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    Concrete Pole Mould and Manufacturing Method Therefor Using Centrifugal Force with Exchangeable Inner Moulds
    2.
    发明申请
    Concrete Pole Mould and Manufacturing Method Therefor Using Centrifugal Force with Exchangeable Inner Moulds 审中-公开
    混凝土杆模及其与可更换内模离心力的制造方法

    公开(公告)号：US20160318208A1

    公开(公告)日：2016-11-03

    申请号：US15005008

    申请日：2016-01-25

    申请人： HEE SUN YOON ,  MYUNG SECK LIM

    发明人： HEE SUN YOON ,  MYUNG SECK LIM

    IPC分类号： B28B17/00 ,  B28B7/00 ,  E04C3/34 ,  B28B1/20

    CPC分类号： E04C3/34 ,  B28B1/20 ,  B28B7/0014 ,  B28B7/0064 ,  B28B7/36

    摘要： A method for forming concrete poles using centrifugal force comprises steps of positioning first and second inner moulds into first and second outer moulds, wherein a decoration and function shaping part is detachably attached on the inner circumference of each of the first and second inner moulds, assembling the first and second outer moulds with the first and second inner moulds, wherein the assembled first and second outer moulds and first and second inner moulds constitute a concrete pole mould, pouring concrete into inside of the concrete pole mould, rotating the concrete pole mould at high speed, and disassembling the first and second inner moulds from the first and second outer moulds. The mould device for performing the method and the concreted pole made by the method are also provided.

    摘要翻译： 使用离心力形成混凝土柱的方法包括以下步骤：将第一和第二内模定位到第一和第二外模中，其中装饰和功能成型部分可拆卸地附接在每个第一和第二内模的内周上，组装 具有第一和第二内部模具的第一和第二外部模具，其中组装的第一和第二外部模具以及第一和第二内部模具构成混凝土杆模具，将混凝土浇注到混凝土杆模具的内部，将混凝土杆模具旋转 高速，并且从第一和第二外模拆卸第一和第二内模。 还提供了用于执行该方法的模具装置和由该方法制成的混凝土杆。

    Thermal treatment apparatus radiating low and high temperature
    3.
    发明授权
    Thermal treatment apparatus radiating low and high temperature 失效
    散热低温高温热处理装置

    公开(公告)号：US06640051B1

    公开(公告)日：2003-10-28

    申请号：US10031348

    申请日：2002-01-11

    申请人： Jung-Sun Yoon ,  Hee-Sun Yoon

    发明人： Jung-Sun Yoon ,  Hee-Sun Yoon

    IPC分类号： F26B330

    CPC分类号： A61N5/06 ,  A61F7/00 ,  A61F2007/0088 ,  A61F2007/0298

    摘要： Disclosed is a thermal treatment apparatus radiating low and high temperature, which includes a low-temperature radiating section and a high-temperature radiating section, and can rotatably scan affected parts. Both the low and the high temperature radiating sections are rotatable. The thermal treatment apparatus according to the present invention further includes a controller, with which a user can adjust the period of time for radiating low and high temperature as well as for rotation of the low-temperature radiating section and the high-temperature radiating section. The low-temperature radiating section is connected to a cryo-pump, while the high-temperature radiating section comprises an infrared ray lamp or a far infrared ray lamp. The present invention is applicable to medical treatment, physical therapy, sterilization of cosmetics or pharmaceuticals, or to tests of critical temperature for survival of cells.

    摘要翻译： 公开了一种辐射低温高温的热处理装置，其包括低温辐射部分和高温辐射部分，并且可旋转地扫描受影响的部分。 低温和高温辐射部都可旋转。 根据本发明的热处理装置还包括控制器，用户可以通过该控制器调节低温辐射部分和高温辐射部分的低温和高温以及旋转的时间段。 低温辐射部分连接到低温泵，而高温辐射部分包括红外线灯或远红外线灯。 本发明适用于医疗，物理治疗，化妆品或药物的灭菌，或细胞存活的临界温度试验。

    Phase shift masks including first and second radiation blocking layer patterns, and methods of fabricating and using the same
    5.
    发明授权
    Phase shift masks including first and second radiation blocking layer patterns, and methods of fabricating and using the same 失效
    包括第一和第二辐射阻挡层图案的相移掩模，及其制造和使用方法

    公开(公告)号：US5895735A

    公开(公告)日：1999-04-20

    申请号：US899607

    申请日：1997-07-24

    申请人： Hee-sun Yoon

    发明人： Hee-sun Yoon

    IPC分类号： G03F1/30 ,  G03F1/68 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G03F1/30

    摘要： Phase shift masks include axially spaced apart first and second radiation blocking layer patterns and a phase shifting layer pattern between the first and second radiation blocking layer patterns, on a phase shift mask substrate. The first and second axially spaced part radiation blocking layers can define narrow areas of the phase shifting layers so that patterns having fine linewidths and improved resolution can be formed on integrated circuits. Phase shifting masks can be fabricated by forming a first radiation blocking layer pattern on a phase shift mask, blanket forming a phase shifting layer and a second radiation blocking layer, patterning the second radiation blocking layer and patterning the phase shifting layer.

    摘要翻译： 相移掩模包括在相移掩模衬底上的轴向间隔开的第一和第二辐射阻挡层图案和在第一和第二辐射阻挡层图案之间的相移层图案。 第一和第二轴向间隔的部分辐射阻挡层可以限定相移层的窄区域，使得可以在集成电路上形成具有细线宽和分辨率的图案。 相移掩模可以通过在相移掩模上形成第一辐射阻挡层图案，覆盖形成相移层和第二辐射阻挡层，图案化第二辐射阻挡层并图案化相移层来制造。

    Photomask for off-axis illumination and method of fabricating the same
    6.
    发明授权
    Photomask for off-axis illumination and method of fabricating the same 有权
    用于离轴照明的光掩模及其制造方法

    公开(公告)号：US06866968B2

    公开(公告)日：2005-03-15

    申请号：US10216925

    申请日：2002-08-13

    申请人： In-Kyun Shin ,  Jung-min Sohn ,  Hee-sun Yoon ,  Seong-woon Choi

    发明人： In-Kyun Shin ,  Jung-min Sohn ,  Hee-sun Yoon ,  Seong-woon Choi

    IPC分类号： G03F1/26 ,  G03F1/68 ,  G03F1/76 ,  G03F1/78 ,  G03F1/80 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G03F7/70125 ,  G03F1/34 ,  G03F1/50

    摘要： A photomask that is capable of implementing off-axis illumination (OAI), and a method of fabricating the same, are provided. The photomask includes a transparent substrate, a plurality of opaque patterns formed on the front surface of the transparent substrate, for defining a floodlighting portion for forming patterns, and a plurality of phase gratings formed on the back surface of the transparent substrate, allowing off-axis illumination (OAI) of an incident light source beyond the OAI limit of exposure equipment, allowing use in the outmost region of an aperture, and allowing modified illumination having a shape suitable for the layout of the opaque patterns.

    摘要翻译： 提供能够实现离轴照明（OAI）的光掩模及其制造方法。 光掩模包括透明基板，形成在透明基板的前表面上的多个不透明图案，用于限定用于形成图案的泛光部分，以及形成在透明基板的背面上的多个相位光栅， 入射光源的轴向照明（OAI）超过曝光设备的OAI限制，允许在孔的最外部区域使用，并允许具有适于布局不透明图案的形状的改进的照明。