公开(公告)号：US20070167029A1

公开(公告)日：2007-07-19

申请号：US11559315

申请日：2006-11-13

申请人： Jeffrey Kowalski ,  Jeffrey Kowalski

发明人： Jeffrey Kowalski ,  Jeffrey Kowalski

IPC分类号： H01L21/31

CPC分类号： H01L21/67115 ,  H01L21/02238 ,  H01L21/02255 ,  H01L21/31662 ,  H01L21/67306

摘要： Thermal treatment is an important process in the manufacture of integrated circuits. As integrated circuits evolve to become smaller and faster, there is an increasing need to for higher precision thermal treatment systems that can efficiently and uniformly heat these circuits without damaging them. Accordingly, the present inventors devised, among other things, an exemplary thermal treatment system that includes a microwave-reflective containment chamber, an inner microwave-transparent process chamber within the containment chamber, a microwave-transparent wafer carrier within the process chamber; and a 5.8 Gigahertz microwave source for introducing microwave radiation within the outer chamber. The system can be used to efficiently oxidize a batch of vertically stacked of silicon wafers using a 10% concentration of ozone.

摘要翻译： 热处理是集成电路制造中的重要过程。 随着集成电路发展变得越来越小，越来越需要更高精度的热处理系统，可以有效地均匀地加热这些电路而不损坏它们。 因此，本发明人设计了一种示例性的热处理系统，其包括微波反射容纳室，容纳室内的内微波透明处理室，处理室内的微波透明晶片载体; 和一个5.8千兆赫的微波源，用于在外腔内引入微波辐射。 该系统可用于使用10％浓度的臭氧有效地氧化一批垂直堆叠的硅晶片。

公开(公告)号：US20070243317A1

公开(公告)日：2007-10-18

申请号：US10521619

申请日：2003-07-10

申请人： Dale Du Bois ,  Jamie Nam ,  Craig Wildman ,  Taiquing Qiu ,  Jeffrey Kowalski

发明人： Dale Du Bois ,  Jamie Nam ,  Craig Wildman ,  Taiquing Qiu ,  Jeffrey Kowalski

IPC分类号： C23C16/00

CPC分类号： C23C16/4583 ,  C23C16/46 ,  H01L21/67109 ,  H01L21/67757

摘要： An apparatus (100) and method are provided for thermally processing substrates (108) held in a carrier (106). The apparatus (100) includes a vessel (101) having a top (134), side (136) and bottom (138), and a heat source (110) with heating elements (112-1, 112-2, 112-3) proximal thereto. The vessel (101) is sized to enclose a volume substantially no larger than necessary to accommodate the carrier (106), and to provide an isothermal process zone (128) extending throughout. In one embodiment, the bottom wall (138) includes a movable pedestal (140) with a bottom heating element therein (112-1), and the pedestal can be lowered and raised to insert the carrier (106) into the vessel (101). The apparatus (100) can include a movable shield (146) that is inserted between the pedestal (140) and the carrier (106) to shield the substrates (108) from the heating element (112-1) and to maintain pedestal temperature. A magnetically coupled repositioning system (162) repositions the carrier (106) during processing of the substrates (108) without use of a movable feedthrough into the volume enclosed by the vessel (101), and without moving the bottom heating element (112-1) in the pedestal (140).

摘要翻译： 提供了一种用于热处理保持在载体（106）中的基板（108）的装置（100）和方法。 装置（100）包括具有顶部（134），侧部（136）和底部（138）的容器（101）和具有加热元件（112-1,112-2,112-3）的热源 ）。 容器（101）的尺寸设置成包围基本上不大于必要的容积以容纳载体（106）的体积，并且提供贯穿整个延伸的等温处理区（128）。 在一个实施例中，底壁（138）包括其中具有底部加热元件（112-1）的可移动基座（140），并且底座可以下降并升高以将托架（106）插入容器（101） 。 装置（100）可以包括插入在基座（140）和载体（106）之间的可动屏蔽件（146），以将基板（108）与加热元件（112-1）隔离并保持基座温度。 磁性耦合重新定位系统（162）在处理基板（108）期间重新定位载体（106），而不使用可移动的馈通进入由容器（101）包围的体积中，并且不移动底部加热元件（112-1） ）在基座（140）中。

公开(公告)号：US6101844A

公开(公告)日：2000-08-15

申请号：US22056

申请日：1998-02-10

申请人： Jack D. Fowler ,  Robert Parvin ,  Jeffrey Kowalski ,  Patrick W. Wiesen

发明人： Jack D. Fowler ,  Robert Parvin ,  Jeffrey Kowalski ,  Patrick W. Wiesen

IPC分类号： H01L21/22 ,  C23C16/44 ,  C23C16/455 ,  C30B25/08 ,  C30B31/10 ,  H01L21/205 ,  H01L21/324 ,  C23C16/00

CPC分类号： C23C16/4407 ,  C23C16/44 ,  C23C16/45578 ,  C30B25/08 ,  C30B31/10

摘要： A double wall reaction chamber assembly comprising a cylindrical inner wall and a cylindrical outer wall axially parallel thereto, the inner wall having an annular junction with a thickened annular junction flange on the outer surface thereof. The lower end of the outer wall being fused to the outer surface of the thickened annular junction. The outer surface of the inner wall and the inner surface of the annular junction flange define a sloping annular drainage channel to a downwardly sloping drainage port, enabling liquid to drain from the junction. The double wall reaction chamber assembly has a cylindrical inner wall and a cylindrical outer wall axially parallel thereto. It has a lower end fused to the inner wall. A gas distribution tube has a gas inlet end and a gas distributor end, the gas distributor end comprising a split tee having a junction. One leg of the tee extends in a first direction from the junction around the inner wall to a first outlet terminus, and the other leg of the tee extends from the junction in a second direction around the inner wall in a direction opposite to the first direction and to a second outlet terminus. The legs of the tee slope downward from the junction to the respective outlet terminus, whereby liquid in the gas distributor will completely drain from the assembly.

摘要翻译： 一种双壁反应室组件，包括圆柱形内壁和与其平行的圆柱形外壁，内壁具有与其外表面上的增厚的环形接合凸缘的环形接合部。 外壁的下端与增厚的环形结的外表面熔合。 内壁的外表面和环形接合凸缘的内表面限定了向下倾斜的排水口的倾斜的环形排水通道，使得液体能够从连接处排出。 双壁反应室组件具有圆柱形内壁和与其平行的圆柱形外壁。 它具有与内壁熔合的下端。 气体分配管具有气体入口端和气体分配器端，气体分配器端包括具有连接点的分流三通。 三通的一条腿从第一方向从内壁的连接处延伸到第一出口端，并且三通的另一条腿在第二方向上以与第一方向相反的方向围绕内壁延伸 并到第二个出口总站。 三通的腿从接头向下倾斜到相应的出口端，由此气体分配器中的液体将完全从组件排出。

公开(公告)号：US20070171222A1

公开(公告)日：2007-07-26

申请号：US11337755

申请日：2006-01-23

申请人： Jeffrey Kowalski

发明人： Jeffrey Kowalski

IPC分类号： G06T17/00

CPC分类号： G06T17/00

摘要： A computer-implemented method, apparatus and article of manufacture for capturing three-dimensional (3D) model data and structure maintained by a computer-implemented graphics program for display and manipulation. Calls made by the graphics program to a graphics library for displaying and manipulating the 3D model data are captured, and the captured calls are translated into a structure associated with the 3D model data, wherein the structure is saved for subsequent display and manipulation. The structure associated with the 3D model data comprises an assembly hierarchy associated with the 3D model data, wherein the assembly hierarchy is comprised of one or more parts and a hierarchical organization of the parts.

摘要翻译： 用于捕获由计算机实现的图形程序维护以显示和操纵的三维（3D）模型数据和结构的计算机实现的方法，装置和制品。 捕获由图形程序对图形库进行的用于显示和操纵3D模型数据的呼叫，并且将所捕获的呼叫转换成与3D模型数据相关联的结构，其中保存该结构用于随后的显示和操纵。 与3D模型数据相关联的结构包括与3D模型数据相关联的组装层次，其中组装层次结构由部件的一个或多个部分和分层组织组成。