公开(公告)号：US20130316079A1

公开(公告)日：2013-11-28

申请号：US13880638

申请日：2011-10-21

申请人： Jens Ellrich ,  Emmerich Manfed Novak ,  Andreas Caspari

发明人： Jens Ellrich ,  Emmerich Manfed Novak ,  Andreas Caspari

IPC分类号： C23C16/04

CPC分类号： C23C16/042 ,  C23C14/564 ,  C23C16/4401

摘要： The invention relates to an apparatus (1) for coating a surface (21) of a substrate (20). The apparatus comprises a processing chamber (2) with a particle source (3) for producing coating particles (19), which are also deposited on the inner wall (5) of the processing chamber (2) and on shielding apparatuses (4′) arranged therein during operation, in addition to the desired coating of the substrate surface. As the operating time increases, the layer thickness of these deposits (6) grows until the latter undergo spalling, which can lead to contamination of the substrate surfaces to be coated. In order to prevent this, shielding screens (10, 10′) are arranged on the inner wall (5) of the processing chamber (2) and/or on the shielding apparatuses (4′) and prevent deposits (6, 7) which undergo spalling from passing into the interior (17) of the processing chamber (2). The shielding screens (10, 10′) consist preferably of an expanded metal.The invention also relates to a process for coating a surface (21) of a substrate (20), including receiving the substrate (20) in a processing chamber (2) during the coating process, producing coating particles (19) using a particle source (3), allowing coating particles (19) to penetrate into a region between a shielding screen (10, 10′), which is arranged between the particle source (3) and a surface (5, 5′) facing toward the interior (17), detaining deposits (6), which have spalled from the surfaces (5, 5′), in the region between the shielding screen (10, 10′) and the surface (5, 5′) by means of the shielding screen (10, 10′).

摘要翻译： 本发明涉及一种用于涂覆基材（20）的表面（21）的装置（1）。 该装置包括具有用于产生涂覆颗粒（19）的颗粒源（3）的处理室（2），其也沉积在处理室（2）的内壁（5）上以及在屏蔽装置（4'）上， 除了基板表面的所需涂层之外，在操作期间布置在其中。 随着操作时间的增加，这些沉积物（6）的层厚度增长直到后者发生剥落，这可能导致待涂覆的基底表面的污染。 为了防止这种情况，在处理室（2）的内壁（5）和/或屏蔽装置（4'）上布置屏蔽屏（10,10'），并且防止了沉积物（6,7） 从进入处理室（2）的内部（17）开始剥落。 屏蔽屏（10,10'）优选地由膨胀金属构成。 本发明还涉及一种用于涂覆基材（20）的表面（21）的方法，包括在涂覆过程中在处理室（2）中接收基材（20），使用颗粒源 （3），允许涂覆颗粒（19）穿透在布置在颗粒源（3）和面向内部的表面（5,5''）之间的屏蔽屏（10,10'）之间的区域中 17），在屏蔽屏（10,10'）和表面（5,5'）之间的区域中通过屏蔽屏幕（5,5'）从表面（5,5'）剥离的扣留沉积物（6） （10,10'）。

公开(公告)号：US20090263595A1

公开(公告)日：2009-10-22

申请号：US12300557

申请日：2007-04-28

申请人： Jens Ellrich ,  Lei Yong ,  Horst Hahn

发明人： Jens Ellrich ,  Lei Yong ,  Horst Hahn

IPC分类号： C23C14/14 ,  B05D5/12

CPC分类号： H01F1/009 ,  B82Y25/00 ,  B82Y40/00 ,  H01F1/0081 ,  H01F10/123 ,  H01F10/14 ,  H01F10/3286 ,  H01F41/30

摘要： A method for producing an element including a substrate having a plurality of nanocylinders deposited thereon includes providing the substrate. The substrate is covered with a nanoporous Al2O3 membrane so as to provide a covered substrate. The covered substrate is alternately vapor-deposited, at a vapor-deposition temperatures from 250° C. to 400° C., with atoms of a magnetic element and atoms of a non-magnetic element so as to provide the plurality of nanocylinders. Each nanocylinder includes at least four superposed layers including, alternatively, the atoms of the magnetic element and the atoms of the non-magnetic element. The nanoporous Al2O3 membrane is then removed so that the nanocylinders remain on the substrate.

摘要翻译： 一种用于制造包括其上沉积有多个纳米瓶的基板的元件的方法包括提供所述基板。 用纳米多孔Al 2 O 3膜覆盖基底，以提供覆盖的基底。 将覆盖的衬底在250℃至400℃的气相沉积温度下与磁性元素的原子和非磁性元件的原子交替气相沉积以提供多个纳米瓶。 每个纳米圆柱体包括至少四个重叠的层，或者替代地包括磁性元素的原子和非磁性元素的原子。 然后去除纳米多孔Al 2 O 3膜，使得纳米圆柱体保留在基底上。

公开(公告)号：US08337945B2

公开(公告)日：2012-12-25

申请号：US12300557

申请日：2007-04-28

申请人： Jens Ellrich ,  Lei Yong ,  Horst Hahn

发明人： Jens Ellrich ,  Lei Yong ,  Horst Hahn

IPC分类号： C23C16/40 ,  B05D5/12

CPC分类号： H01F1/009 ,  B82Y25/00 ,  B82Y40/00 ,  H01F1/0081 ,  H01F10/123 ,  H01F10/14 ,  H01F10/3286 ,  H01F41/30

摘要： A method for producing an element including a substrate having a plurality of nanocylinders deposited thereon includes providing the substrate. The substrate is covered with a nanoporous Al2O3 membrane so as to provide a covered substrate. The covered substrate is alternately vapor-deposited, at a vapor-deposition temperatures from 250° C. to 400° C., with atoms of a magnetic element and atoms of a non-magnetic element so as to provide the plurality of nanocylinders. Each nanocylinder includes at least four superposed layers including, alternatively, the atoms of the magnetic element and the atoms of the non-magnetic element. The nanoporous Al2O3 membrane is then removed so that the nanocylinders remain on the substrate.

摘要翻译： 一种用于制造包括其上沉积有多个纳米瓶的基板的元件的方法包括提供所述基板。 用纳米多孔Al 2 O 3膜覆盖基底，以提供覆盖的基底。 将覆盖的衬底在250℃至400℃的气相沉积温度下与磁性元素的原子和非磁性元件的原子交替气相沉积以提供多个纳米瓶。 每个纳米圆柱体包括至少四个重叠的层，或者替代地包括磁性元素的原子和非磁性元素的原子。 然后去除纳米多孔Al 2 O 3膜，使得纳米圆柱体保留在基底上。