公开(公告)号：US20090075200A1

公开(公告)日：2009-03-19

申请号：US12289749

申请日：2008-11-03

申请人： Hiroshi Takanashi ,  Tomoya Kudo

发明人： Hiroshi Takanashi ,  Tomoya Kudo

IPC分类号： G03F7/028

CPC分类号： G03F7/031 ,  G03F7/027

摘要： A negative-working photosensitive resin composition is disclosed, comprising (A) a film-forming polymer, (B) an unsaturated compound having a radical polymerizable ethylenic double bond, (C) a photopolymerization initiator, and (D) a thermal polymerization inhibitor, wherein the resin composition further contains (E) at least one member selected from compounds represented by following formula: in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent fine lines and having the deep nonprinting depth and good resolving properties, and a photosensitive resin plate using the resin composition are provided.

摘要翻译： 公开了一种负性感光性树脂组合物，其包含（A）成膜性聚合物，（B）具有自由基聚合性烯键式双键的不饱和化合物，（C）光聚合引发剂，（D）热聚合抑制剂， 其中所述树脂组合物还含有（E）选自下式表示的化合物中的至少一种：基于感光性树脂组合物的重量为3.5重量％以下的范围。 还公开了使用该感光性树脂组合物的感光性树脂板。 通过本发明，提供了一种特别优异的高亮区域和独立细线的再现性并且具有深的非印刷深度和良好的分辨性的负性感光性树脂组合物和使用该树脂组合物的感光性树脂板。

公开(公告)号：US20080070160A1

公开(公告)日：2008-03-20

申请号：US11979512

申请日：2007-11-05

申请人： Hiroshi Takanashi ,  Tomoya Kudo

发明人： Hiroshi Takanashi ,  Tomoya Kudo

IPC分类号： G03C1/00

CPC分类号： G03F7/031 ,  G03F7/027

摘要： A negative-working photosensitive resin composition is disclosed, comprising (A) a film-forming polymer, (B) an unsaturated compound having a radical polymerizable ethylenic double bond, (C) a photopolymerization initiator, and (D) a thermal polymerization inhibitor, wherein the resin composition further contains (E) at least one member selected from compounds represented by following formula: in a range of 3.5 wt % or less based on the weight of the photo-sensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent fine lines and having the deep non-printing depth and good resolving properties, and a photosensitive resin plate using the resin composition are provided.

摘要翻译： 公开了一种负性感光性树脂组合物，其包含（A）成膜性聚合物，（B）具有自由基聚合性烯键式双键的不饱和化合物，（C）光聚合引发剂，（D）热聚合抑制剂， 其中所述树脂组合物还含有（E）选自下式表示的化合物中的至少一种：相对于感光性树脂组合物的重量，在3.5重量％以下的范围内。 还公开了使用该感光性树脂组合物的感光性树脂板。 通过本发明，提供了特别优异的高亮区域和独立细线的再现性并且具有深的非印刷深度和良好的分辨性的负型感光性树脂组合物和使用该树脂组合物的感光性树脂板。

公开(公告)号：US06806032B2

公开(公告)日：2004-10-19

申请号：US10357472

申请日：2003-02-04

申请人： Hiroshi Takanashi ,  Tomoya Kudo ,  Takekazu Obata

发明人： Hiroshi Takanashi ,  Tomoya Kudo ,  Takekazu Obata

IPC分类号： G03F7031

CPC分类号： G03F7/0388 ,  G03F7/027 ,  G03F7/0758 ,  Y10S430/111

摘要： Disclosed is a negative-type photosensitive resin composition comprising component (A) that is a product of the Michael addition reaction between an amino group-containing compound (a-1) represented by the general formula (I): (wherein n is an integral number of 1-4), and a polyethyleneglycol di(meth)acrylate (a-2) represented by the general formula (II): (wherein R1 is a hydrogen or a methyl, and m is an integral number of 4-14). The composition of the invention is broadly be applicable in the technical fields of photo masks for etching use in the fabrication of CRT shadow masks, and lead frames for the mounting of IC chips; phosphor patterning of CRT; and further those of photosensitive resin plates, dry films, aqueous photosensitive paints, and aqueous photosensitive adhesives, etc. The composition of the invention has water resistance in spite of its capability of being developed with water and produce effects of enduring acidic wet-etching and repetitive steps of development.

摘要翻译： 公开了一种负型光敏树脂组合物，其包含作为通式（I）表示的含氨基化合物（a-1）之间的迈克尔加成反应的产物的组分（A）:(其中n是整数 1-4）和由通式（II）表示的聚乙二醇二（甲基）丙烯酸酯（a-2）:(其中R1是氢或甲基，m是4-14的整数） 。 本发明的组合物广泛地适用于CRT阴罩的制造中用于蚀刻的光掩模的技术领域，以及用于安装IC芯片的引线框架; CRT的荧光图案化; 以及感光性树脂板，干膜，水性感光性涂料和水性感光性粘合剂等的组合物。本发明的组合物尽管具有用水显影的能力而具有耐水性，并且产生持久的酸性湿蚀刻和 重复的发展步骤。

公开(公告)号：US5216414A

公开(公告)日：1993-06-01

申请号：US613611

申请日：1990-11-15

申请人： Hiroshi Fukutani ,  Kunihiko Ito ,  Mitsuaki Shioji ,  Kazuhiko Akimoto ,  Yasuhiro Inamasu ,  Toshihiro Matsumoto ,  Hiroshi Takanashi

发明人： Hiroshi Fukutani ,  Kunihiko Ito ,  Mitsuaki Shioji ,  Kazuhiko Akimoto ,  Yasuhiro Inamasu ,  Toshihiro Matsumoto ,  Hiroshi Takanashi

IPC分类号： G02F1/1335 ,  G02F1/1347 ,  G02F1/139 ,  G09G3/36

CPC分类号： G09G3/3607 ,  G02F1/133514 ,  G02F1/13471 ,  G02F1/1396

摘要： A color liquid crystal display device in which a color filter is provided over the entire surface of the glass substrate. In a first embodiment, display electrodes extend over a plurality of color filter sectors to form segment electrodes. In a second embodiment, the transmissivity of light passing through the liquid crystal layer can be varied in levels by making the display electrodes in two-layer, operating voltage on each of the electrodes independently, and varying in levels the amplitude of voltage applied on the liquid crystal layer by the display electrodes. In a third embodiment, the amount of light transmitted in the display area of a color filter sector is controlled by two or more display electrodes which divide up the display area.

公开(公告)号：US5231527A

公开(公告)日：1993-07-27

申请号：US826528

申请日：1992-01-27

申请人： Hiroshi Takanashi ,  Tadashi Nishimori ,  Katsuhiko Rindo ,  Akira Yoshimatsu

发明人： Hiroshi Takanashi ,  Tadashi Nishimori ,  Katsuhiko Rindo ,  Akira Yoshimatsu

IPC分类号： G02F1/1333 ,  G02F1/1339

CPC分类号： G02F1/13392

摘要： A liquid crystal display having a structure such that two sheets of substrates each provided with a transparent electrode and an orientation film are disposed opposite to each other through a spacer particle, which has an elastic modulus in compression of 370 to 550 kg/mm.sup.2 at the 10% displacement of the particle diameter, and a liquid crystal layer is also provided. As a result of this structure for the liquid crystal display, a uniform display quality can be realized through a reduction in the cell gap deviation caused when use is made of a thin sheet substrate.

公开(公告)号：US20100068480A1

公开(公告)日：2010-03-18

申请号：US12591301

申请日：2009-11-16

申请人： Hiroshi Takanashi ,  Tomoya Kudo

发明人： Hiroshi Takanashi ,  Tomoya Kudo

IPC分类号： G03F7/004 ,  B32B5/00

CPC分类号： G03F7/031 ,  Y10T428/24802

摘要： A negative-working photosensitive resin composition is disclosed, comprising (A) a film-forming polymer, (B) an unsaturated compound having a radical polymerizable ethylenic double bond, (C) a photopolymerization initiator, and (D) a thermal polymerization inhibitor, wherein the resin composition further contains (E) at least one member selected from compounds represented by following formula (I): R1—X   (I) wherein —X represents —OR2, —COOH, —SO3H, —CONHR2, —COR2, —SO2NHR2, —HNCONHR2, or —HNCOOR2; R1 and R2, which may be the same or different, each represents a hydrogen atom, a substituted or unsubstituted, saturated or unsaturated hydrocarbon group, provided that it does not contain a radical polymerizable ethylenic double bond, a substituted or unsubstituted alicyclic hydrocarbon group, a substituted or unsubstituted aromatic hydrocarbon group, or a heterocyclic group; they may have an ether bond in the chain, provided that when —X is —OH, then R1 represents a group other than a hydrogen atom and an aromatic hydrocarbon group, in a range of 0.001-0.3 wt % based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent fine lines and having the deep non-printing depth and good resolving properties, and a photosensitive resin plate using the resin composition are provided.

摘要翻译： 公开了一种负性感光性树脂组合物，其包含（A）成膜性聚合物，（B）具有自由基聚合性烯键式双键的不饱和化合物，（C）光聚合引发剂，（D）热聚合抑制剂， 其中所述树脂组合物还含有（E）选自下述式（I）表示的化合物中的至少一种：R1-X（I）其中-X表示-OR2，-COOH，-SO3H，-CONHR2，-COR2， - SO2NHR2，-HNCONHR2或-HNCOOR2; 可以相同或不同的R 1和R 2各自表示氢原子，取代或未取代的饱和或不饱和烃基，条件是它不含可自由基聚合的烯属双键，取代或未取代的脂环族烃基， 取代或未取代的芳族烃基或杂环基; 它们可以在链中具有醚键，条件是当-X是-OH时，则R1代表氢原子和芳香族烃基以外的基团，其重量在0.001-0.3重量％的范围内 感光性树脂组合物。 还公开了使用该感光性树脂组合物的感光性树脂板。 通过本发明，提供了特别优异的高亮区域和独立细线的再现性并且具有深的非印刷深度和良好的分辨性的负型感光性树脂组合物和使用该树脂组合物的感光性树脂板。

公开(公告)号：US20100055612A1

公开(公告)日：2010-03-04

申请号：US12588905

申请日：2009-11-02

申请人： Hiroshi Takanashi ,  Tomoya Kudo

发明人： Hiroshi Takanashi ,  Tomoya Kudo

IPC分类号： G03F7/004

CPC分类号： G03F7/031 ,  G03F7/027

摘要： A negative-working photosensitive resin composition is disclosed, comprising (A) a film-forming polymer, (B) an unsaturated compound having a radical polymerizable ethylenic double bond, (C) a photopolymerization initiator, and (D) a thermal polymerization inhibitor, wherein the resin composition further contains (E) at least one member selected from compounds represented by following formula: in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent fine lines and having the deep nonprinting depth and good resolving properties, and a photosensitive resin plate using the resin composition are provided.

摘要翻译： 公开了一种负性感光性树脂组合物，其包含（A）成膜性聚合物，（B）具有自由基聚合性烯键式双键的不饱和化合物，（C）光聚合引发剂，（D）热聚合抑制剂， 其中所述树脂组合物还含有（E）选自下式表示的化合物中的至少一种：基于感光性树脂组合物的重量为3.5重量％以下的范围。 还公开了使用该感光性树脂组合物的感光性树脂板。 通过本发明，提供了一种特别优异的高亮区域和独立细线的再现性并且具有深的非印刷深度和良好的分辨性的负性感光性树脂组合物和使用该树脂组合物的感光性树脂板。

公开(公告)号：US20080119581A1

公开(公告)日：2008-05-22

申请号：US11883063

申请日：2005-12-28

申请人： Hiroshi Takanashi ,  Syozo Miyazawa ,  Tomoya Kudo

发明人： Hiroshi Takanashi ,  Syozo Miyazawa ,  Tomoya Kudo

IPC分类号： C08F2/46 ,  D06M15/277

CPC分类号： C23C18/06 ,  C07C233/20 ,  C08F2/48 ,  C08F220/58 ,  C23C18/02 ,  C23C18/04 ,  C23C18/08 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/40 ,  G03F7/405 ,  H01L21/76838 ,  H05K1/0306 ,  H05K3/105 ,  H05K3/185 ,  H05K2203/0525 ,  H05K2203/121

摘要： The present invention provides a process for forming a metal pattern in which a metal is chemically absorbed, and a pattern forming material and a crosslinkable monomer used for the process. The process includes: a step for forming a pattern by photolithography including an exposure step for carrying out exposure with a purified water-based developer having a pH of less than 7 on a pattern forming material containing (A) a matrix polymer having at least one of a carboxyl and a sulfonate group, and a rinsing step; a step for forming a metal-containing pattern by immersing the pattern in an aqueous solution containing a metal compound to allow for chemical absorption of a metal ion or a complex ion to the pattern; and a step for forming a metal pattern containing the elemental metal or further containing metal oxide by sintering the metal-containing pattern. A crosslinkable monomer containing a condensation product of a polyhydric alcohol with N-methylol(meth)acrylamide was used.

摘要翻译： 本发明提供一种用于形成其中化学吸收金属的金属图案的方法，以及用于该方法的图案形成材料和可交联单体。 该方法包括：通过光刻形成图案的步骤，包括用于在含有（A）具有至少一个基质聚合物的基质聚合物的图案形成材料上进行用pH小于7的纯化水性显影剂进行曝光的曝光步骤 的羧基和磺酸酯基，和漂洗步骤; 通过将图案浸渍在含有金属化合物的水溶液中以允许化学吸收金属离子或复合离子到图案上来形成含金属图案的步骤; 以及通过烧结含金属图案形成含有元素金属或进一步含有金属氧化物的金属图案的步骤。 使用含有多元醇与N-羟甲基（甲基）丙烯酰胺的缩合物的交联性单体。

公开(公告)号：US5488497A

公开(公告)日：1996-01-30

申请号：US144445

申请日：1993-11-02

申请人： Hiroshi Takanashi ,  Masami Ogura ,  Masahiro Tanimoto

发明人： Hiroshi Takanashi ,  Masami Ogura ,  Masahiro Tanimoto

IPC分类号： G02F1/1333 ,  G02F1/1335 ,  G02F1/1343 ,  G02F1/13

CPC分类号： G02F1/133345 ,  G02F2001/133519

摘要： A color filter is formed on one surface of one of a pair of light-transmitting substrates and an organic overcoat film for smoothing is formed on the color filter. In addition, a metallic or silicon nitride film such as SiNx and a metallic or silicon oxide film such as SiOx are formed thereon in this order before forming the ITC film. The formation of the metallic or silicon nitride film and the metallic or silicon oxide film enhances the adhesion of the ITC film.

摘要翻译： 在一对透光性基板的一个面的一个面上形成滤色器，在滤色器上形成用于平滑化的有机覆盖膜。 此外，在形成ITC膜之前，依次形成诸如SiN x的金属或氮化硅膜和诸如SiO x的金属或氧化硅膜。 金属或氮化硅膜和金属或氧化硅膜的形成增强了ITC膜的粘附性。

公开(公告)号：US5336535A

公开(公告)日：1994-08-09

申请号：US980209

申请日：1992-11-23

申请人： Shunsei Fukuchi ,  Kyouhei Isohata ,  Makoto Iwamoto ,  Kenji Misono ,  Hiroshi Takanashi

发明人： Shunsei Fukuchi ,  Kyouhei Isohata ,  Makoto Iwamoto ,  Kenji Misono ,  Hiroshi Takanashi

IPC分类号： G02F1/1333 ,  G02F1/133 ,  G02F1/1337

CPC分类号： G02F1/133345 ,  G02F1/133305 ,  Y10T428/1045

摘要： A plastic liquid crystal display device having top coats (insulating films) which can be set at 200.degree. C. or less without resort to ultraviolet light and have appreciable flexibility. The plastic liquid crystal display device comprises a pair of plastic substrates, transparent electrodes, insulating films for protecting the transparent electrodes, aligning films and a liquid crystal, wherein the insulating film (top coat) is formed by dispersing any one of acryl-silanic resin, epoxy-silanic resin and silanic resin in a solvent to provide a solution, coating the solution on the transparent electrode and sintering a resulting coating at 200.degree. C. or less.

摘要翻译： 一种具有顶涂层（绝缘膜）的塑料液晶显示装置，其可以设置在200℃或更低，而不需要紫外线并具有明显的灵活性。 塑料液晶显示装置包括一对塑料基板，透明电极，用于保护透明电极的绝缘膜，取向膜和液晶，其中绝缘膜（顶涂层）是通过将任何一种丙烯酰硅烷基树脂 环氧硅烷基树脂和硅烷树脂在溶剂中提供溶液，将溶液涂布在透明电极上，并将所得涂层在200℃或更低温度下烧结。