Magnetic tunnel junction device and method for manufacturing the same
    2.
    发明申请
    Magnetic tunnel junction device and method for manufacturing the same 有权
    磁隧道结装置及其制造方法

    公开(公告)号:US20110045320A1

    公开(公告)日:2011-02-24

    申请号:US12658853

    申请日:2010-02-16

    IPC分类号: G11B5/706 H01F1/01

    摘要: The present invention relates to a magnetic tunnel junction device and a manufacturing method thereof. The magnetic tunnel junction device includes: i) a first magnetic layer including a compound having a chemical formula of (A100-xBx)100-yCy; ii) an insulating layer deposited on the first magnetic layer; and iii) a second magnetic layer deposited on the insulating layer and including a compound having a chemical formula of (A100-xBx)100-yCy. The first and second magnetic layers have perpendicular magnetic anisotropy, A and B are respectively metal elements, and C is at least one amorphizing element selected from a group consisting of boron (B), carbon (C), tantalum (Ta), and hafnium (Hf).

    摘要翻译: 磁隧道结装置及其制造方法技术领域本发明涉及磁隧道结装置及其制造方法。 磁性隧道结装置包括:i)包含化学式为(A100-xBx)100-yCy的化合物的第一磁性层; ii)沉积在第一磁性层上的绝缘层; 和iii)沉积在绝缘层上并包含化学式为(A100-xBx)100-yCy的化合物的第二磁性层。 第一和第二磁性层具有垂直的磁各向异性,A和B分别为金属元素,C为选自硼(B),碳(C),钽(Ta)和铪中的至少一种非晶化元素 (Hf)。