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    Apparatus for treating thin film and method of treating thin film
    1.
    发明授权
    Apparatus for treating thin film and method of treating thin film 有权
    薄膜处理设备及薄膜处理方法

    公开(公告)号：US09200369B2

    公开(公告)日：2015-12-01

    申请号：US11286602

    申请日：2005-11-23

    Applicant: Jong-Chul Lee ,  Sang-Hyuck Park

    Inventor： Jong-Chul Lee ,  Sang-Hyuck Park

    IPC: C23C16/48 ,  C23C16/04 ,  C23C16/455

    CPC classification number: C23C16/483 ,  C23C16/047 ,  C23C16/45517

    Abstract: An apparatus and method for treating a thin film on a substrate is presented. The substrate is loaded on a fixed stage adapted to receive the substrate. An energy source is aligned through a space in a gas shield so as to face a thin film on the substrate to be repaired after the substrate is loaded. A protective insulating layer is removed by radiation from the energy source, a reaction gas is supplied to the space, and an open and/or short circuit in the thin film is repaired. The energy source and/or gas shield is moved during the repair, rather than the stage. If the energy source and gas shield are both moved, they are moved in opposite directions, either independently or dependent on each other, by first and second operating units, respectively.

    Abstract translation: 提出了一种用于处理衬底上薄膜的设备和方法。 衬底被装载在适于接收衬底的固定台上。 能量源通过气体屏蔽中的空间对准，以便在衬底被加载之后面对要修复的衬底上的薄膜。 通过来自能量源的辐射来去除保护性绝缘层，反应气体被供应到该空间，并且修复薄膜中的开路和/或短路。 能量源和/或气体屏蔽在修复期间而不是阶段移动。 如果能量源和气体屏蔽都被移动，则它们分别通过第一和第二操作单元独立地或相互依赖地沿相反方向移动。

    MOLD FOR FORMING 3-DIMENSIONAL PATTERN AND METHOD OF MANUFACTURING EXTERIOR MATERIAL FOR HOME APPLIANCE USING THE SAME
    3.
    发明申请
    MOLD FOR FORMING 3-DIMENSIONAL PATTERN AND METHOD OF MANUFACTURING EXTERIOR MATERIAL FOR HOME APPLIANCE USING THE SAME 审中-公开
    用于形成三维图案的模具和使用其制造家用电器的外部材料的方法

    公开(公告)号：US20130105435A1

    公开(公告)日：2013-05-02

    申请号：US13809068

    申请日：2011-09-21

    Applicant: In-Suk Yang ,  Jong-Chul Lee ,  Jae-Eun Lee

    Inventor： In-Suk Yang ,  Jong-Chul Lee ,  Jae-Eun Lee

    IPC: B29C33/42

    CPC classification number: B29C33/424 ,  B29C33/307 ,  B29C33/38 ,  B29C33/42 ,  B41M1/24

    Abstract: A mold for forming a three-dimensional pattern, which can easily provide a three-dimensional surface shape to a molded article and minimize deformation, and a method for manufacturing an exterior material for a home appliance using the same are disclosed. The mold includes a mold section formed of a material, such as metal, Teflon, and rubber, and having a three-dimensional pattern on a molding surface thereof to provide a surface shape of a molded article; and a frame section formed of a material, such as glass or a metal honeycomb panel, and attached to an outer surface of the mold section to reinforce the mold section.

    Abstract translation: 公开了一种用于形成三维图案的模具，其可以容易地提供模制品的三维表面形状并使变形最小化，以及用于制造使用其的家用电器的外部材料的制造方法。 模具包括由诸如金属，特氟隆和橡胶的材料形成的模具部分，并且在其模制表面上具有三维图案以提供模制品的表面形状; 以及由诸如玻璃或金属蜂窝板的材料形成的框架部分，并且附接到模具部分的外表面以加强模具部分。

    NANOHYBRID NITROGEN MONOXIDE DETECTING SENSOR AND A PRODUCTION METHOD THEREFOR
    4.
    发明申请
    NANOHYBRID NITROGEN MONOXIDE DETECTING SENSOR AND A PRODUCTION METHOD THEREFOR 有权
    NANOHYBRID NITROGEN一氧化氮检测传感器及其生产方法

    公开(公告)号：US20120244626A1

    公开(公告)日：2012-09-27

    申请号：US13265095

    申请日：2010-03-16

    Applicant: Eunhae Koo ,  Sung-ho Yoon ,  Jong-chul Lee ,  Jong-hee Kim

    Inventor： Eunhae Koo ,  Sung-ho Yoon ,  Jong-chul Lee ,  Jong-hee Kim

    IPC: G01N21/64 ,  B82Y15/00

    CPC classification number: G01N21/6489 ,  G01N33/18 ,  G01N33/1826 ,  G01N2021/6432 ,  Y10S977/70 ,  Y10S977/773 ,  Y10S977/774 ,  Y10T436/17 ,  Y10T436/177692

    Abstract: The present invention provides a nanohybrid type nitrogen monoxide detecting sensor and a production method therefor in which the nanohybrid type nitrogen monoxide detecting sensor includes a fluorescent semiconducting quantum dot and a transition metal compound.Employing a nanohybrid structure including semiconducting quantum dot nano-particles combined with a molecule recognizer selectively looming a bonding to nitrogen monoxide, the nitrogen monoxide detecting sensor is enabled to detect an infinitesimal amount of nitrogen monoxide by bringing about photoluminescence upon detection of nitrogen monoxide.

    Abstract translation: 本发明提供一种纳米杂化型一氧化氮检测传感器及其制造方法，其中纳米杂交型一氧化氮检测传感器包括荧光半导体量子点和过渡金属化合物。 采用纳米杂交结构，包括与分子识别器结合的半导体量子点纳米颗粒选择性地与一氧化氮结合，一氧化氮检测传感器能够通过在检测到一氧化氮时产生光致发光来检测无限量的一氧化氮。

    STEAM STERILIZATION APPARATUS
    5.
    发明申请
    STEAM STERILIZATION APPARATUS 审中-公开
    蒸汽灭菌装置

    公开(公告)号：US20120045365A1

    公开(公告)日：2012-02-23

    申请号：US13259050

    申请日：2010-04-20

    Applicant: Jong Chul Lee

    Inventor： Jong Chul Lee

    IPC: A61L2/22

    CPC classification number: A61L2/07 ,  A61L2/18 ,  B05B7/2429

    Abstract: The present invention relates to a steam sterilization apparatus, and more particularly, to a steam sterilization apparatus in which a crack in a vaporization space is minimized to achieve maximized water vaporization efficiency and to reduce the size of the apparatus, and which prevents liquid phase water from being sprayed at an early stage of operation of the apparatus to achieve a steam sterilization effect from the early stage of operation of the apparatus.

    Abstract translation: 蒸汽灭菌装置技术领域本发明涉及一种蒸汽消毒装置，更具体地说，涉及一种蒸汽消毒装置，其中蒸发空间中的裂缝被最小化以实现最大化的水汽化效率并减小装置的尺寸，并且防止液相水 在装置的早期阶段被喷洒以从设备的早期操作实现蒸汽灭菌效果。

    Apparatus for treating thin film and method of treating thin film
    7.
    发明申请
    Apparatus for treating thin film and method of treating thin film 有权

    公开(公告)号：US20060144687A1

    公开(公告)日：2006-07-06

    申请号：US11286602

    申请日：2005-11-23

    Applicant: Jong-Chul Lee ,  Sang-Hyuck Park

    Inventor： Jong-Chul Lee ,  Sang-Hyuck Park

    IPC: B01J19/12 ,  B01J19/08

    CPC classification number: C23C16/483 ,  C23C16/047 ,  C23C16/45517

    Abstract: An apparatus and method for treating a thin film on a substrate is presented. The substrate is loaded on a fixed stage adapted to receive the substrate. An energy source is aligned through a space in a gas shield so as to face a thin film on the substrate to be repaired after the substrate is loaded. A protective insulating layer is removed by radiation from the energy source, a reaction gas is supplied to the space, and an open and/or short circuit in the thin film is repaired. The energy source and/or gas shield is moved during the repair, rather than the stage. If the energy source and gas shield are both moved, they are moved in opposite directions, either independently or dependent on each other, by first and second operating units, respectively.

    GASKET
    9.
    发明申请
    GASKET 审中-公开

    公开(公告)号：US20190234516A1

    公开(公告)日：2019-08-01

    申请号：US16331693

    申请日：2017-09-07

    Applicant: Jong Chul LEE

    Inventor： Jong Chul LEE

    IPC: F16J15/08 ,  F16L17/06 ,  F16L23/18

    CPC classification number: F16J15/08 ,  F16J15/06 ,  F16L17/06 ,  F16L23/16 ,  F16L23/18

    Abstract: Provided is a gasket, and more particularly, to a gasket including a C-ring end formed at at least one side of a kammprofile. According to the present invention, a higher bolting force and restoring force may be secured than those of other gaskets having the same size as the gasket. Furthermore, a core spring may be easily fixed and attached to the gasket through the C-ring end formed at the kammprofile without an external jacket. Accordingly, production costs may be decreased by simplifying the structure of the gasket as described above.

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