层组成的三维结构，其中每个层包含具有在形状之间的间隙的第一材料（通常为硅）的基本上平面的形状的格子。 每个形状接触相邻层的至少一个形状，整个多个层中的间隙互连，并且间隙包括第二材料，例如二氧化硅。 通常，第二材料从互连的间隙中蚀刻以提供第一材料和空气的结构，该结构被设计成提供特定的光子带隙。

公开(公告)号：US5561008A

公开(公告)日：1996-10-01

申请号：US379052

申请日：1995-01-27

申请人： Steven D. Berger ,  James A. Liddle ,  George P. Watson

发明人： Steven D. Berger ,  James A. Liddle ,  George P. Watson

IPC分类号： G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  G03F9/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/70308 ,  G03F7/70441 ,  G03F7/70941 ,  H01J37/3174 ,  H01J2237/31769 ,  H01J2237/31791

摘要： The invention is directed to a method and apparatus of projection lithography in which the contrast introduced into a radiation sensitive material caused by the proximity effect is effectively removed in a single exposure. Patterned radiation is transmitted through a lens system with at least one lens and a back focal plane filter. The back focal plane filter has at least two apertures, an image aperture and a proximity effect correction aperture. Patterned radiation is transmitted through the image aperture and introduces the desired image into the energy sensitive resist material. A portion of the inverse pattern radiation is transmitted through the proximity effect correction aperture and onto the energy sensitive resist material to effectively remove the contrast therein caused by the proximity effect.

摘要翻译： 本发明涉及投影光刻的方法和装置，其中在单次曝光中有效地消除了由邻近效应引起的引入到辐射敏感材料中的对比度。 图案化的辐射通过具有至少一个透镜和后焦平面滤光片的透镜系统透射。 后焦平面滤光器具有至少两个孔，图像孔和接近效应校正孔。 图案化的辐射通过图像孔径传播并将期望的图像引入到能量敏感的抗蚀剂材料中。 反向图案辐射的一部分通过邻近效应校正孔传递到能量敏感抗蚀剂材料上，以有效地消除由邻近效应引起的对比度。

公开(公告)号：US4797179A

公开(公告)日：1989-01-10

申请号：US060772

申请日：1987-06-09

申请人： George P. Watson ,  Kathleen Meehan

发明人： George P. Watson ,  Kathleen Meehan

IPC分类号： H01L33/20 ,  H01L21/306 ,  B44C1/22

CPC分类号： H01L33/20

摘要： Integrated lenses are fabricated on LED devices by chemical etching mesas through mask openings which are non-circular. The mask is removed and the mesas are then etched to form spherical lenses.

摘要翻译： 通过化学蚀刻台面通过非圆形的掩模开口在LED器件上制造集成透镜。 去除掩模，然后蚀刻台面以形成球面透镜。

公开(公告)号：US06537867B1

公开(公告)日：2003-03-25

申请号：US09630463

申请日：2000-08-02

申请人： Ronald L. Freyman ,  Isik C. Kizilyalli ,  Ross A. Kohler ,  Omkaram Nalamasu ,  Mark R. Pinto ,  Joseph R. Radosevich ,  Robert M. Vella ,  George P. Watson

发明人： Ronald L. Freyman ,  Isik C. Kizilyalli ,  Ross A. Kohler ,  Omkaram Nalamasu ,  Mark R. Pinto ,  Joseph R. Radosevich ,  Robert M. Vella ,  George P. Watson

IPC分类号： H01L21336

CPC分类号： H01L21/32139

摘要： A digit signal processor capable of operating at 100 MHZ with a 1.0 volt power supply. The digital signal processor is fabricated by application of strong phase-shift lithography to obtain a 0.12 &mgr;m gate dimension. A dual-mask process is utilized to improve resolution thereby producing high speed, low-voltage processors. A n+/p+ dual-Poly:Si module, and dopant penetration suppression techniques may be utilized.

摘要翻译： 一个数字信号处理器能够以1.0伏的电源工作在100MHZ。 数字信号处理器是通过应用强相移光刻技术制造的，以获得0.12μm的门尺寸。 利用双掩模工艺来提高分辨率，从而产生高速，低电压处理器。 可以使用n + / p +双Poly：Si模块和掺杂剂渗透抑制技术。

公开(公告)号：US20080219579A1

公开(公告)日：2008-09-11

申请号：US11940679

申请日：2007-11-15

申请人： Vladimir A. Aksyuk ,  Raymond A. Cirelli ,  John V. Gates ,  George P. Watson

发明人： Vladimir A. Aksyuk ,  Raymond A. Cirelli ,  John V. Gates ,  George P. Watson

IPC分类号： G06K9/36 ,  G06K9/76

CPC分类号： G02B26/0833 ,  G02B26/06 ,  G02B27/46

摘要： Methods and apparatus are provided for compressed imaging by performing modulation in a pupil plane. Image information is acquired by modulating an incident light field using a waveplate having a pattern that modifies a phase or amplitude of the incident light field, wherein the waveplate is positioned substantially in a pupil plane of an optical system; optically computing a transform between the modulated incident light field at a plane of the waveplate and an image plane; and collecting image data at the image plane. The transform can be, for example, a Fourier transform or a fractional Fourier transform

摘要翻译： 通过在瞳孔平面中执行调制，提供了用于压缩成像的方法和装置。 使用具有修改入射光场的相位或幅度的图案的波片调制入射光场来获取图像信息，其中波片基本上位于光学系统的光瞳平面中; 光学地计算在波片的平面处的调制入射光场与像面之间的变换; 并在图像平面上收集图像数据。 变换可以是例如傅立叶变换或分数阶傅里叶变换