Aqueous coating compositions
    4.
    发明授权
    Aqueous coating compositions 有权
    水性涂​​料组合物

    公开(公告)号:US07049352B2

    公开(公告)日:2006-05-23

    申请号:US10488040

    申请日:2002-09-26

    摘要: Pigmented aqueous coating composition providing good blocking and elasticity properties comprises a blend of a seeded multistage polymer latex(es) having at least one soft and at least one hard polymer phases and a non-film-forming polymer latex(es), the seed polymer(s) having a Tg≧10° C. lower than that of the hard polymer phase(s) and preferably having a Tg≧10° C. higher than that of the soft polymer phase(s), and the multistage polymer(s) preferably having amino functionality incorporated by an imination reaction.

    摘要翻译: 提供良好的阻塞和弹性性质的着色水性涂料组合物包括具有至少一种柔软和至少一种硬聚合物相的接种的多级聚合物胶乳和非成膜聚合物胶乳(es)的混合物,种子聚合物 具有比硬质聚合物相的Tg低= 10℃的Tg,优选比软质聚合物相的Tg> = 10℃,并且多段聚合物 优选具有通过仿制反应并入的氨基官能团。

    MEASUREMENT APPARATUS AND METHOD
    6.
    发明申请
    MEASUREMENT APPARATUS AND METHOD 审中-公开
    测量装置和方法

    公开(公告)号:US20100020300A1

    公开(公告)日:2010-01-28

    申请号:US12506481

    申请日:2009-07-21

    IPC分类号: G03B27/54

    摘要: According to an aspect of the present invention, a method of controlling a measurement apparatus for determining a property of an individually controllable element of an array of individually controllable elements, the array of individually controllable elements being capable of controlling a distribution of a beam of radiation, is disclosed. The method includes, for a sequence of a plurality of individually controllable elements: directing a measurement beam of radiation at an individually controllable element of the plurality of individually controllable elements; and detecting the measurement beam once it has been re-directed by the individually controllable element, wherein the sequence in which the method is undertaken for the plurality of individually controllable elements is related to the orientation of the plurality of individually controllable elements when the plurality of individually controllable elements are oriented to control a distribution of a beam of radiation.

    摘要翻译: 根据本发明的一个方面,一种控制测量装置的方法,所述测量装置用于确定独立可控元件阵列的独立可控元件的特性,所述独立可控元件的阵列能够控制辐射束的分布 ,被披露。 该方法包括:对于多个独立可控元件的序列:将测量光束射向多个独立可控元件的独立可控元件; 并且一旦所述测量光束被所述可独立控制的元件重新引导,就检测所述测量光束,其中,所述多个独立可控元件进行所述方法的顺序与所述多个独立可控元件的取向相关, 独立可控元件被定向成控制辐射束的分布。

    Lithographic apparatus and device manufacturing method
    7.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US07532308B2

    公开(公告)日:2009-05-12

    申请号:US11224309

    申请日:2005-09-13

    申请人: Willem Jan Bouman

    发明人: Willem Jan Bouman

    IPC分类号: G03B27/54

    摘要: A uniformity controller is arranged to control a profile of a radiation intensity along the length of a target portion of a substrate so as to substantially compensate for irradiation-induced variation of the profile with respect to time. The uniformity controller includes a variable filter interposed between the illumination system and the target portion and arranged to control the relative values of the intensity applied at a series of positions within the target portion of the substrate so as to substantially compensate for variation of the profile with respect to time. In this manner the radiation intensity is controlled at a series of positions within the target portion so as to compensate for variation of the intensity profile with time.

    摘要翻译: 均匀性控制器被布置成控制沿着衬底的目标部分的长度的辐射强度的轮廓,以便基本上补偿轮廓相对于时间的照射引起的变化。 均匀性控制器包括插入在照明系统和目标部分之间的可变滤波器,并布置成控制在衬底的目标部分内的一系列位置处施加的强度的相对值,以便基本上补偿轮廓的变化, 尊重时间 以这种方式,辐射强度被控制在目标部分内的一系列位置处,以便补偿强度分布随时间的变化。