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1.发明授权Method for forming a diamond-like carbon layer on air bearing surface of a slider 有权在滑块的空气轴承表面上形成类金刚石碳层的方法公开(公告)号：US08419905B2
公开(公告)日：2013-04-16
申请号：US12656196
申请日：2010-01-20
Applicant: Kunihiro Ueda , Hongxin Fang , Dong Wang
Inventor： Kunihiro Ueda , Hongxin Fang , Dong Wang
IPC: C23C14/00
CPC classification number: G11B5/102 , C23C14/022 , C23C14/024 , C23C14/0605 , C23C16/0245 , C23C16/0272 , C23C16/26 , G11B5/3106 , G11B5/3173
Abstract: A method for forming a diamond-like carbon (DLC) layer on air bearing surface (ABS) of a slider, comprises steps of: providing sliders arranged in arrays, each slider having an ABS; forming a mixing layer in the ABS of the slider by depositing a first DLC layer on the ABS, the mixing layer consisting of the slider material and the first DLC layer material; removing the first DLC layer to make the mixing layer exposed; forming a second DLC layer on the mixing layer.
Abstract translation: 一种用于在滑块的空气轴承表面（ABS）上形成类金刚石碳（DLC）层的方法，包括以下步骤：提供排列成阵列的滑块，每个滑块具有ABS; 通过在ABS上沉积第一DLC层，由滑块材料和第一DLC层材料组成的混合层，在滑块的ABS中形成混合层; 去除第一DLC层以使混合层暴露; 在混合层上形成第二DLC层。
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2.发明授权Method for preventing TMR MRR drop of a slider and method for manufacturing sliders 有权用于防止滑块的TMR MRR下降的方法和用于制造滑块的方法公开(公告)号：US08018684B2
公开(公告)日：2011-09-13
申请号：US12007252
申请日：2008-01-08
Applicant: HongTao Ma , BaoHua Chen , XiaoFeng Qiao , Hongxin Fang , WeiWei He
Inventor： HongTao Ma , BaoHua Chen , XiaoFeng Qiao , Hongxin Fang , WeiWei He
CPC classification number: G11B5/3166 , B82Y10/00 , B82Y25/00 , G01R33/093 , G01R33/098 , G11B5/3903 , G11B5/3909
Abstract: The invention provides a method for preventing TMR MRR drop of a slider, including: positioning a row bar constructed by sliders on a tray, each slider incorporating a TMR element; loading the tray into a processing chamber and evacuating the processing chamber to a predetermined pressure; forming a first etching means; exposing the sliders to the first etching means such that an oxide layer is formed on a surface of the TMR element; forming a second etching means; and exposing the sliders to the second etching means such that the oxide layer is etched to get a reduced thickness. The invention also discloses a method for manufacturing sliders.
Abstract translation: 本发明提供了一种用于防止滑块的TMR MRR下降的方法，包括：将由滑块构成的行棒定位在托盘上，每个滑块包括TMR元件; 将托盘装载到处理室中并将处理室抽空至预定压力; 形成第一蚀刻装置; 将滑块暴露于第一蚀刻装置，使得在TMR元件的表面上形成氧化物层; 形成第二蚀刻装置; 并将滑块暴露于第二蚀刻装置，使得氧化物层被蚀刻以获得减小的厚度。 本发明还公开了一种制造滑块的方法。
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3.发明申请Method for preventing TMR MRR drop of a slider and method for manufacturing sliders 有权用于防止滑块的TMR MRR下降的方法和用于制造滑块的方法公开(公告)号：US20080212242A1
公开(公告)日：2008-09-04
申请号：US12007252
申请日：2008-01-08
Applicant: HongTao Ma , BaoHua Chen , XiaoFeng Qiao , Hongxin Fang , WeiWei He
Inventor： HongTao Ma , BaoHua Chen , XiaoFeng Qiao , Hongxin Fang , WeiWei He
IPC: G11B5/60
CPC classification number: G11B5/3166 , B82Y10/00 , B82Y25/00 , G01R33/093 , G01R33/098 , G11B5/3903 , G11B5/3909
Abstract: The invention provides a method for preventing TMR MRR drop of a slider, including: positioning a row bar constructed by sliders on a tray, each slider incorporating a TMR element; loading the tray into a processing chamber and evacuating the processing chamber to a predetermined pressure; forming a first etching means; exposing the sliders to the first etching means such that an oxide layer is formed on a surface of the TMR element; forming a second etching means; and exposing the sliders to the second etching means such that the oxide layer is etched to get a reduced thickness. The invention also discloses a method for manufacturing sliders.
Abstract translation: 本发明提供了一种用于防止滑块的TMR MRR下降的方法，包括：将由滑块构成的行棒定位在托盘上，每个滑块包括TMR元件; 将托盘装载到处理室中并将处理室抽空至预定压力; 形成第一蚀刻装置; 将滑块暴露于第一蚀刻装置，使得在TMR元件的表面上形成氧化物层; 形成第二蚀刻装置; 并将滑块暴露于第二蚀刻装置，使得氧化物层被蚀刻以获得减小的厚度。 本发明还公开了一种制造滑块的方法。
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公开(公告)号：US20070226988A1
公开(公告)日：2007-10-04
申请号：US11727059
申请日：2007-03-23
Applicant: HongXin Fang , HongTao Ma , Yu Ding , Heng Qiao , BaoHua Chen
Inventor： HongXin Fang , HongTao Ma , Yu Ding , Heng Qiao , BaoHua Chen
IPC: G11B5/147
CPC classification number: G11B5/3163 , G11B5/3116 , G11B5/3173 , Y10T29/49032 , Y10T29/49041 , Y10T29/49052
Abstract: A method for forming micro-texture on ABS of a slider, includes steps of: positioning sliders arranged in arrays on a tray, each slider having a pole tip facing upward; loading the tray into a processing chamber, and evacuating the processing chamber to a preset pressure; introducing a mixture gas of inert gas and hydrocarbon gas into the processing chamber, and ionizing the mixture gas to produce ion beams; exposing the sliders to the ion beam for etching so as to form micro-texture with two-step structure on the ABS of the slider. The invention also discloses a method of manufacturing a slider having micro-texture.
Abstract translation: 一种用于在滑块的ABS上形成微纹理的方法，包括以下步骤：将排列成阵列的滑块定位在托盘上，每个滑块具有朝上的极尖; 将托盘装载到处理室中，并将处理室抽空至预设压力; 将惰性气体和烃气体的混合气体引入处理室，并将混合气体离子化以产生离子束; 将滑块暴露于离子束进行蚀刻，以便在滑块的ABS上形成具有两步结构的微纹理。 本发明还公开了一种制造具有微纹理的滑块的方法。
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5.发明申请Method for preventing TMR MRR drop of slider and micro-texture forming method in same process 有权在同一过程中防止滑块和微纹理形成方法的TMR MRR下降的方法公开(公告)号：US20080000075A1
公开(公告)日：2008-01-03
申请号：US11434518
申请日：2006-05-16
Applicant: Hongtao Ma , Hongxin Fang , Baohua Chen
Inventor： Hongtao Ma , Hongxin Fang , Baohua Chen
IPC: G11B5/127
CPC classification number: G11B5/3173 , B82Y10/00 , B82Y25/00 , G11B5/3163 , G11B5/3169 , G11B5/3906 , G11B5/3909 , Y10T29/49021 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
Abstract: A method for preventing TMR (tunnel magneto-resistance) MRR (magneto-resistance resistance) drop of a slider, comprises steps of: positioning a row bar constructed by a plurality of slider structural bodies on a tray, each slider body having a pole tip with a TMR element; loading the tray into a processing chamber and evacuating the processing chamber to a preset pressure; introducing a processing gas containing oxygen gas into the processing chamber; and exposing the slider structural bodies to an etching means in the atmosphere of the processing gas to oxidize a surface of the TMR element to form an oxidation layer thereon. The invention also discloses a method for forming micro-texture on a surface of slider in same process, and a method for forming such a slider.
Abstract translation: 用于防止滑块的TMR（隧道磁阻）MRR（耐磁阻电阻）下降的方法包括以下步骤：将由多个滑块结构体构成的行棒定位在托盘上，每个滑块体具有极尖 与TMR元素; 将托盘装载到处理室中并将处理室抽空至预设压力; 将含有氧气的处理气体引入所述处理室; 并且将所述滑块结构体暴露于所述处理气体的气氛中的蚀刻装置，以氧化所述TMR元件的表面以在其上形成氧化层。 本发明还公开了一种用于在相同工艺中在滑块的表面上形成微纹理的方法，以及用于形成这种滑块的方法。
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Patent Agency Ranking
6.发明申请Method for forming a diamond-like carbon layer on air bearing surface of a slider 有权在滑块的空气轴承表面上形成类金刚石碳层的方法公开(公告)号：US20110174608A1
公开(公告)日：2011-07-21
申请号：US12656196
申请日：2010-01-20
Applicant: Kunihiro UEDA , Hongxin Fang , Dong Wang
Inventor： Kunihiro UEDA , Hongxin Fang , Dong Wang
CPC classification number: G11B5/102 , C23C14/022 , C23C14/024 , C23C14/0605 , C23C16/0245 , C23C16/0272 , C23C16/26 , G11B5/3106 , G11B5/3173
Abstract: A method for forming a diamond-like carbon (DLC) layer on air bearing surface (ABS) of a slider, comprises steps of: providing sliders arranged in arrays, each slider having an ABS; forming a mixing layer in the ABS of the slider by depositing a first DLC layer on the ABS, the mixing layer consisting of the slider material and the first DLC layer material; removing the first DLC layer to make the mixing layer exposed; forming a second DLC layer on the mixing layer.
Abstract translation: 一种用于在滑块的空气轴承表面（ABS）上形成类金刚石碳（DLC）层的方法，包括以下步骤：提供排列成阵列的滑块，每个滑块具有ABS; 通过在ABS上沉积第一DLC层，由滑块材料和第一DLC层材料组成的混合层，在滑块的ABS中形成混合层; 去除第一DLC层以使混合层暴露; 在混合层上形成第二DLC层。
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公开(公告)号：US07560038B2
公开(公告)日：2009-07-14
申请号：US10945873
申请日：2004-09-22
Applicant: Hongxin Fang , Hongtao Ma , Baiqing Zhang , Baohua Chen , Somen Choudhury
Inventor： Hongxin Fang , Hongtao Ma , Baiqing Zhang , Baohua Chen , Somen Choudhury
CPC classification number: C23F4/00 , C23C14/022 , C23C14/221 , G11B5/255 , G11B5/3106 , G11B5/3163 , G11B5/8408
Abstract: A thin-film forming method, which includes the steps of: (1) holding at least one object in a chamber; (2) depositing a film-forming material on the object; (3) etching the forming material while depositing is conducted. In the present invention, the depositing and etching are controlled to simultaneously conduct. The invention also disclose a system for performing the method.
Abstract translation: 一种薄膜形成方法，其包括以下步骤：（1）在室中保持至少一个物体; （2）在所述物体上沉积成膜材料; （3）进行沉积时蚀刻成形材料。 在本发明中，沉积和蚀刻被控制以同时进行。 本发明还公开了一种用于执行该方法的系统。
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公开(公告)号：US07552524B2
公开(公告)日：2009-06-30
申请号：US11434518
申请日：2006-05-16
Applicant: Hongtao Ma , Hongxin Fang , Baohua Chen
Inventor： Hongtao Ma , Hongxin Fang , Baohua Chen
CPC classification number: G11B5/3173 , B82Y10/00 , B82Y25/00 , G11B5/3163 , G11B5/3169 , G11B5/3906 , G11B5/3909 , Y10T29/49021 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
Abstract: A method for preventing TMR (tunnel magneto-resistance) MRR (magneto-resistance resistance) drop of a slider, comprises steps of: positioning a row bar constructed by a plurality of slider structural bodies on a tray, each slider body having a pole tip with a TMR element; loading the tray into a processing chamber and evacuating the processing chamber to a preset pressure; introducing a processing gas containing oxygen gas into the processing chamber; and exposing the slider structural bodies to an etching means in the atmosphere of the processing gas to oxidize a surface of the TMR element to form an oxidation layer thereon. The invention also discloses a method for forming micro-texture on a surface of slider in same process, and a method for forming such a slider.
Abstract translation: 用于防止滑块的TMR（隧道磁阻）MRR（耐磁阻电阻）下降的方法包括以下步骤：将由多个滑块结构体构成的行棒定位在托盘上，每个滑块体具有极尖 与TMR元素; 将托盘装载到处理室中并将处理室抽空至预设压力; 将含有氧气的处理气体引入所述处理室; 并且将所述滑块结构体暴露于所述处理气体的气氛中的蚀刻装置，以氧化所述TMR元件的表面以在其上形成氧化层。 本发明还公开了一种用于在相同工艺中在滑块的表面上形成微纹理的方法，以及用于形成这种滑块的方法。
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公开(公告)号：US20060060559A1
公开(公告)日：2006-03-23
申请号：US10945873
申请日：2004-09-22
Applicant: Hongxin Fang , Hongtao Ma , Baiqing Zhang , Baohua Chen , Somen Choudhury
Inventor： Hongxin Fang , Hongtao Ma , Baiqing Zhang , Baohua Chen , Somen Choudhury
CPC classification number: C23F4/00 , C23C14/022 , C23C14/221 , G11B5/255 , G11B5/3106 , G11B5/3163 , G11B5/8408
Abstract: A thin-film forming method, which includes the steps of: (1) holding at least one object in a chamber; (2) depositing a film-forming material on the object; (3) etching the forming material while depositing is conducted. In the present invention, the depositing and etching are controlled to simultaneously conduct. The invention also disclose a system for performing the method.
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公开(公告)号：US07886423B2
公开(公告)日：2011-02-15
申请号：US11727059
申请日：2007-03-23
Applicant: HongXin Fang , HongTao Ma , Yu Ding , Heng Qiao , BaoHua Chen
Inventor： HongXin Fang , HongTao Ma , Yu Ding , Heng Qiao , BaoHua Chen
CPC classification number: G11B5/3163 , G11B5/3116 , G11B5/3173 , Y10T29/49032 , Y10T29/49041 , Y10T29/49052
Abstract: A method for forming micro-texture on ABS of a slider, includes steps of: positioning sliders arranged in arrays on a tray, each slider having a pole tip facing upward; loading the tray into a processing chamber, and evacuating the processing chamber to a preset pressure; introducing a mixture gas of inert gas and hydrocarbon gas into the processing chamber, and ionizing the mixture gas to produce ion beams; exposing the sliders to the ion beam for etching so as to form micro-texture with two-step structure on the ABS of the slider. The invention also discloses a method of manufacturing a slider having micro-texture.
Abstract translation: 一种用于在滑块的ABS上形成微纹理的方法，包括以下步骤：将排列成阵列的滑块定位在托盘上，每个滑块具有朝上的极尖; 将托盘装载到处理室中，并将处理室抽空至预设压力; 将惰性气体和烃气体的混合气体引入处理室，并将混合气体离子化以产生离子束; 将滑块暴露于离子束进行蚀刻，以便在滑块的ABS上形成具有两步结构的微纹理。 本发明还公开了一种制造具有微纹理的滑块的方法。
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