公开(公告)号：US08897631B2

公开(公告)日：2014-11-25

申请号：US12864792

申请日：2009-01-19

申请人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Tomohiro Suzuki ,  Masatake Yoneda ,  Kazuhiro Ooya

发明人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Tomohiro Suzuki ,  Masatake Yoneda ,  Kazuhiro Ooya

IPC分类号： F27D11/12 ,  H01L21/67 ,  H01L21/324 ,  H01L21/268

CPC分类号： H01L21/67109 ,  H01L21/268 ,  H01L21/324 ,  H01L21/67115

摘要： An annealing apparatus includes heating sources provided to face a wafer W, the heating sources having LEDs emitting lights to the wafer; light-transmitting members for transmitting the lights emitted from the LEDs; and cooling members made of aluminum and provided to directly contact with the heating sources, respectively. The heating sources include a plurality of LED arrays having supporters made of AlN, each having one surface on which the LEDs are adhered by using a silver paste; and other surface on which thermal diffusion members made of copper are adhered by using a solder. The LED arrays are fixed to the cooling member by using screws via a silicone grease.

摘要翻译： 退火装置包括设置成面向晶片W的加热源，所述加热源具有向晶片发光的LED; 用于透射从LED发射的光的透光构件; 和由铝制成的冷却部件，分别与加热源直接接触。 加热源包括具有由AlN制成的支撑体的多个LED阵列，每个具有一个表面，其上通过使用银膏粘合LED; 和由铜制成的热扩散构件的其他表面通过焊料粘合。 LED阵列通过使用硅脂润滑脂的螺丝固定在冷却部件上。

公开(公告)号：US20100038833A1

公开(公告)日：2010-02-18

申请号：US12440034

申请日：2007-08-31

申请人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Masatake Yoneda ,  Tomohiro Suzuki ,  Sumi Tanaka ,  Masamichi Nomura ,  Miwa Shimizu

发明人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Masatake Yoneda ,  Tomohiro Suzuki ,  Sumi Tanaka ,  Masamichi Nomura ,  Miwa Shimizu

IPC分类号： H01L21/26 ,  C21D1/74

CPC分类号： H01L21/67115 ,  H01L21/67109 ,  H01L31/1864 ,  Y02E10/50 ,  Y02P70/521

摘要： Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.

摘要翻译： 提供一种退火装置，其不会由于发热而导致的发光量的降低而导致光能效率降低的问题，并且能够保持稳定的性能。 该装置包括：用于容纳晶片W的处理室1; 加热源17a和17b包括LED33并面向晶片W的表面以将光照射在晶片W上; 与发热源17a和17b对准布置的透光部件18a和18b，以透射从LED33发出的光; 在与处理室1相反的一侧支撑透光部件18a和18b的冷却部件4a和4b与加热源17a和17b直接接触并由导热性高的材料制成; 以及用冷却剂冷却冷却部件4a，4b的冷却机构。

公开(公告)号：US20090243906A1

公开(公告)日：2009-10-01

申请号：US12404835

申请日：2009-03-16

申请人： Hiroyuki MIYASHITA

发明人： Hiroyuki MIYASHITA

IPC分类号： H03M1/12 ,  H03F3/45 ,  H03K17/00

CPC分类号： H03F3/45183 ,  H03F2203/45702 ,  H03F2203/45726 ,  H03K3/356139

摘要： In some examples, a differential comparator includes a differential amplifier configured to output differential output signals, a first switch portion configured to input the differential output signals from the differential amplifier and output the differential output signals from output terminals while alternatively changing over the output terminals, a latch portion configured to update and latch the differential output signals from the output terminals of the first switch portion, and a second switch portion configured to input output signals from the latch portion and output the latched output signals. The first switch portion and the second switch portion are changed over complementarily so that the differential output signals from the differential amplifier are always outputted from the same first and second output terminals of the second switch portion respectively.

摘要翻译： 在一些示例中，差分比较器包括：差分放大器，被配置为输出差分输出信号;第一开关部分，被配置为从差分放大器输入差分输出信号，并且在输出端子交替地切换时输出来自输出端子的差分输出信号， 锁存部分，被配置为更新并锁存来自第一开关部分的输出端的差分输出信号;以及第二开关部分，被配置为输入来自锁存部分的输出信号并输出​​锁存的输出信号。 第一开关部分和第二开关部分互补地改变，使得来自差分放大器的差分输出信号总是分别从第二开关部分的相同的第一和第二输出端子输出。

公开(公告)号：US07491705B2

公开(公告)日：2009-02-17

申请号：US10582015

申请日：2004-12-08

申请人： Yoshihisa Shirasaki ,  Hiroyuki Miyashita ,  Masayuki Nakamura ,  Jun Inoue

发明人： Yoshihisa Shirasaki ,  Hiroyuki Miyashita ,  Masayuki Nakamura ,  Jun Inoue

IPC分类号： A61K38/05

CPC分类号： C07D213/30 ,  C07C271/22 ,  C07C2601/02 ,  C07C2601/04 ,  C07C2602/08 ,  C07D295/215 ,  C07D307/20 ,  C07D309/12

摘要： The present invention provides a compound represented by the formula (I): (wherein R1 is a lower alkyl substituted by a lower alkoxy or a heterocyclic group, or a heterocyclic group; R2 is a lower alkyl optionally substituted by a phenyl; and R3 is a lower alkyl optionally substituted by a halogen, a lower alkoxy or a phenyl, or a fused polycyclic hydrocarbon group), which is well absorbed orally, exhibits durability of good blood level and has potent calpain inhibitory activity.

摘要翻译： 本发明提供由式（I）表示的化合物：其中R1是被低级烷氧基或杂环基取代的低级烷基或杂环基; R2是任意被苯基取代的低级烷基，R3是 被卤素，低级烷氧基或苯基或稠合多环烃基任选取代的低级烷基），其口服良好吸收，具有良好的血液水平的耐久性，并具有有效的钙蛋白酶抑制活性。

公开(公告)号：US20080280048A1

公开(公告)日：2008-11-13

申请号：US12078332

申请日：2008-03-28

申请人： Shigeru Kasai ,  Hiroyuki Miyashita

发明人： Shigeru Kasai ,  Hiroyuki Miyashita

IPC分类号： B05C11/00 ,  B05D3/02

CPC分类号： H01L21/67248 ,  H01L21/67115

摘要： This invention relates to a thermal processing method including: a placing step of placing an object to be processed onto a stage arranged in a processing container that can be vacuumed; and a heating step of heating the object to be processed to a predetermined temperature. The object to be processed is heated under a state in which a temperature distribution is maintained in such a manner that a temperature at a central portion of the object to be processed is high while a temperature at a peripheral portion of the object to be processed is low, during at least a part of the heating step.

摘要翻译： 本发明涉及一种热处理方法，包括：放置步骤，将待处理物体放置在布置在可被抽真空的处理容器中的台上; 以及将被处理物体加热到规定温度的加热工序。 待加工对象在保持温度分布的状态下被加热，使得待处理物体的中心部分的温度高，而被加工物的周边部分的温度为 在加热步骤的至少一部分期间为低。

公开(公告)号：US5738959A

公开(公告)日：1998-04-14

申请号：US722439

申请日：1996-10-17

申请人： Hiroyuki Miyashita ,  Hiroshi Mohri ,  Masahiro Takahashi ,  Naoya Hayashi

发明人： Hiroyuki Miyashita ,  Hiroshi Mohri ,  Masahiro Takahashi ,  Naoya Hayashi

IPC分类号： G03F1/00 ,  G03F9/00

CPC分类号： G03F1/32 ,  G03F1/26

摘要： A halftone phase shift photomask having a sufficiently high transmittance for light of short wavelength and usable for high-resolution lithography effected by exposure using deep-ultraviolet+radiation, e.g., krypton fluoride excimer laser light. The halftone phase shift photomask has on a transparent substrate a halftone phase shift layer which includes at least one layer composed mainly of a chromium compound. The chromium compound contains at least fluorine atoms in addition to chromium atoms. A transmittance higher than a predetermined level can be obtained even in exposure carried out at a relatively short wavelength. The photomask can be used for exposure using deep-ultraviolet+radiation, e.g., krypton fluoride excimer laser light (wavelength: 248 nm). Thus, high-resolution lithography can be realized. Since the photomask can be formed by approximately the same method as in the case of the conventional photomasks, it is possible to improve the yield and reduce the cost.

摘要翻译： 对于短波长的光具有足够高透射率的半色调相移光掩模，可用于通过使用深紫外线+辐射的曝光（例如，氪氟化物准分子激光）进行的高分辨率光刻。 半色调相移光掩模在透明基板上具有半色调相移层，其包括至少一层主要由铬化合物组成的层。 除铬原子以外，铬化合物至少含有氟原子。 即使在相对短的波长下进行曝光，也可以获得高于预定水平的透射率。 光掩模可以用于使用深紫外线+辐射的曝光，例如氟化氪激光准分子激光（波长：248nm）。 因此，可以实现高分辨率光刻。 由于光掩模可以通过与常规光掩模的情况大致相同的方法形成，所以可以提高成品率并降低成本。

公开(公告)号：US5614335A

公开(公告)日：1997-03-25

申请号：US282465

申请日：1994-08-01

申请人： Keiji Hashimoto ,  Junji Fujikawa ,  Hiroshi Mohri ,  Masahiro Takahashi ,  Hiroyuki Miyashita ,  Yukio Iimura

发明人： Keiji Hashimoto ,  Junji Fujikawa ,  Hiroshi Mohri ,  Masahiro Takahashi ,  Hiroyuki Miyashita ,  Yukio Iimura

IPC分类号： G03F1/32 ,  G03F1/68 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F1/32

摘要： The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmittance of a halftone phase shift layer is arbitrarily variable within the range of 1% to 50%, inclusive, by exposing the blank or photomask to a high temperature elevated to at least 150.degree. C., to an oxidizing atmosphere, or to a reducing atmosphere at a step that can provided independent of the steps for film-forming or photomask fabrication step. This enables the exposure light transmittance of the halftone phase shift layer to be changed to any desired value after blank or photomask fabrication, and so an optimal halftone phase shift photomask to be obtained depending on the size, area, location, shape, and the like of the transferred pattern.

摘要翻译： 本发明涉及一种半色调相移光掩模及其空白处理，即使在空白或光掩模制造之后，相移部分的透射率也能够变化，可以适应各种图案，并且可以大规模制造。 半色调相变层的曝光透光率可以在1％至50％的范围内任意变化，包括在内，将空白或光掩模暴露于升高至少150℃的高温至氧化气氛，或 在可以独立于成膜或光掩模制造步骤的步骤的步骤中进行还原气氛。 这使得半色调相移层的曝光光透射率在空白或光掩模制造之后变为任何期望值，因此根据尺寸，面积，位置，形状等获得最佳半色调相移光掩模 的转移模式。

公开(公告)号：US08246900B2

公开(公告)日：2012-08-21

申请号：US12440034

申请日：2007-08-31

申请人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Masatake Yoneda ,  Tomohiro Suzuki ,  Sumi Tanaka ,  Masamichi Nomura ,  Miwa Shimizu

发明人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Masatake Yoneda ,  Tomohiro Suzuki ,  Sumi Tanaka ,  Masamichi Nomura ,  Miwa Shimizu

IPC分类号： H01L21/26 ,  C21D1/74

CPC分类号： H01L21/67115 ,  H01L21/67109 ,  H01L31/1864 ,  Y02E10/50 ,  Y02P70/521

摘要： Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.

摘要翻译： 提供一种退火装置，其不会由于发热而导致的发光量的降低而导致光能效率降低的问题，并且能够保持稳定的性能。 该装置包括：用于容纳晶片W的处理室1; 加热源17a和17b包括LED33并面向晶片W的表面以将光照射在晶片W上; 与发热源17a和17b对准布置的透光部件18a和18b，以透射从LED33发出的光; 在与处理室1相反的一侧支撑透光部件18a和18b的冷却部件4a和4b与加热源17a和17b直接接触并由导热性高的材料制成; 以及用冷却剂冷却冷却部件4a，4b的冷却机构。

公开(公告)号：US20110033175A1

公开(公告)日：2011-02-10

申请号：US12864792

申请日：2009-01-19

申请人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Tomohiro Suzuki ,  Masatake Yoneda ,  Kazuhiro Ooya

发明人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Tomohiro Suzuki ,  Masatake Yoneda ,  Kazuhiro Ooya

IPC分类号： F27D11/12

CPC分类号： H01L21/67109 ,  H01L21/268 ,  H01L21/324 ,  H01L21/67115

摘要： An annealing apparatus includes heating sources 17a and 17b provided to face a wafer W, the heating sources 17a and 17b having LEDs 33 emitting lights to the wafer; light-transmitting members 18a and 18b for transmitting the lights emitted from the LEDs 33; and cooling members 4a and 4b made of aluminum and provided to directly contact with the heating sources 17a and 17b, respectively. The heating sources 17a and 17b include a plurality of LED arrays having supporters 32 made of AlN, each having one surface on which the LEDs 33 are adhered by using a silver paste 56; and other surface on which thermal diffusion members 50 made of copper are adhered by using a solder 57. The LED arrays 34 are fixed to the cooling member 4a(4b) by using screws via a silicon grease.

摘要翻译： 退火装置包括设置成面向晶片W的加热源17a和17b，具有向该晶片发光的LED 33的加热源17a和17b; 用于透射从LED 33发射的光的透光构件18a和18b; 以及由铝制成并分别与加热源17a和17b直接接触的冷却构件4a和4b。 加热源17a和17b包括多个LED阵列，其具有由AlN制成的支撑体32，每个具有一个表面，其上通过使用银膏56粘附LED 33; 和由铜制成的热扩散构件50的其他表面通过使用焊料57粘附在其上。LED阵列34通过使用经由硅油脂的螺钉固定到冷却构件4a（4b）。

公开(公告)号：US07817077B2

公开(公告)日：2010-10-19

申请号：US12404835

申请日：2009-03-16

申请人： Hiroyuki Miyashita

发明人： Hiroyuki Miyashita

IPC分类号： H03M1/38

CPC分类号： H03F3/45183 ,  H03F2203/45702 ,  H03F2203/45726 ,  H03K3/356139

摘要： In some examples, a differential comparator includes a differential amplifier configured to output differential output signals, a first switch portion configured to input the differential output signals from the differential amplifier and output the differential output signals from output terminals while alternatively changing over the output terminals, a latch portion configured to update and latch the differential output signals from the output terminals of the first switch portion, and a second switch portion configured to input output signals from the latch portion and output the latched output signals. The first switch portion and the second switch portion are changed over complementarily so that the differential output signals from the differential amplifier are always outputted from the same first and second output terminals of the second switch portion respectively.

摘要翻译： 在一些示例中，差分比较器包括：差分放大器，被配置为输出差分输出信号;第一开关部分，被配置为从差分放大器输入差分输出信号，并且在输出端子交替地切换时输出来自输出端子的差分输出信号， 闩锁部分，被配置为更新并锁存来自第一开关部分的输出端的差分输出信号;以及第二开关部分，被配置为输入来自锁存部分的输出信号并输出​​锁存的输出信号。 第一开关部分和第二开关部分互补地改变，使得来自差分放大器的差分输出信号总是分别从第二开关部分的相同的第一和第二输出端子输出。