摘要:
A liquid immersion exposure apparatus includes an optical system via which a substrate is exposed with an exposure beam, and a cleaning device which performs a cleaning operation by filling a space adjacent the optical system with a liquid including bubbles.
摘要:
A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module coupling with the lithography system is provided for cleaning the objective lens in a non-manual cleaning process.
摘要:
A seal assembly (44) for sealing a connector gap (274) between a connector (248) and a frame (258) includes a first subassembly (260) that seals the connector gap (274) and a second subassembly (262) that selectively seals the connector gap (274). With this design, the second subassembly (262) can seal the connector gap (274) in the event the first subassembly (260) fails and does not seal the connector gap (274). The second subassembly (262) can include a seal (382) that is movable between a first configuration (286) in which the seal (382) does not seal the connector gap (274) and a second configuration (288) in which the seal (382) does seal the connector gap (274).
摘要:
An apparatus for rotating apertures from a storage position not in a desired plane to a “in use” position in a desired plane. The stored position of the apertures does not interfere with a radiation beam path of an optical system. The apparatus may compactly store multiple apertures and may position a smaller aperture in a desired plane without removing a larger aperture from the desired plane.
摘要:
A precision assembly (210) for positioning a device (226) includes a stage (260) that retains the device (226), a dual mover assembly (228) that moves the stage (260), and the device (226) along a movement axis (266), a measurement system (222) and a control system (224). The dual mover assembly (228) includes a first mover (262) that moves the stage (260) along the movement axis (266) and a second mover (264) that moves the device (226) along the movement axis (266). The second mover (264) is rigidly coupled to the first mover (262) so that movement of the first mover (262) results in movement of the second mover (264). Further, the total output of the dual mover assembly (228) along the movement axis (266) is equal to the sum of the movement of the first mover (262) and the movement of the second mover (264). The measurement system (222) measures a movement position along the movement axis (266). The control system (224) controls the dual mover assembly (228) utilizing the movement position. The control system (224) is designed to effectively decouple the control of the first mover (262) from the control of the second mover (264). Further, the control system (224) includes a quantization feedforward loop.
摘要:
Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
摘要:
A barrier assembly (58) for sealing an assembly gap (274) between a first assembly (266) and a second assembly (268) includes a first barrier (270) that seals the assembly gap (274) and a second barrier (272) that seals the assembly gap (274). The barriers (270) (272) can be spaced apart. Further, the first barrier (270) provides a flexible pressure barrier that seals the assembly gap (268) and the second barrier (272) provides a flexible barrier that inhibits the first barrier (270) from contaminating a chamber environment within the assemblies (266) (268). Additionally, the barrier assembly (58) includes a barrier source (62) that controls a barrier environment between the barriers (270) (272).