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    Methods for accessing a process chamber using a dual zone gas injector with improved optical access
    1.
    发明授权
    Methods for accessing a process chamber using a dual zone gas injector with improved optical access 有权
    使用具有改进的光学访问的双区域气体注入器访问处理室的方法

    公开(公告)号：US08524099B2

    公开(公告)日：2013-09-03

    申请号：US12987030

    申请日：2011-01-07

    申请人： Jeff A. Bogart ,  Leonard Sharpless ,  Harmeet Singh

    发明人： Jeff A. Bogart ,  Leonard Sharpless ,  Harmeet Singh

    IPC分类号： G01L21/30

    CPC分类号： C23C16/513 ,  H01J37/3244

    摘要： Methods for processing events occurring in a process chamber are provided. In one method, an operation includes carrying gas and receiving an optical signal from the process chamber to an analysis tool that operates in response to the optical signal having a signal-to-noise ratio (SNR) for process analysis. And, dividing the carried gas and optical signal into a plurality of separate gas and optical signals between the process chamber and the analysis tool. The dividing is configured through separate apertures so that the apertures collectively maintain the SNR of the optical signal received at the tool. Methods provide a septum in a second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.

    摘要翻译： 提供了用于处理在处理室中发生的事件的方法。 在一种方法中，操作包括携带气体并从处理室接收光信号到响应于具有用于过程分析的信噪比（SNR）的光信号而工作的分析工具。 并且，在处理室和分析工具之间将承载的气体和光信号分成多个单独的气体和光信号。 分隔通过单独的孔配置，使得孔一起保持在工具处接收的光信号的SNR。 方法在第二孔中提供隔膜，将第二孔分成孔，所述孔被构造成减少光学接口窗口上的蚀刻和沉积并维持诊断终点处的期望SNR。

    Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access
    2.
    发明授权
    Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access 有权
    使用具有改进的光学访问的双区域气体注入器来访问处理室的方法和装置

    公开(公告)号：US07928366B2

    公开(公告)日：2011-04-19

    申请号：US11544316

    申请日：2006-10-06

    申请人： Jeff A. Bogart ,  Leonard Sharpless ,  Harmeet Singh

    发明人： Jeff A. Bogart ,  Leonard Sharpless ,  Harmeet Singh

    IPC分类号： H01J49/00

    CPC分类号： C23C16/513 ,  H01J37/3244

    摘要： An injector provides optical access into a process chamber along an axial path from a diagnostic end point outside the process chamber through an optical access window. A hollow housing body receives first and second process gases, and surrounds the axial path. A sleeve in the body is urged against the body to minimize particle generation, and defines a first gas bore injecting the first process gas into the process chamber. A second gas bore of the sleeve surrounds the axial path for injecting the second process gas into the process chamber, allowing an optical signal to have a desired signal-to-noise ratio (SNR) at the end point. Methods provide a septum in the second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.

    摘要翻译： 注射器通过光学访问窗口从处理室外部的诊断终点沿着轴向路径向处理室提供光学访问。 中空的壳体容纳第一和第二处理气体并且包围轴向路径。 身体中的套筒被推靠在身体上以最小化颗粒产生，并且限定将第一工艺气体注入到处理室中的第一气孔。 套筒的第二个气孔围绕轴向路径，用于将第二工艺气体注入到处理室中，从而允许光学信号在终点处具有期望的信噪比（SNR）。 方法在第二孔中提供隔膜，将第二孔分成孔，其被配置为减少光学接口窗口的蚀刻和沉积，并在诊断终点处保持所需的SNR。

    Methods for Accessing a Process Chamber Using a Dual Zone Gas Injector with Improved Optical Access
    3.
    发明申请
    Methods for Accessing a Process Chamber Using a Dual Zone Gas Injector with Improved Optical Access 有权
    使用改进的光学访问的双区域气体喷射器来访问处理室的方法

    公开(公告)号：US20110103805A1

    公开(公告)日：2011-05-05

    申请号：US12987030

    申请日：2011-01-07

    申请人： Jeff A. Bogart ,  Leonard Sharpless ,  Harmeet Singh

    发明人： Jeff A. Bogart ,  Leonard Sharpless ,  Harmeet Singh

    IPC分类号： H04B10/00

    CPC分类号： C23C16/513 ,  H01J37/3244

    摘要： Methods for processing events occurring in a process chamber are provided. In one method, an operation includes carrying gas and receiving an optical signal from the process chamber to an analysis tool that operates in response to the optical signal having a signal-to-noise ratio (SNR) for process analysis. And, dividing the carried gas and optical signal into a plurality of separate gas and optical signals between the process chamber and the analysis tool. The dividing is configured through separate apertures so that the apertures collectively maintain the SNR of the optical signal received at the tool. Methods provide a septum in a second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.

    摘要翻译： 提供了用于处理在处理室中发生的事件的方法。 在一种方法中，操作包括携带气体并从处理室接收光信号到响应于具有用于过程分析的信噪比（SNR）的光信号而工作的分析工具。 并且，在处理室和分析工具之间将承载的气体和光信号分成多个单独的气体和光信号。 分隔通过单独的孔配置，使得孔一起保持在工具处接收的光信号的SNR。 方法在第二孔中提供隔膜，将第二孔分成孔，所述孔被构造成减少光学接口窗口上的蚀刻和沉积并维持诊断终点处的期望SNR。

    Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access
    5.
    发明申请
    Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access 有权
    使用具有改进的光学访问的双区域气体注入器来访问处理室的方法和装置

    公开(公告)号：US20080083883A1

    公开(公告)日：2008-04-10

    申请号：US11544316

    申请日：2006-10-06

    申请人： Jeff A. Bogart ,  Leonard Sharpless ,  Harmeet Singh

    发明人： Jeff A. Bogart ,  Leonard Sharpless ,  Harmeet Singh

    IPC分类号： H01J27/24

    CPC分类号： C23C16/513 ,  H01J37/3244

    摘要： An injector provides optical access into a process chamber along an axial path from a diagnostic end point outside the process chamber through an optical access window. A hollow housing body receives first and second process gases, and surrounds the axial path. A sleeve in the body is urged against the body to minimize particle generation, and defines a first gas bore injecting the first process gas into the process chamber. A second gas bore of the sleeve surrounds the axial path for injecting the second process gas into the process chamber, allowing an optical signal to have a desired signal-to-noise ratio (SNR) at the end point. Methods provide a septum in the second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.

    摘要翻译： 注射器通过光学访问窗口从处理室外部的诊断终点沿着轴向路径向处理室提供光学访问。 中空的壳体容纳第一和第二处理气体并且包围轴向路径。 身体中的套筒被推靠在身体上以最小化颗粒产生，并且限定将第一工艺气体注入到处理室中的第一气孔。 套筒的第二个气孔围绕轴向路径，用于将第二工艺气体注入到处理室中，从而允许光学信号在终点处具有期望的信噪比（SNR）。 方法在第二孔中提供隔膜，将第二孔分成孔，其被配置为减少光学接口窗口的蚀刻和沉积，并在诊断终点处保持所需的SNR。

    Mask plate design
    6.
    发明授权
    Mask plate design 有权
    面膜设计

    公开(公告)号：US07201829B2

    公开(公告)日：2007-04-10

    申请号：US09960236

    申请日：2001-09-20

    申请人： Bulent M. Basol ,  Cyprian Uzoh ,  Jeff A. Bogart

    发明人： Bulent M. Basol ,  Cyprian Uzoh ,  Jeff A. Bogart

    IPC分类号： C25F3/16 ,  C25F5/00 ,  C25D17/00

    CPC分类号： H01L21/76879 ,  B24B37/042 ,  C25D5/02 ,  C25D5/08 ,  C25D5/22 ,  C25D7/12 ,  C25D17/001 ,  C25F7/00 ,  H01L21/2885

    摘要： The present invention includes a mask plate design that includes at least one or a plurality of channels portions on a surface of the mask plate, into which electrolyte solution will accumulate when the mask plate surface is disposed on a surface of wafer, and out of which the electrolyte solution will freely flow. There are also at least one or a plurality of polish portions on the mask plate surface that allow for polishing of the wafer when the mask plate surface is disposed on a surface of wafer.

    摘要翻译： 本发明包括掩模板设计，其包括在掩模板的表面上的至少一个或多个通道部分，当掩模板表面设置在晶片的表面上时，电解质溶液将积聚在其中，并且其中 电解液会自由流动。 掩模板表面上还有至少一个或多个抛光部分，当掩模板表面设置在晶片的表面上时，允许抛光晶片。