System for monitoring temperature and slope of a wafer and a method thereof
    1.
    发明授权
    System for monitoring temperature and slope of a wafer and a method thereof 有权
    用于监测晶片的温度和斜率的系统及其方法

    公开(公告)号:US08013748B2

    公开(公告)日:2011-09-06

    申请号:US12327218

    申请日:2008-12-03

    CPC classification number: H01L21/67248

    Abstract: A method for monitoring the temperature and slope of a wafer is presented, and the steps of the method comprises: (a) providing a cooling machine, a monitoring system, a sensing module, and a wafer; (b) cooling the wafer by the cooling machine; (c) sensing all regions of the wafer by the sensing module, and detecting the temperature and slope of the wafer relative to the cooling machine; (d) if the wafer's temperature is higher than a set temperature, the monitoring system outputs a first alarm signal, if the wafer's slope is greater than a set slope, the monitoring system outputs a second alarm signal.

    Abstract translation: 提出了一种用于监测晶片的温度和斜率的方法,该方法的步骤包括:(a)提供冷却机,监测系统,感测模块和晶片; (b)通过冷却机冷却晶片; (c)通过感测模块感测晶片的所有区域,以及检测晶片相对于冷却机的温度和斜率; (d)如果晶片的温度高于设定温度,则监视系统输出第一报警信号,如果晶片的斜率大于设定的斜率,则监视系统输出第二报警信号。

    Air Conditioner Water Pump Energy Saving Apparatus
    2.
    发明申请
    Air Conditioner Water Pump Energy Saving Apparatus 审中-公开
    空调水泵节能装置

    公开(公告)号:US20100131111A1

    公开(公告)日:2010-05-27

    申请号:US12642776

    申请日:2009-12-19

    Applicant: Jen-Jui Cheng

    Inventor: Jen-Jui Cheng

    Abstract: An air-conditioner's electricity bill is often the biggest ticket item in commercial building's operating expense. Conventionally, the condensing unit, or the compressor, and the cooling water tower of a typical split air conditioner system are controlled independently. The cooling water pump for the cooling water tower is usually turned on with full power when the air conditioner is on, irrelevant of the season, the weather or the humidity. The apparatus of this invention frequency-controls the cooling water pump motor to regulate the pump motor load and to achieve the energy savings, based on the factors, such as the temperature difference between the cooling water and the return water, etc.This apparatus of this invention includes a return-water temperature sensor, a cooling water temperature sensor, a CPU circuit board assembly, a compressor high pressure loop sensor, a compressor low pressure loop tensor, and a compressor status sensor.

    Abstract translation: 空调的电费通常是商业建筑运营费用中最大的票据。 通常,独立地控制典型分体式空调系统的冷凝单元或压缩机以及冷却水塔。 冷却水塔的冷却水泵通常在空调打开时全功率打开,与季节,天气或湿度无关。 本发明的装置对冷却水泵电机进行频率控制,以调节泵电机的负载,并根据诸如冷却水和回水等之间的温差等因素实现节能。该装置 本发明包括回水温度传感器,冷却水温度传感器,CPU电路板组件,压缩机高压环路传感器,压缩机低压环张力和压缩机状态传感器。

    Mini clean room for preventing wafer pollution and using method thereof
    3.
    发明授权
    Mini clean room for preventing wafer pollution and using method thereof 有权
    用于防止晶片污染的微型洁净室及其使用方法

    公开(公告)号:US08083463B2

    公开(公告)日:2011-12-27

    申请号:US12269309

    申请日:2008-11-12

    CPC classification number: H01L21/6719 H01L21/67126 H01L21/67742 Y10S414/139

    Abstract: A mini clean room for preventing wafer pollution includes a robot arm, a clean room body slidably disposed on the robot arm and at least one lock unit which is rotatably connected with the clean room body. During operation, the robot arm extends out of the clean room body to carry a wafer waiting to be processed, and then moves back into the clean room body which can provide an isolated and protected space for the wafer to avoid that the wafer is polluted. The present invention also discloses a method of using a mini clean room for preventing wafer pollution.

    Abstract translation: 用于防止晶片污染的微型洁净室包括机器人臂,可滑动地设置在机器人臂上的洁净室主体和与洁净室主体可旋转地连接的至少一个锁定单元。 在操作期间,机器人手臂从洁净室体延伸出来,以携带待处理的晶片,然后移回到洁净室体内,这可以为晶片提供隔离和保护的空间,以避免晶片被污染。 本发明还公开了一种使用微型洁净室防止晶片污染的方法。

    WAFER CLEANING MACHINE AND CLEANING METHOD THEREOF
    4.
    发明申请
    WAFER CLEANING MACHINE AND CLEANING METHOD THEREOF 审中-公开
    WAFER清洗机及其清洗方法

    公开(公告)号:US20100269856A1

    公开(公告)日:2010-10-28

    申请号:US12542202

    申请日:2009-08-17

    CPC classification number: H01L21/67046 H01L21/67051 H01L21/6719

    Abstract: The present invention provides a wafer cleaning machine, which includes a machine base, a rotating disk for bearing and driving a wafer, a first nozzle for spraying ion water to the surface of wafer, a brushing module, and a second nozzle. The rotating disk is connected with the machine base. The first nozzle is connected with the machine base and it is above the rotating disk. The brushing module is connected with the machine base and it is above the rotating disk. The second nozzle is connected with the machine base and it is above the rotating disk.

    Abstract translation: 本发明提供了一种晶片清洗机,其包括机座,用于轴承和驱动晶片的旋转盘,用于将离子水喷射到晶片表面的第一喷嘴,刷洗模块和第二喷嘴。 旋转盘与机座连接。 第一个喷嘴与机座相连,并且位于旋转盘的上方。 刷子模块与机座连接,位于旋转盘的上方。 第二个喷嘴与机座相连,并且位于旋转盘的上方。

    SYSTEM FOR MONITORING TEMPERATURE AND SLOPE OF A WAFER AND A METHOD THEREOF
    5.
    发明申请
    SYSTEM FOR MONITORING TEMPERATURE AND SLOPE OF A WAFER AND A METHOD THEREOF 有权
    用于监测波浪的温度和坡度的系统及其方法

    公开(公告)号:US20100079296A1

    公开(公告)日:2010-04-01

    申请号:US12327218

    申请日:2008-12-03

    CPC classification number: H01L21/67248

    Abstract: A method for monitoring the temperature and slope of a wafer is presented, and the steps of the method comprises: (a) providing a cooling machine, a monitoring system, a sensing module, and a wafer; (b) cooling the wafer by the cooling machine; (c) sensing all regions of the wafer by the sensing module, and detecting the temperature and slope of the wafer relative to the cooling machine; (d) if the wafer's temperature is higher than a set temperature, the monitoring system outputs a first alarm signal, if the wafer's slope is greater than a set slope, the monitoring system outputs a second alarm signal.

    Abstract translation: 提出了一种用于监测晶片的温度和斜率的方法,该方法的步骤包括:(a)提供冷却机,监测系统,感测模块和晶片; (b)通过冷却机冷却晶片; (c)通过感测模块感测晶片的所有区域,以及检测晶片相对于冷却机的温度和斜率; (d)如果晶片的温度高于设定温度,则监视系统输出第一报警信号,如果晶片的斜率大于设定的斜率,则监视系统输出第二报警信号。

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