Abstract:
A method for monitoring the temperature and slope of a wafer is presented, and the steps of the method comprises: (a) providing a cooling machine, a monitoring system, a sensing module, and a wafer; (b) cooling the wafer by the cooling machine; (c) sensing all regions of the wafer by the sensing module, and detecting the temperature and slope of the wafer relative to the cooling machine; (d) if the wafer's temperature is higher than a set temperature, the monitoring system outputs a first alarm signal, if the wafer's slope is greater than a set slope, the monitoring system outputs a second alarm signal.
Abstract:
An air-conditioner's electricity bill is often the biggest ticket item in commercial building's operating expense. Conventionally, the condensing unit, or the compressor, and the cooling water tower of a typical split air conditioner system are controlled independently. The cooling water pump for the cooling water tower is usually turned on with full power when the air conditioner is on, irrelevant of the season, the weather or the humidity. The apparatus of this invention frequency-controls the cooling water pump motor to regulate the pump motor load and to achieve the energy savings, based on the factors, such as the temperature difference between the cooling water and the return water, etc.This apparatus of this invention includes a return-water temperature sensor, a cooling water temperature sensor, a CPU circuit board assembly, a compressor high pressure loop sensor, a compressor low pressure loop tensor, and a compressor status sensor.
Abstract:
A mini clean room for preventing wafer pollution includes a robot arm, a clean room body slidably disposed on the robot arm and at least one lock unit which is rotatably connected with the clean room body. During operation, the robot arm extends out of the clean room body to carry a wafer waiting to be processed, and then moves back into the clean room body which can provide an isolated and protected space for the wafer to avoid that the wafer is polluted. The present invention also discloses a method of using a mini clean room for preventing wafer pollution.
Abstract:
The present invention provides a wafer cleaning machine, which includes a machine base, a rotating disk for bearing and driving a wafer, a first nozzle for spraying ion water to the surface of wafer, a brushing module, and a second nozzle. The rotating disk is connected with the machine base. The first nozzle is connected with the machine base and it is above the rotating disk. The brushing module is connected with the machine base and it is above the rotating disk. The second nozzle is connected with the machine base and it is above the rotating disk.
Abstract:
A method for monitoring the temperature and slope of a wafer is presented, and the steps of the method comprises: (a) providing a cooling machine, a monitoring system, a sensing module, and a wafer; (b) cooling the wafer by the cooling machine; (c) sensing all regions of the wafer by the sensing module, and detecting the temperature and slope of the wafer relative to the cooling machine; (d) if the wafer's temperature is higher than a set temperature, the monitoring system outputs a first alarm signal, if the wafer's slope is greater than a set slope, the monitoring system outputs a second alarm signal.