公开(公告)号：US20130156937A1

公开(公告)日：2013-06-20

申请号：US13328530

申请日：2011-12-16

申请人： Danny Wang ,  Kent Riley Child ,  Owen Ho Yin Fong

发明人： Danny Wang ,  Kent Riley Child ,  Owen Ho Yin Fong

IPC分类号： C23C16/52 ,  B05C11/00

CPC分类号： C23C14/54 ,  C23C14/3407 ,  C23C14/352 ,  H01J37/34

摘要： Embodiments provided herein describe systems and methods for aligning sputtering sources, such as in a substrate processing tool. The substrate processing tool includes at least one sputtering source and a device. Each of sputtering sources includes a target having a central axis. The device has an axis and is detachably coupled to the at least one sputtering source. The device indicates to a user a direction in which the central axis of the target of the at least one sputtering source is oriented.

摘要翻译： 本文提供的实施例描述了用于对准溅射源的系统和方法，例如在基板处理工具中。 基板处理工具包括至少一个溅射源和装置。 每个溅射源包括具有中心轴的靶。 该装置具有轴线并且可拆卸地联接至该至少一个溅射源。 该装置向使用者指示至少一个溅射源的靶的中心轴定向的方向。

公开(公告)号：US20130156936A1

公开(公告)日：2013-06-20

申请号：US13325348

申请日：2011-12-14

申请人： Owen Ho Yin Fong ,  Kent Riley Child

发明人： Owen Ho Yin Fong ,  Kent Riley Child

IPC分类号： C23C14/34 ,  C23C14/35

CPC分类号： C23C14/35 ,  C23C14/042 ,  C23C14/351 ,  C23C14/352 ,  C23C14/505 ,  C23C14/542 ,  C23C14/564 ,  H01J37/34 ,  H01J37/3402

摘要： A sputter source is provided. The sputter source includes a shaft extending through a central region of the sputter source. A first end of the shaft is coupled to a drive and a second end of the shaft is coupled to a bottom plate. A first plate having a ramped surface is included where the first plate is stationary. A second plate having a ramped surface is provided where the second plate is disposed above the first plate such that portions of the ramped surfaces contact each other. The second plate is coupled to the shaft, wherein the second plate is operable to rotate and move axially as the shaft rotates in a first direction and wherein the second plate is operable to remain stationary as the shaft rotates in a second direction.

摘要翻译： 提供溅射源。 溅射源包括延伸穿过溅射源的中心区域的轴。 轴的第一端联接到驱动器，并且轴的第二端联接到底板。 包括具有倾斜表面的第一板，其中第一板是静止的。 提供具有斜面的第二板，其中第二板设置在第一板的上方，使得倾斜表面的一部分彼此接触。 所述第二板联接到所述轴，其中当所述轴沿第一方向旋转时，所述第二板可操作以沿轴向旋转和移动，并且其中当所述轴沿第二方向旋转时，所述第二板可操作以保持静止。

公开(公告)号：US09085821B2

公开(公告)日：2015-07-21

申请号：US13325348

申请日：2011-12-14

申请人： Owen Ho Yin Fong ,  Kent Riley Child

发明人： Owen Ho Yin Fong ,  Kent Riley Child

IPC分类号： C23C14/34 ,  C23C14/35 ,  C23C14/04 ,  C23C14/50 ,  C23C14/54 ,  C23C14/56 ,  H01J37/34

CPC分类号： C23C14/35 ,  C23C14/042 ,  C23C14/351 ,  C23C14/352 ,  C23C14/505 ,  C23C14/542 ,  C23C14/564 ,  H01J37/34 ,  H01J37/3402

摘要： A sputter source is provided. The sputter source includes a shaft extending through a central region of the sputter source. A first end of the shaft is coupled to a drive and a second end of the shaft is coupled to a bottom plate. A first plate having a ramped surface is included where the first plate is stationary. A second plate having a ramped surface is provided where the second plate is disposed above the first plate such that portions of the ramped surfaces contact each other. The second plate is coupled to the shaft, wherein the second plate is operable to rotate and move axially as the shaft rotates in a first direction and wherein the second plate is operable to remain stationary as the shaft rotates in a second direction.

摘要翻译： 提供溅射源。 溅射源包括延伸穿过溅射源的中心区域的轴。 轴的第一端联接到驱动器，并且轴的第二端联接到底板。 包括具有倾斜表面的第一板，其中第一板是静止的。 提供具有斜面的第二板，其中第二板设置在第一板的上方，使得倾斜表面的一部分彼此接触。 所述第二板联接到所述轴，其中当所述轴沿第一方向旋转时，所述第二板可操作以沿轴向旋转和移动，并且其中当所述轴沿第二方向旋转时，所述第二板可操作以保持静止。

公开(公告)号：US20130153536A1

公开(公告)日：2013-06-20

申请号：US13328129

申请日：2011-12-16

申请人： ShouQian Shao ,  Kent Riley Child ,  Danny Wang

发明人： ShouQian Shao ,  Kent Riley Child ,  Danny Wang

IPC分类号： B44C1/22 ,  H05H1/24 ,  B08B5/00 ,  C23C16/50

CPC分类号： C23C16/042 ,  C23C16/452 ,  C23C16/50 ,  H05H1/54

摘要： Methods and apparatuses for combinatorial processing using a remote plasma source are disclosed. The apparatus includes a remote plasma source and an inner chamber enclosing a substrate support. An aperture is operable to provide plasma exposure to a site-isolated region on a substrate. A transport system moves the substrate support and is capable of positioning the substrate such that the site-isolated region can be located anywhere on the substrate. Barriers and a gas purge system operate to provide site-isolation. Plasma exposure parameters can be varied in a combinatorial manner. Such parameters include source gases for the plasma generator, plasma filtering parameters, exposure time, gas flow rate, frequency, plasma generator power, plasma generation method, chamber pressure, substrate temperature, distance between plasma source and substrate, substrate bias voltage, or combinations thereof.

摘要翻译： 公开了使用远程等离子体源进行组合处理的方法和装置。 该装置包括远程等离子体源和封闭衬底支撑件的内室。 孔可操作以提供等离子体暴露于衬底上的位置隔离区域。 运输系统移动衬底支撑件并且能够定位衬底，使得位置隔离区域可以位于衬底上的任何地方。 障碍物和气体净化系统用于提供场地隔离。 等离子体曝光参数可以以组合方式变化。 这些参数包括等离子体发生器的源气体，等离子体过滤参数，曝光时间，气体流速，频率，等离子体发生器功率，等离子体产生方法，室压力，衬底温度，等离子体源和衬底之间的距离，衬底偏置电压或组合 其中。

公开(公告)号：US20130153149A1

公开(公告)日：2013-06-20

申请号：US13331011

申请日：2011-12-20

申请人： Danny Wang ,  Kent Riley Child ,  James Tsung ,  Hong Sheng Yang

发明人： Danny Wang ,  Kent Riley Child ,  James Tsung ,  Hong Sheng Yang

IPC分类号： C23F1/08 ,  F17D3/00 ,  C23C16/458

CPC分类号： C23C16/4585 ,  H01L21/6719 ,  H01L21/68735 ,  Y10T137/0318

摘要： Embodiments provided herein describe substrate processing tools. The substrate processing tools include a housing defining a processing chamber. A substrate support is coupled to the housing and configured to support a substrate within the processing chamber. The substrate has a central axis. A first annular member is moveably coupled to the housing and positioned within the processing chamber. The first annular member circumscribes the central axis of the substrate. A second annular member is moveably coupled to the housing and positioned within the processing chamber. The second annular member circumscribes the central axis of the substrate. Movement of the first annular member and the second annular member relative to the housing changes a flow of processing fluid through the processing chamber.

摘要翻译： 本文提供的实施例描述了衬底处理工具。 衬底处理工具包括限定处理室的壳体。 衬底支撑件联接到壳体并且构造成支撑处理室内的衬底。 基板具有中心轴。 第一环形构件可移动地联接到壳体并且定位在处理室内。 第一环形构件围绕衬底的中心轴线。 第二环形构件可移动地联接到壳体并且定位在处理室内。 第二环形构件围绕基板的中心轴线。 第一环形构件和第二环形构件相对于壳体的移动改变处理流体通过处理室的流动。

公开(公告)号：US08974649B2

公开(公告)日：2015-03-10

申请号：US13316882

申请日：2011-12-12

申请人： ShouQian Shao ,  Kent Riley Child ,  James Tsung ,  Hong Sheng Yang

发明人： ShouQian Shao ,  Kent Riley Child ,  James Tsung ,  Hong Sheng Yang

IPC分类号： C23C14/00 ,  C25B11/00 ,  C25B13/00

CPC分类号： C23C14/044 ,  C23C14/34 ,  C23C14/505 ,  H01J37/32651 ,  H01J37/34

摘要： In some embodiments of the present invention, a shield is provided wherein the shield comprises a ceramic insulation material. The ceramic insulation material fills the space between the shield and the substrate surface and maintains a gap of less than about 2 mm and advantageously, less than about 1 mm. The shield may further be connected to ground through a low-pass filter operable to prevent the loss of high frequency RF power through the shield to ground but allow the dissipation of charge from the shield to ground through a low frequency or DC signal. In some embodiments, the ceramic insulating material further comprises a removable ceramic insert. The ceramic insert may be used to select the size of the aperture. The ceramic insert further comprises a slot operable to isolate the bottom lip of the ceramic insert from the upper portion for a PVD deposition.

摘要翻译： 在本发明的一些实施例中，提供了一种屏蔽件，其中屏蔽件包括陶瓷绝缘材料。 陶瓷绝缘材料填充屏蔽件和基板表面之间的空间，并且保持小于约2mm并且有利地小于约1mm的间隙。 屏蔽可以通过低通滤波器进一步连接到地面，该低通滤波器可操作以防止通过屏蔽到地面的高频RF功率的损失，但允许通过低频或DC信号从屏蔽到地面的电荷的耗散。 在一些实施例中，陶瓷绝缘材料还包括可移除的陶瓷插入件。 陶瓷插入件可用于选择孔径的尺寸。 陶瓷插入件还包括可操作以将陶瓷插入件的底部唇缘与上部隔离用于PVD沉积的槽。

公开(公告)号：US20130126477A1

公开(公告)日：2013-05-23

申请号：US13302178

申请日：2011-11-22

申请人： Rajesh Kelekar ,  Kent Riley Child

发明人： Rajesh Kelekar ,  Kent Riley Child

IPC分类号： C23F1/02 ,  B23B31/28 ,  B05D1/18 ,  B05C3/02 ,  B05D5/00 ,  B05C11/00

CPC分类号： H01L21/67086 ,  H01L21/67057 ,  Y10T279/23

摘要： A protective chuck is magnetically levitated on a substrate with a gas layer between the bottom surface of the protective chuck and the substrate surface. The gas layer protects a surface region of the substrate against a fluid layer covering the remaining of the substrate surface without contacting the substrate, reducing or eliminating potential damage to the substrate surface. The magnetically levitated protective chuck can enable combinatorial processing of a substrate, providing multiple isolated processing regions on a single substrate with different material and processing conditions.

摘要翻译： 保护卡盘在衬底上磁悬浮，在保护卡盘的底表面和衬底表面之间具有气层。 气体层保护衬底的表面区域免受覆盖衬底表面剩余部分的流体层的影响，而不接触衬底，减少或消除对衬底表面的潜在损害。 磁悬浮保护卡盘可以实现基板的组合处理，在单个基板上提供具有不同材料和加工条件的多个隔离加工区域。

公开(公告)号：US20120285819A1

公开(公告)日：2012-11-15

申请号：US13103951

申请日：2011-05-09

申请人： Kent Riley Child ,  Hong Sheng Yang ,  Rajesh Kelekar

发明人： Kent Riley Child ,  Hong Sheng Yang ,  Rajesh Kelekar

IPC分类号： C23C14/34

CPC分类号： C23C14/3464 ,  C23C14/04

摘要： A dual purpose processing chamber is provided. The dual purpose processing chamber includes a lid disposed over a top surface of a processing region of the processing chamber. A plurality of sputter guns with a target affixed to one end of each of the sputter guns is included. The plurality of sputter guns extend through the lid of the process chamber, wherein each of the plurality of sputter guns is oriented such that a surface of the target affixed to each gun is angled toward an outer periphery of a substrate. In another embodiment, each of the sputter guns is affixed to an extension arm and the extension arm is configured to enable movement in four degrees of freedom. A method of performing a deposition process is also included.

摘要翻译： 提供了一个双重目的的处理室。 双用途处理室包括设置在处理室的处理区域的顶表面上的盖子。 包括固定在每个溅射枪的一端的目标的多个溅射枪。 多个溅射枪延伸穿过处理室的盖，其中多个溅射枪中的每一个被定向成使得固定到每个喷枪的靶的表面朝向基板的外周边成角度。 在另一个实施例中，每个溅射枪被固定到延伸臂上，并且延伸臂构造成能够以四个自由度运动。 还包括执行沉积工艺的方法。

公开(公告)号：US20130160708A1

公开(公告)日：2013-06-27

申请号：US13338102

申请日：2011-12-27

申请人： Brian K. Hatcher ,  Kent Riley Child

发明人： Brian K. Hatcher ,  Kent Riley Child

IPC分类号： C23C14/54 ,  C23C14/34

CPC分类号： H01J37/3464 ,  G05F5/00 ,  H01J37/32366 ,  H01J37/32651 ,  H01J37/32706 ,  H01J37/34 ,  H01J37/3444 ,  H01J37/3447 ,  H02J1/10

摘要： A system and method for combinatorial processing of substrates in a processing chamber. The system includes a plurality of generators for supplying power into the processing chamber. A plurality of sputter guns provides power to different regions of a substrate. A switchbox switches power from a generator to a sputter gun via a plurality of coaxial switches. A controller positioned within the switchbox automatically distributes power from a specific generator to a specific sputter gun under programmable logic control.

摘要翻译： 一种用于在处理室中组合处理衬底的系统和方法。 该系统包括用于向处理室供电的多个发生器。 多个溅射枪向基板的不同区域供电。 开关盒通过多个同轴开关将发电机的电源切换到溅射枪。 位于开关盒内的控制器在可编程逻辑控制下自动将特定发生器的电力分配给特定的溅射枪。

公开(公告)号：US20120315396A1

公开(公告)日：2012-12-13

申请号：US13159188

申请日：2011-06-13

申请人： Richard Endo ,  Kent Riley Child

发明人： Richard Endo ,  Kent Riley Child

IPC分类号： C23C16/455 ,  C23C16/52 ,  C23C16/50 ,  C23C16/458

CPC分类号： C23C16/04 ,  B01J2219/0043 ,  B01J2219/00443 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00603 ,  B01J2219/00659 ,  C23C16/45519 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/5096 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32449

摘要： A multi-zone, combinatorial, single wafer showerhead is used to concurrently develop hardware, materials, unit processes, and unit process sequences. The multi-zone, combinatorial, single wafer showerhead utilizes showerhead pucks to perform process sequences on isolated regions of a single substrate. The showerhead pucks are designed so that they are easily interchangeable to allow the characterization of the interaction between hardware characteristics, process parameters, and their influence on the result of the process sequence.

摘要翻译： 多区域，组合单晶片喷头用于同时开发硬件，材料，单元工艺和单元工艺顺序。 多区域，组合单晶片喷头利用喷头冰球在单个基板的隔离区域上执行处理顺序。 喷头冰球设计成使得它们可以容易地互换，以便表征硬件特性，过程参数及其对过程顺序结果的影响之间的相互作用。