Short contact time FCC process
    2.
    发明申请
    Short contact time FCC process 审中-公开
    FCC接触时间短

    公开(公告)号:US20060231458A1

    公开(公告)日:2006-10-19

    申请号:US11354701

    申请日:2006-02-14

    Abstract: This invention relates to a short contact time (SCT) fluid catalytic cracking (FCC) process for improving the yield of distillates and gasoline. An SCT FCC process combines staging the FCC conversion process with interstage molecular separation of multi-ring aromatic species wherein separation of cat bottoms and recycling the separated stream containing saturates and 1- and 2-ring aromatics to the FCC unit results in improved yields of gasoline and other distillates while decreasing bottoms yields.

    Abstract translation: 本发明涉及用于提高馏出物和汽油产率的短接触时间(SCT)流化催化裂化(FCC)方法。 SCT FCC工艺将FCC转化过程与多环芳烃物质的分级分离分离相结合,其中分离催化剂底物并将含有饱和物和1-和2-环芳烃的分离物流再循环到FCC单元,从而提高汽油产率 和其他馏出物,同时降低底部产率。

    Ultra-hard low friction coating based on AlMgB14 for reduced wear of MEMS and other tribological components and system
    5.
    发明申请
    Ultra-hard low friction coating based on AlMgB14 for reduced wear of MEMS and other tribological components and system 有权
    基于AlMgB14的超硬低摩擦涂层,减少MEMS和其他摩擦组件和系统的磨损

    公开(公告)号:US20050100748A1

    公开(公告)日:2005-05-12

    申请号:US10946051

    申请日:2004-09-21

    Abstract: Performance and reliability of microelectromechanical system (MEMS) components enhanced dramatically through the incorporation of protective thin film coatings. Current-generation MEMS devices prepared by the LIGA technique employ transition metals such as Ni, Cu, Fe, or alloys thereof, and hence lack stability in oxidizing, corrosive, and/or high temperature environments. Fabrication of a superhard, self-lubricating coating based on a ternary boride compound AlMgB14 is described in this letter as a potential breakthrough in protective coating technology for LIGA microdevices. Nanoindentation tests show that hardness of AlMgB14 films prepared by pulsed laser deposition ranges from 45 GPa to 51 GPa, when deposited at room temperature and 573 K, respectively. Extremely low friction coefficients of 0.04-0.05, which are thought to result from a self-lubricating effect, have also been confirmed by nanoscratch tests on the AlMgB14 films. Transmission electron microscopy studies show that the as-deposited films are amorphous, regardless of substrate temperature; however, analysis of FTIR spectra suggests that the higher substrate temperature facilitates formation of the B12 icosahedral framework, therefore leading to the higher hardness.

    Abstract translation: 微机电系统(MEMS)组件的性能和可靠性通过并入保护性薄膜涂层而显着提高。 通过LIGA技术制备的当前一代MEMS器件采用过渡金属如Ni,Cu,Fe或其合金,因此在氧化,腐蚀性和/或高温环境中缺乏稳定性。 在本文中描述了基于三元硼化物AlMgB 14的超硬自润滑涂层的制造,作为LIGA微型器件的保护涂层技术的潜在突破。 纳米压痕测试显示,当分别在室温和573K下沉积时,通过脉冲激光沉积制备的AlMgB 14 N膜的硬度范围为45GPa至51GPa。 认为是由自润滑效应引起的非常低的摩擦系数0.04-0.05也已经通过AlMgB 14膜的纳米尺度试验证实。 透射电子显微镜研究表明,沉积膜是无定形的,不管基底温度如何; 然而,FTIR光谱的分析表明较高的底物温度有助于形成B 12二十面体骨架,因此导致更高的硬度。

    Ion beam sputter target and method of manufacture
    6.
    发明授权
    Ion beam sputter target and method of manufacture 有权
    离子束溅射靶及其制造方法

    公开(公告)号:US08821701B2

    公开(公告)日:2014-09-02

    申请号:US12792324

    申请日:2010-06-02

    CPC classification number: C23C14/3414 C23C14/3407 C23C14/46

    Abstract: A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.

    Abstract translation: 用于由至少两个目标瓦片制成的离子束溅射装置中的靶,其中至少两个目标瓦片由不同的化学成分制成并且安装在主瓦片上并几何地布置在主瓦片上以产生期望的化学品 在溅射衬底上的组成。 在替代实施例中,根据溅射膜的期望化学特性,瓷砖的厚度变化。 在另一替代实施例中,目标由按压在绿色状态的塞子组成,它们设置在也形成为绿色状态的主瓦片中形成的空腔中,然后可将该组件压实,然后烧结。

    ION BEAM SPUTTER TARGET AND METHOD OF MANUFACTURE
    8.
    发明申请
    ION BEAM SPUTTER TARGET AND METHOD OF MANUFACTURE 有权
    离子束溅射靶和制造方法

    公开(公告)号:US20110297535A1

    公开(公告)日:2011-12-08

    申请号:US12792324

    申请日:2010-06-02

    CPC classification number: C23C14/3414 C23C14/3407 C23C14/46

    Abstract: A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.

    Abstract translation: 用于由至少两个目标瓦片制成的离子束溅射装置中的靶,其中至少两个目标瓦片由不同的化学成分制成并且安装在主瓦片上并几何地布置在主瓦片上以产生期望的化学品 在溅射衬底上的组成。 在替代实施例中,根据溅射膜的期望化学特性,瓷砖的厚度变化。 在另一替代实施例中,目标由按压在绿色状态的塞子组成,它们设置在也形成为绿色状态的主瓦片中形成的空腔中,然后可将该组件压实然后烧结。

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