Planar-parallactic golf alignment aide
    1.
    发明授权
    Planar-parallactic golf alignment aide 失效
    平面高尔夫对准助手

    公开(公告)号:US07052409B2

    公开(公告)日:2006-05-30

    申请号:US10808710

    申请日:2004-03-22

    申请人: Jason Goldsmith

    发明人: Jason Goldsmith

    IPC分类号: A63B53/04

    摘要: A Planar-Parallactic Golf Alignment Aide is disclosed. Also disclosed is a device that provides the golfer with a planar alignment sight line for aligning the club face with the target. The invention further provides the golfer with a parallactic alignment sight line for placing his or her head in the proper and repeatable position in order to eliminate unintentional stance variations. The aide may be incorporated within the club head and operate by aligning an aperture or line with the projected image of that aperture or line to use the phenomena of parallax for head alignment. The aperture or line is formed in the top of a dome, and the projected image then appears on a projection surface below the dome. The device may either be an attachment for a conventional club head, or may incorporated into the head itself.

    摘要翻译: 公开了一种平面高尔夫球场对准助手。 还公开了一种向高尔夫球手提供平面对准视线以将球杆面与目标对准的装置。 本发明进一步提供高尔夫球手具有用于将他或她的头部放置在适当且可重复的位置的准直瞄准线,以消除无意的姿态变化。 辅助器可以被结合在球杆头内并且通过将孔或线与该孔或线的投影图像对准以使用用于头部对准的视差现象来操作。 孔或线形成在圆顶的顶部,然后投影的图像出现在圆顶下方的投影表面上。 该装置可以是常规球杆头的附件,或者可以并入头部本身。

    Ion beam sputter target and method of manufacture
    2.
    发明授权
    Ion beam sputter target and method of manufacture 有权
    离子束溅射靶及其制造方法

    公开(公告)号:US08821701B2

    公开(公告)日:2014-09-02

    申请号:US12792324

    申请日:2010-06-02

    摘要: A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.

    摘要翻译: 用于由至少两个目标瓦片制成的离子束溅射装置中的靶,其中至少两个目标瓦片由不同的化学成分制成并且安装在主瓦片上并几何地布置在主瓦片上以产生期望的化学品 在溅射衬底上的组成。 在替代实施例中,根据溅射膜的期望化学特性,瓷砖的厚度变化。 在另一替代实施例中,目标由按压在绿色状态的塞子组成,它们设置在也形成为绿色状态的主瓦片中形成的空腔中,然后可将该组件压实,然后烧结。

    GREEN READING METHOD AND APPARATUS
    3.
    发明申请
    GREEN READING METHOD AND APPARATUS 审中-公开
    绿色阅读方法和设备

    公开(公告)号:US20130260920A1

    公开(公告)日:2013-10-03

    申请号:US13851507

    申请日:2013-03-27

    申请人: Jason Goldsmith

    发明人: Jason Goldsmith

    IPC分类号: A63B57/00

    摘要: A method and apparatus read the break in a surface and adjust aim accordingly. The method utilizes a green key ball marker comprising indicia of slope, and describes how to determine slope. The marker then allows for quantifying break and provides alignment assistance.

    摘要翻译: 一种方法和装置读取表面上的断裂并相应地调整目标。 该方法利用包括斜率标记的绿色键球标记,并描述如何确定斜率。 然后标记允许量化断裂并提供对准辅助。

    ION BEAM SPUTTER TARGET AND METHOD OF MANUFACTURE
    5.
    发明申请
    ION BEAM SPUTTER TARGET AND METHOD OF MANUFACTURE 有权
    离子束溅射靶和制造方法

    公开(公告)号:US20110297535A1

    公开(公告)日:2011-12-08

    申请号:US12792324

    申请日:2010-06-02

    IPC分类号: C23C14/34 B32B38/00

    摘要: A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.

    摘要翻译: 用于由至少两个目标瓦片制成的离子束溅射装置中的靶,其中至少两个目标瓦片由不同的化学成分制成并且安装在主瓦片上并几何地布置在主瓦片上以产生期望的化学品 在溅射衬底上的组成。 在替代实施例中,根据溅射膜的期望化学特性,瓷砖的厚度变化。 在另一替代实施例中,目标由按压在绿色状态的塞子组成,它们设置在也形成为绿色状态的主瓦片中形成的空腔中,然后可将该组件压实然后烧结。