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    Self-modifying FPGA for anti-tamper applications
    1.
    发明授权
    Self-modifying FPGA for anti-tamper applications 有权
    用于防篡改应用的自修改FPGA

    公开(公告)号：US08896346B1

    公开(公告)日：2014-11-25

    申请号：US13421052

    申请日：2012-03-15

    Applicant: James M. Lewis ,  Joey R. Haddock ,  Dane R. Walther

    Inventor： James M. Lewis ,  Joey R. Haddock ,  Dane R. Walther

    IPC: H03K19/177

    CPC classification number: H03K19/177 ,  G06F2213/0038 ,  H03K19/1776 ,  H03K19/17768

    Abstract: A self-modifying FPGA system includes an FPGA and a configuration memory coupled to the FPGA for providing the FPGA with configuration data including SAFE configuration data and dormant configuration data. The SAFE configuration data is initially loaded to the FPGA and the FPGA is configured to a safe operating mode. Upon a determination to proceed to a next step of self modification, dormant configuration data contained in the configuration memory is loaded into the FPGA and the FPGA is configured to a secure operating mode.

    Abstract translation: 自修改FPGA系统包括FPGA和与FPGA相连的配置存储器，为FPGA提供包括SAFE配置数据和休眠配置数据的配置数据。 SAFE配置数据最初加载到FPGA，FPGA被配置为安全的操作模式。 在确定进行自修改的下一步骤时，配置存储器中包含的休眠配置数据被加载到FPGA中，并且FPGA被配置为安全的操作模式。

    System and method for enabling a graphical program to propagate attributes of inputs and outputs of blocks
    2.
    发明授权
    System and method for enabling a graphical program to propagate attributes of inputs and outputs of blocks 有权
    用于使图形程序能够传播块的输入和输出的属性的系统和方法

    公开(公告)号：US08046739B2

    公开(公告)日：2011-10-25

    申请号：US11462551

    申请日：2006-08-04

    Applicant: Matthew C. Curtis ,  James M. Lewis

    Inventor： Matthew C. Curtis ,  James M. Lewis

    IPC: G06F9/44

    CPC classification number: G06F8/34

    Abstract: A system and method for creating a graphical program. A function block may be displayed in a graphical program. The graphical program may include a plurality of interconnected blocks which visually indicate the functionality of the program. Additionally, the function block may be operable to perform a first function and may include one or more inputs and one or more outputs. User input specifying an attribute behavior for the function block may be received, e.g., via a menu which allows selection or definition of attribute behaviors, a graphical wizard, or another graphical program, among other methods. The attribute behavior specified for the function block may be usable to determine at attribute of at least a subset of the one or more outputs of the function block based on an attribute of at least one of the one or more inputs to the function block.

    Abstract translation: 一种用于创建图形程序的系统和方法。 功能块可以在图形程序中显示。 图形程序可以包括多个互连的块，其在视觉上指示程序的功能。 另外，功能块可以用于执行第一功能并且可以包括一个或多个输入和一个或多个输出。 可以例如经由允许选择或定义属性行为的菜单，图形向导或另一图形程序以及其他方法来接收指定功能块的属性行为的用户输入。 为功能块指定的属性行为可以用于基于功能块的一个或多个输入中的至少一个的属性来确定功能块的一个或多个输出的至少一个子集的属性。

    Beam stabilizer
    3.
    发明申请
    Beam stabilizer 审中-公开
    梁稳定器

    公开(公告)号：US20090217616A1

    公开(公告)日：2009-09-03

    申请号：US12387375

    申请日：2009-05-01

    Applicant: Lawrence A. Ennis ,  James M. Lewis

    Inventor： Lawrence A. Ennis ,  James M. Lewis

    IPC: E04C5/00

    CPC classification number: E04G21/185 ,  E04C2003/026 ,  E04G21/1891

    Abstract: A beam stabilizer, comprising a threaded tubular part, and a screw like part, threaded together, and can be applied to either side of an I-beam, set within a foundation wall cavity, and tightened in place so as to fix the beam within the cavity at its precise set location, to be sure that the beam remains in place, once installed, during building of a residence or small building.

    Abstract translation: 光束稳定器，包括螺纹管状部分和螺纹状部分，螺纹连接在一起，并且可以施加到设置在基础壁腔内的工字梁的任一侧，并且将其紧固到位，以将梁固定在 在其精确的设置位置处的空腔，以确保在建筑住宅或小建筑物期间梁被保持在适当位置。

    Driver system for MOSFET based, high voltage electronic relays for AC power switching and inductive loads
    4.
    发明授权
    Driver system for MOSFET based, high voltage electronic relays for AC power switching and inductive loads 有权
    驱动器系统，用于基于MOSFET的高压电子继电器，用于交流电源开关和电感负载

    公开(公告)号：US07439636B2

    公开(公告)日：2008-10-21

    申请号：US11702535

    申请日：2007-02-06

    Applicant: James M. Lewis

    Inventor： James M. Lewis

    IPC: H01H47/24 ,  H01H47/00

    CPC classification number: H03K17/691 ,  H03K17/6874 ,  H03K17/78 ,  H03K17/785 ,  H03K2217/0081 ,  Y10T307/773 ,  Y10T307/878 ,  Y10T307/885

    Abstract: A method and apparatus provides for high-speed switching of high-voltage and high power MOSFET-based solid state relays. A driver for a MOSFET based, high voltage, high current electronic relay includes a current supply for actuating the switching circuit and a transformer arrangement coupled to the current supply for receiving the supply of current from the current supply. The transformer arrangement is adapted for coupling with the switching circuit for selectively applying a predetermined voltage to the switching circuit which establishes the switching circuit in switch conducting or switch isolation.

    Abstract translation: 一种方法和装置提供高速和高功率基于MOSFET的固态继电器的高速切换。 用于基于MOSFET的高电压大电流电子继电器的驱动器包括用于致动开关电路的电流源和耦合到电流源的变压器装置，用于接收来自电流源的电流供应。 变压器布置适于与开关电路耦合，用于选择性地向开关电路施加预定电压，该开关电路在开关导通或开关隔离中建立开关电路。

    Decorative ornament
    5.
    发明授权
    Decorative ornament 失效
    装饰装饰品

    公开(公告)号：US06672738B1

    公开(公告)日：2004-01-06

    申请号：US09717031

    申请日：2000-11-22

    Applicant: James M. Lewis ,  Elizabeth B. Lewis

    Inventor： James M. Lewis ,  Elizabeth B. Lewis

    IPC: F21V2304

    CPC classification number: B44C5/005 ,  A47G33/06 ,  F21S4/10 ,  F21W2121/00

    Abstract: The invention relates to a decorative ornament. The ornament includes a circuit board shaped in an aesthetically desirable manner to provide a background for the decorative ornament, a plurality of light sources, an integrated circuit and circuit leads being mounted on the circuit board. The circuit leads electrically couple the light sources with the integrated circuit to control the light pattern displayed by the decorative ornament. The circuit leads, light sources and circuit boards working together to create an aesthetically pleasing ornament.

    Abstract translation: 本发明涉及一种装饰装饰品。 装饰品包括以美学上期望的方式成形的电路板，以为装饰性装饰品提供背景，多个光源，集成电路和安装在电路板上的电路引线。 该电路使集成电路将光源电耦合，以控制由装饰装饰品显示的光图案。 电路引线，光源和电路板一起工作，创造出美观的装饰。

    High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants
    6.
    发明授权
    High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants 失效
    高对比度低金属离子正性光致抗蚀剂显影方法使用水性碱溶液与表面活性剂

    公开(公告)号：US4710449A

    公开(公告)日：1987-12-01

    申请号：US823892

    申请日：1986-01-29

    Applicant: James M. Lewis ,  Andrew J. Blakeney

    Inventor： James M. Lewis ,  Andrew J. Blakeney

    IPC: G03C5/00 ,  G03F7/30 ,  G03F7/32 ,  G03F7/26

    CPC classification number: G03F7/322

    Abstract: A novel low metal ion developer composition used in a two step process which provided high contrast images and long developer bath life is provided. The process gives high contrast images. The substrate coated with positive photoresist is exposed then immersed in a "predip" bath, rinsed, and then, immersed in the developer bath, rinsed and dried. This process provided high contrast which does not decrease over the life of the developer system. The system consists of (1) a predip solution containing aqueous non-metal ion organic base and a cationic surfactant adjusted to a concentration that does not give development, and (2) a developer solution containing an aqueous solution of an non-metal ion organic base and a fluorochemical surfactant adjusted to a concentration that provides development. The high contrast is achieved by the cationic surfactant coating the resist and inhibiting the attack on the unexposed resist by the developer while permitting the developer to dissolve away the exposed resist.

    Abstract translation: 提供了一种用于提供高对比度图像和长显影剂浴寿命的两步法中的新型低金属离子显影剂组合物。 该过程给出高对比度图像。 将涂有正性光致抗蚀剂的基材曝光，然后浸入“预浸”浴中，冲洗，然后浸入显影液浴中，冲洗干燥。 该方法提供了高度的对比度，其在显影剂系统的使用寿命期间不会降低。 该系统包括（1）含有非金属离子有机碱水溶液和调节至不产生显影浓度的阳离子表面活性剂的预溶液，和（2）含有非金属离子有机物的水溶液的显影液 碱和氟化物表面活性剂调整至提供显影的浓度。 通过阳离子表面活性剂涂覆抗蚀剂并且通过显影剂抑制对未曝光的抗蚀剂的侵蚀，可以使显影剂溶解掉暴露的抗蚀剂，从而实现高对比度。

    Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant
    7.
    发明授权
    Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant 失效
    用包含羧化表面活性剂的碱性显影剂溶液显影辐射成像光致抗蚀剂的方法

    公开(公告)号：US4670372A

    公开(公告)日：1987-06-02

    申请号：US660600

    申请日：1984-10-15

    Applicant: James M. Lewis ,  Robert A. Owens

    Inventor： James M. Lewis ,  Robert A. Owens

    IPC: G03C1/72 ,  G03F7/00 ,  G03F7/32 ,  H01L21/027 ,  H01L21/30 ,  G03F7/26

    CPC classification number: G03F7/322

    Abstract: A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist.The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a carboxylated surfactant. The incorporation of the carboxylated surfactant provides the unexpected increase in the contrast of the photoresist. The addition of the carboxylated surfactant increases the gamma from a typical photoresist gamma (.gamma.) of 3 or less to a gamma greater than 5.The high contrast photoresist provides linewidth control and affords improved process latitude in photoresist imaging. The linewidth control is particularly critical in cases where fine lines are to be defined in the resist that covers steps of topography on the coated substrate. The higher the contrast, the less affected the resist by the topography, provided the exposure is adequate to expose the resist. The process latitude afforded by the high contrast is a result of the ability to over develop (develop longer) the exposed resist without affecting the unexposed resist in the adjacent areas.

    Abstract translation: 提供正光致抗蚀剂金属离子水性显影剂，其对光致抗蚀剂提供高对比度。 所公开的显影剂包括碱性水溶液如氢氧化钾和羧化表面活性剂的制剂。 羧化表面活性剂的引入提供了光致抗蚀剂的对比度的意外增加。 羧化表面活性剂的添加使得从典型的3或更小的光致抗蚀剂的伽玛（γ）增加到大于5的伽马。高对比度光致抗蚀剂提供线宽控制，并且在光致抗蚀剂成像中提供改进的工艺范围。 在覆盖涂层基底上的形貌的步骤的抗蚀剂中限定细线的情况下，线宽控制是特别关键的。 对比度越高，受地形影响的抗蚀剂越少，只要曝光足以暴露抗蚀剂。 由高对比度提供的工艺纬度是在暴露的抗蚀剂中过度开发（展开更长时间）的能力而不影响相邻区域中未曝光的抗蚀剂的结果。

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