FRICTION- AND WEAR-REDUCING COATING
    1.
    发明申请
    FRICTION- AND WEAR-REDUCING COATING 失效
    摩擦和减磨涂料

    公开(公告)号:US20100028641A1

    公开(公告)日:2010-02-04

    申请号:US12493713

    申请日:2009-06-29

    CPC classification number: C23C14/0605 C23C14/067 Y10T428/26

    Abstract: A coating includes a first layer of a ceramic alloy and a second layer disposed on the first layer and including carbon. The coating has a hardness of from 10 to 20 GPa and a coefficient of friction of less than or equal to 0.12. A method of coating a substrate includes cleaning the substrate, forming the first layer on the substrate, and depositing the second layer onto the first layer to thereby coat the substrate.

    Abstract translation: 涂层包括第一层陶瓷合金和设置在第一层上并包括碳的第二层。 该涂层具有10至20GPa的硬度和小于或等于0.12的摩擦系数。 涂布基板的方法包括清洗基板,在基板上形成第一层,并将第二层沉积到第一层上,从而涂覆基板。

    Friction- and wear-reducing coating
    3.
    发明授权
    Friction- and wear-reducing coating 失效
    摩擦和减磨涂层

    公开(公告)号:US08039096B2

    公开(公告)日:2011-10-18

    申请号:US12493713

    申请日:2009-06-29

    CPC classification number: C23C14/0605 C23C14/067 Y10T428/26

    Abstract: A coating includes a first layer of a ceramic alloy and a second layer disposed on the first layer and including carbon. The coating has a hardness of from 10 to 20 GPa and a coefficient of friction of less than or equal to 0.12. A method of coating a substrate includes cleaning the substrate, forming the first layer on the substrate, and depositing the second layer onto the first layer to thereby coat the substrate.

    Abstract translation: 涂层包括第一层陶瓷合金和设置在第一层上并包括碳的第二层。 该涂层具有10至20GPa的硬度和小于或等于0.12的摩擦系数。 涂布基板的方法包括清洗基板,在基板上形成第一层,并将第二层沉积到第一层上,从而涂覆基板。

    ION BEAM SPUTTER TARGET AND METHOD OF MANUFACTURE
    5.
    发明申请
    ION BEAM SPUTTER TARGET AND METHOD OF MANUFACTURE 有权
    离子束溅射靶和制造方法

    公开(公告)号:US20110297535A1

    公开(公告)日:2011-12-08

    申请号:US12792324

    申请日:2010-06-02

    CPC classification number: C23C14/3414 C23C14/3407 C23C14/46

    Abstract: A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.

    Abstract translation: 用于由至少两个目标瓦片制成的离子束溅射装置中的靶,其中至少两个目标瓦片由不同的化学成分制成并且安装在主瓦片上并几何地布置在主瓦片上以产生期望的化学品 在溅射衬底上的组成。 在替代实施例中,根据溅射膜的期望化学特性,瓷砖的厚度变化。 在另一替代实施例中,目标由按压在绿色状态的塞子组成,它们设置在也形成为绿色状态的主瓦片中形成的空腔中,然后可将该组件压实然后烧结。

    Apparatus for supporting a stepladder in elevated condition
    7.
    发明授权
    Apparatus for supporting a stepladder in elevated condition 失效
    用于在升高状态下支撑梯子的装置

    公开(公告)号:US06193013B1

    公开(公告)日:2001-02-27

    申请号:US09385311

    申请日:1999-08-30

    Applicant: Robert Milner

    Inventor: Robert Milner

    CPC classification number: E06C7/42 E06C7/44

    Abstract: Stepladder support apparatus is used to support the rung side of a stepladder and includes a support member positioned next to the stepladder and one or more open-topped receptacles connected to the support member between its top end and bottom end to receive and support the lower end of the rung side of a stepladder.

    Abstract translation: 梯子支撑装置用于支撑梯子的梯级侧,并且包括邻近梯形梯子定位的支撑构件和一个或多个敞开的容器,其在顶端和底端之间连接到支撑构件,以接收和支撑下端 梯子梯级的一侧。

    Ion beam sputter target and method of manufacture
    8.
    发明授权
    Ion beam sputter target and method of manufacture 有权
    离子束溅射靶及其制造方法

    公开(公告)号:US08821701B2

    公开(公告)日:2014-09-02

    申请号:US12792324

    申请日:2010-06-02

    CPC classification number: C23C14/3414 C23C14/3407 C23C14/46

    Abstract: A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.

    Abstract translation: 用于由至少两个目标瓦片制成的离子束溅射装置中的靶,其中至少两个目标瓦片由不同的化学成分制成并且安装在主瓦片上并几何地布置在主瓦片上以产生期望的化学品 在溅射衬底上的组成。 在替代实施例中,根据溅射膜的期望化学特性,瓷砖的厚度变化。 在另一替代实施例中,目标由按压在绿色状态的塞子组成,它们设置在也形成为绿色状态的主瓦片中形成的空腔中,然后可将该组件压实,然后烧结。

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