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公开(公告)号：US20240393574A1
公开(公告)日：2024-11-28
申请号：US18696869
申请日：2022-09-27
Applicant: HORIBA FRANCE SAS
Inventor： Vasily GAVRILYUK , Alexander YAGOVKIN
Abstract: The invention relates to an optical microscope comprising an optical system (1) and a confocal diaphragm (2), the confocal diaphragm (2) being arranged in a Fourier plane (12) of the microscope, the confocal diaphragm (2) being fixed relative to the body of the microscope, the microscope being able to collect a light beam (20) from the object plane, the optical system (1) being suitable for focusing the light beam (20) in the Fourier plane (12) and for feeding at least a portion of the light beam (20) through the confocal diaphragm (2). According to the invention, the optical microscope comprises a refractive optical component (3) placed between the optical system (1) and the confocal diaphragm (2), the refractive optical component (3) being mounted so as to be rotatable transverse to the optical axis (10) of the microscope in order to adjust a lateral position of the focused light beam relative to the confocal diaphragm (2).
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2.发明公开公开(公告)号：US20230359018A1
公开(公告)日：2023-11-09
申请号：US18028582
申请日：2021-09-27
Applicant: HORIBA FRANCE SAS
Inventor： Vasily GAVRILYUK
CPC classification number: G02B26/0816 , G01J3/4412 , G01J3/021 , G01J3/0229 , G02B26/10
Abstract: Disclosed is an optical device for deflecting a light beam, including: —a first flat reflective element arranged so as to reflect an incoming light beam into a reflected light beam, extending in a first plane, the incoming light beam and the reflected light beam defining an incidence plane; and —a second flat reflective element, arranged to reflect the reflected light beam into an outgoing light beam, extending in a second plane that is transverse to the plane of incidence. The first plane and the second plane are secant along a line of intersection and form between them a dihedral angle. The first reflective element and the second reflective element can be rotated together about an axis of rotation substantially coincident with the line of intersection.
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公开(公告)号：US11187581B2
公开(公告)日：2021-11-30
申请号：US16480173
申请日：2018-01-23
Applicant: HORIBA FRANCE SAS
Inventor： Alexandre Kokota , Vasyl Shynkar , Cédric Marchessoux
Abstract: Disclosed is an optical micro-spectrometry system including an optical microscope, a spectrometry system and an optical system adapted to direct an excitation light beam on the sample through the at least one microscope objective and to collect a Raman or PL light beam from a sample. The optical micro-spectrometry system includes an imaging system configured for acquiring a first image and a second image of the sample, by reflection or transmission of an illumination beam from a sample surface, the first image having a large field of view and the second image having a small field of view, a processing system configured for determining an area in the first image corresponding to the second image, a display system configured for displaying the first image, the second image, and a third image representing the area in overlay on the first image.
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公开(公告)号：US20190391012A1
公开(公告)日：2019-12-26
申请号：US16480173
申请日：2018-01-23
Applicant: HORIBA FRANCE SAS
Inventor： Alexandre KOKOTA , Vasyl SHYNKAR , Cédric MARCHESSOUX
Abstract: Disclosed is an optical micro-spectrometry system including an optical microscope, a spectrometry system and an optical system adapted to direct an excitation light beam on the sample through the at least one microscope objective and to collect a Raman or PL light beam from a sample. The optical micro-spectrometry system includes an imaging system configured for acquiring a first image and a second image of the sample, by reflection or transmission of an illumination beam from a sample surface, the first image having a large field of view and the second image having a small field of view, a processing system configured for determining an area in the first image corresponding to the second image, a display system configured for displaying the first image, the second image, and a third image representing the area in overlay on the first image.
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5.发明申请公开(公告)号：US20190122026A1
公开(公告)日：2019-04-25
申请号：US16301615
申请日：2017-05-15
Applicant: HORIBA FRANCE SAS
Inventor： Olivier ACHER , Simon RICHARD , Melanie GAILLET , Alexander PODZOROV , Adrian KNOWLES
CPC classification number: G06K9/00134 , G01Q30/04 , G01Q30/20 , G02B21/26 , G02B21/34 , G02B21/365 , H04N5/23218
Abstract: Disclosed is a micro-localisation device defining a system of spatial coordinates for an imaging instrument. The micro-localisation device includes at least one first zone and a second zone, adjacent to each other, each zone extending spatially over an area of macroscopic size, each zone including an elementary cell or a tiling of a plurality of elementary cells extending over the respective area of the zone, each elementary cell of the first, respectively second, zone including an orientation pattern, a positioning pattern and a periodic spatial pattern, configured to be imaged by an imaging instrument and to determine a position and, respectively an orientation of the imaging instrument in the system of spatial coordinates of the micro-localisation device.
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Patent Agency Ranking
公开(公告)号：US20230003581A1
公开(公告)日：2023-01-05
申请号：US17802340
申请日：2021-02-25
Applicant: HORIBA FRANCE SAS
Inventor： Sébastien LADEN , Alexandre KOKOTA
Abstract: Disclosed is a method of acquiring and forming a spectrometry image of a sample including the following steps: e1) acquisition of an initial image, composed of pixels, of an area of the sample and definition of a maximum set of N, 2≤N, measurement positions of spectrometry, each measurement position including a coordinate and an intensity determined on the basis of the pixels; e2) assignment of a classification value to each of the N measurement positions on the basis of deviations, calculated based on an intensity difference and a coordinate difference, between the measurement positions; e3) determination of a group of P, 1≤P≤N, measurement positions as a function of the classification values; e4) successively, for each measurement position of the group, positioning of an excitation beam in the measurement position on the area of the sample, acquisition of a spectrometry measurement and formation of the spectrometry image.
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公开(公告)号：US20210010928A1
公开(公告)日：2021-01-14
申请号：US16980806
申请日：2019-03-14
Applicant: HORIBA FRANCE SAS
Inventor： Olivier ACHER , Alexander PODZOROV , Thanh-Liem NGUYEN , Brice VILLIER , Géraldine MELIZZI , Jean-Paul GASTON
Abstract: Disclosed is an ellipsometer or scatterometer including a light source, a polarizer, an optical illumination system suitable for directing an incident polarized light beam towards a sample, a wavefront-division optical beam splitter arranged to receive a secondary light beam produced by reflection, transmission or diffraction, the wavefront-division optical beam splitter being oriented to form three collimated split beams, an optical polarization modification device and an optical polarization splitting device to form six angularly split beams, a detection system suitable for detecting the six split beams, and a processing system suitable for deducing therefrom an ellipsometric or scatterometric measurement.
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公开(公告)号：US10565428B2
公开(公告)日：2020-02-18
申请号：US16301615
申请日：2017-05-15
Applicant: HORIBA FRANCE SAS
Inventor： Olivier Acher , Simon Richard , Melanie Gaillet , Alexander Podzorov , Adrian Knowles
Abstract: Disclosed is a micro-localisation device defining a system of spatial coordinates for an imaging instrument. The micro-localisation device includes at least one first zone and a second zone, adjacent to each other, each zone extending spatially over an area of macroscopic size, each zone including an elementary cell or a tiling of a plurality of elementary cells extending over the respective area of the zone, each elementary cell of the first, respectively second, zone including an orientation pattern, a positioning pattern and a periodic spatial pattern, configured to be imaged by an imaging instrument and to determine a position and, respectively an orientation of the imaging instrument in the system of spatial coordinates of the micro-localisation device.
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公开(公告)号：US12066615B2
公开(公告)日：2024-08-20
申请号：US17415425
申请日：2019-12-18
Applicant: HORIBA FRANCE SAS
Inventor： Emmanuel Froigneux
IPC: G02B21/00
CPC classification number: G02B21/0048 , G02B21/0032 , G02B21/006 , G02B21/0076
Abstract: An apparatus for light-beam scanning microscopy includes a microscope objective and a movement system for moving an excitation light beam. The movement system for moving the excitation light beam includes a first focusing optical component suitable for focusing the excitation light beam in an intermediate focal plane, another focusing optical component suitable for forming an image of the intermediate focal in a focal plane of the microscope objective and a single scanning mirror arranged between the first optical component and the intermediate focal plane, the scanning mirror being mounted on a stage, the orientation of which can be adjusted, so as to move the image of the focusing point in two transverse directions in the object focal plane or in the image focal plane of the microscope objective.
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公开(公告)号：US20220179137A1
公开(公告)日：2022-06-09
申请号：US17594466
申请日：2020-04-17
Applicant: HORIBA FRANCE SAS
Inventor： Romain FEILLEUX , Amine BOUSSADI
IPC: G02B5/18
Abstract: Disclosed is a reflective diffraction grating including at least one intermediate metal layer arranged between the external reflective layer and a surface of the substrate including the grating lines, the external reflective layer being consisted of a first metal and the intermediate metal layer being consisted of another metal, the other metal having a higher electron-phonon coupling coefficient than the electron-phonon coupling coefficient of the first metal or metal alloy, the external reflective layer having a thickness in a range having a lower limit determined by a reflection coefficient of the first metal and an upper limit determined by a thermal diffusion length of the first metal, and the intermediate metal layer having another thickness greater than a minimum value in such a way as to increase the high peak power ultrashort pulse light flux resistance of the reflective diffraction grating.
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