公开(公告)号：US06602829B1

公开(公告)日：2003-08-05

申请号：US09701008

申请日：2001-02-08

申请人： Hans-Jürgen Füsser

发明人： Hans-Jürgen Füsser

IPC分类号： C23C1604

CPC分类号： C23C28/044 ,  C23C8/28 ,  C23C8/34 ,  C23C16/0272 ,  C23C16/28 ,  C23C16/30 ,  Y10T428/12576 ,  Y10T428/12951 ,  Y10T428/31678

摘要： The invention relates to a method for the application of a lubricant layer to a frictionally stressed surface of an object, and to a corresponding object, the lubricant layer, in use, containing boric acid. For production, the object is introduced into a reactor and the reactor is evacuated. Then, to produce an adhesion-promoter layer, a process gas is introduced, which contains boron, nitrogen and/or carbon at least in the form of a compound or releases the corresponding element under process conditions, and penetrates into the region of the surface of the object, in particular by diffusion. To produce an intermediate layer containing boron and oxygen, a second precursor material, which contains boron at least in the form of a compound and releases the boron under process conditions, and a first precursor material, which contains oxygen at least in the form of a compound and releases the oxygen under process conditions, are introduced into the depositing gas phase. At the latest in use, the boron and the oxygen of the intermediate layer are at least partially converted, at least in the region of their freely accessible surface, into boric acid as dry lubricant with the aid of hydrogen.

摘要翻译： 本发明涉及一种将润滑剂层应用于物体的摩擦应力表面的方法，以及在使用中含有硼酸的相应目的的润滑剂层。 为了生产，将物体引入反应器并将反应器排空。 然后，为了生成粘合促进剂层，引入至少以化合物形式含有硼，氮和/或碳的工艺气体，或者在工艺条件下释放相应的元素，并渗透到表面的区域 的对象，特别是通过扩散。 为了生产含有硼和氧的中间层，含有至少以化合物形式的硼并在工艺条件下释放硼的第二前体材料和含有氧的至少一种形式的第一前体材料 化合物并在工艺条件下释放氧气，被引入沉积气相。 在最近的使用中，至少在其可自由接近的表面的区域中，中间层的硼和氧至少部分地被转化为硼酸作为干润滑剂借助于氢气。

公开(公告)号：US06274403B1

公开(公告)日：2001-08-14

申请号：US08411762

申请日：1995-07-17

申请人： Claus-Peter Klages ,  Xin Jiang ,  Hans-Jürgen Füsser ,  Martin Hartweg ,  Reinhard Zachai ,  Manfred Rösler

发明人： Claus-Peter Klages ,  Xin Jiang ,  Hans-Jürgen Füsser ,  Martin Hartweg ,  Reinhard Zachai ,  Manfred Rösler

IPC分类号： H01L310312

CPC分类号： C23C16/274 ,  C23C16/0209 ,  C30B25/105 ,  C30B29/04 ,  H01L21/02381 ,  H01L21/02527 ,  H01L21/0262 ,  H01L21/02661

摘要： The invention relates to a method for producing heteroepitaxial diamond layers on Si-substrates by means of CVD and standard process gases, in which (a) during the nucleation phase a negative bias voltage is applied to the Si-substrate and (b) following the nucleation phase diamond deposition takes place.

摘要翻译： 本发明涉及通过CVD和标准工艺气体在Si衬底上制造异质外延金刚石层的方法，其中（a）在成核阶段期间，向Si衬底施加负偏置电压，以及（b） 成核相金刚石沉积发生。