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    Exposure apparatus and exposure method
    3.
    发明授权
    Exposure apparatus and exposure method 有权
    曝光装置和曝光方法

    公开(公告)号：US07433050B2

    公开(公告)日：2008-10-07

    申请号：US11542253

    申请日：2006-10-04

    申请人： Hideaki Sakamoto

    发明人： Hideaki Sakamoto

    IPC分类号： G01B11/02 ,  G03B27/42

    CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70833

    摘要： Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first support device which has a first soft structure and which supports the measuring unit in a hanging manner separately from the projection optical system.

    摘要翻译： 公开了一种通过投影光学系统投影图案的曝光装置，包括：测量单元，具有测量投影光学系统与相对于投影光学系统定位的部件之间的位置关系的传感器;以及 第一支撑装置，其具有第一软结构，并且以与投影光学系统分开的悬挂方式支撑测量单元。

    Levelling device in an exposure apparatus
    6.
    发明授权
    Levelling device in an exposure apparatus 失效
    曝光装置中的调平装置

    公开(公告)号：US4999669A

    公开(公告)日：1991-03-12

    申请号：US378981

    申请日：1989-07-12

    申请人： Hideaki Sakamoto ,  Kesayoshi Amano

    发明人： Hideaki Sakamoto ,  Kesayoshi Amano

    IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F9/7026 ,  G03F7/70716

    摘要： An exposure apparatus for forming a pattern of a mask on a photo-sensitive substrate comprises an X-Y stage, a Z-stage supported on the X-Y stage, and a levelling stage that supports the photo-sensitive substrate. The levelling stage is supported on the Z-stage by a plurality of levelling devices that define a levelling reference plane, and that are operated in unison to change the level of the levelling stage relative to the Z-stage and relative to an exposure reference plane that is parallel to the levelling reference plane. The levelling devices are also operated individually to change the inclination of the photo-sensitive substrate relative to the levelling reference plane and relative to the exposure reference plane. A focus detector controls the movement of the Z-stage and the in-unison movement of the levelling devices. An inclination detector controls the individual operation of the levelling devices. The net result is that the surface of the photo-sensitive substrate is made coincident with the exposure reference plane and the levelling reference plane, and the center point of the surface of the photo-sensitive substrate becomes the pivotal center for changes in inclination of the photo-sensitive substrate.

    摘要翻译： 用于在感光基片上形成掩模图案的曝光装置包括X-Y平台，支持在X-Y平台上的Z平台以及支撑感光基板的调平台。 平整台由多个平整装置支撑在Z平台上，该平整装置限定了平整的参考平面，并且它们一致操作以改变调平台相对于Z级的水平并相对于曝光参考平面 这与平整参考平面平行。 调平装置也单独操作以改变感光基板相对于调平参考平面和相对于曝光参考平面的倾斜度。 焦点检测器控制Z平台的移动和调平装置的不一致移动。 倾斜检测器控制调平装置的各个操作。 最终的结果是使感光基板的表面与曝光参考平面和调平参考平面一致，并且感光基板的表面的中心点成为用于倾斜的倾斜的枢转中心 感光基片。

    Process for preparing aminoadamantyl carbamate derivatives
    9.
    发明授权
    Process for preparing aminoadamantyl carbamate derivatives 有权
    氨基甲酰胺基氨基甲酸酯衍生物的制备方法

    公开(公告)号：US08901316B2

    公开(公告)日：2014-12-02

    申请号：US13816120

    申请日：2011-08-08

    申请人： Yutaka Nishino ,  Hideki Shimizu ,  Takayuki Tsuritani ,  Natsuko Suzuki ,  Mutsumi Takaki ,  Tatsuya Kobayashi ,  Hideaki Sakamoto

    发明人： Yutaka Nishino ,  Hideki Shimizu ,  Takayuki Tsuritani ,  Natsuko Suzuki ,  Mutsumi Takaki ,  Tatsuya Kobayashi ,  Hideaki Sakamoto

    IPC分类号： C07C269/06 ,  C07C269/08 ,  C07C271/34 ,  C07D231/14 ,  C07C269/02 ,  A61K31/415

    CPC分类号： C07D231/14 ,  A61K31/415 ,  C07B2200/07 ,  C07C269/02 ,  C07C269/06 ,  C07C269/08 ,  C07C271/34 ,  C07C2603/74

    摘要： Disclosed is a process for producing an aminoadamantane carbamate derivative which is useful as a significant intermediate of an 11βHSD-1 inhibitor.A process for producing an acid addition salt of a compound represented by the Formula (II): or a solvate of the acid addition salt, wherein R1 and R2 are each independently hydrogen, substituted or unsubstituted alkyl or the like; R3 and R4 are each independently hydrogen, substituted or unsubstituted alkyl or the like; and R5 and R6 are each independently hydrogen, halogen, carboxy, nitro, substituted or unsubstituted alkyl or the like; which comprises separating an acid addition salt of a compound represented by the Formula (II) or a solvate of the acid addition salt by adding an acid to a mixture of syn isomer and anti isomer of a compound represented by the Formula (I): wherein R1, R2, R3, R4, R5, and R6 are as defined above, in the presence of a solvent.

    摘要翻译： 公开了一种生产氨基丁基氨基甲酸酯衍生物的方法，其可用作11重量％HSD-1抑制剂的重要中间体。 一种由式（II）表示的化合物的酸加成盐或其酸加成盐的溶剂化物的方法，其中R1和R2各自独立地为氢，取代或未取代的烷基等; R 3和R 4各自独立地为氢，取代或未取代的烷基等; R 5和R 6各自独立地为氢，卤素，羧基，硝基，取代或未取代的烷基等; 其包括通过向由式（I）表示的化合物的顺式异构体和反式异构体的混合物中加入酸来分离由式（II）表示的化合物的酸加成盐或酸加成盐的溶剂合物：其中 在溶剂的存在下，R 1，R 2，R 3，R 4，R 5和R 6如上定义。