公开(公告)号：US06933083B2

公开(公告)日：2005-08-23

申请号：US10384540

申请日：2003-03-11

申请人： Jong-Rak Park

发明人： Jong-Rak Park

IPC分类号： G02B5/18 ,  G03F1/26 ,  G03F1/68 ,  G03F1/76 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00 ,  G06F17/50

CPC分类号： G03F1/26 ,  G03F7/70191 ,  G03F7/70433

摘要： A method of designing a phase grating pattern and a method of manufacturing a photo mask using the design method are aimed at enhancing the resolution of a photolithographic process. A modified form of illumination, which will irradiate a main mask pattern to be transcribed onto a wafer using the photolithographic process and thereby enhance the transcription process, is selected. An area over which patterns for providing the modified form of illumination is divided into a plurality of subcells. Phase values are arbitrarily assigned and a phase values to the subcells. One of the subcells is randomly selected, and a phase value is assigned to the randomly selected subcell. These steps are repeated producing new arrangements of the phase values assigned to the subcells. The arrangements of the phase values are evaluated to determine whether any of them correspond to the selected modified illumination. When such a correspondence is realized, a phase grating pattern made according to the arrangement of phase values is produced as part of an auxiliary mask or as part of the main mask.

摘要翻译： 使用该设计方法设计相位光栅图案的方法和制造光掩模的方法旨在提高光刻工艺的分辨率。 选择照明的修改形式，其将使用光刻工艺照射要转录到晶片上的主掩模图案，从而增强转录过程。 用于提供修改形式的照明的图案被划分成多个子单元的区域。 任意分配相位值，并向子单元提供相位值。 随机选择一个子单元，并将相位值分配给随机选择的子单元。 重复这些步骤产生分配给子电池的相位值的新布置。 评估相位值的布置以确定它们中的任何一个是否对应于所选择的修改照明。 当实现这种对应时，根据相位值的布置制成的相位光栅图案被产生作为辅助掩模的一部分或作为主掩模的一部分。

公开(公告)号：US06911286B2

公开(公告)日：2005-06-28

申请号：US10409163

申请日：2003-04-09

申请人： Young-Seog Kang ,  Jong-Rak Park

发明人： Young-Seog Kang ,  Jong-Rak Park

IPC分类号： G02B5/18 ,  G01F9/00 ,  G02B6/124 ,  G03B27/42 ,  G03F1/68 ,  G03F1/76 ,  G03F7/20 ,  G03F9/00 ,  G06F17/50 ,  H01L21/027

CPC分类号： G03F7/70433 ,  G03F1/50 ,  G03F7/70091 ,  G03F7/70125 ,  G03F7/7015 ,  G03F7/70158

摘要： A method of designing a phase grating pattern provides a modified form of illumination for a main mask, optimum for producing one or more target patterns on a wafer in a photolithographic process. Once the target pattern(s) to be formed on the wafer are decided, an area to be occupied by at least a portion of the phase grating is divided into a plurality of subcells, initial phase values are assigned to each of the subcells, and one of the subcells is randomly selected and the phase value last assigned thereto is changed, and the process is repeated. The process is in an iteration that changes the arrangement of the phase values assigned to the subcells until they converge on one which will provide the design for a phase grating which will produce a modified form of illumination optimum for use in forming the target pattern(s) on the wafer.

摘要翻译： 设计相位光栅图案的方法提供了用于主掩模的修改形式的照明，其最适于在光刻工艺中在晶片上产生一个或多个目标图案。 一旦确定要在晶片上形成的目标图案，则由相位光栅的至少一部分占据的区域被划分为多个子单元，初始相位值被分配给每个子单元，并且 随机选择一个子单元，并且最后分配给它的相位值被改变，并重复该过程。 该过程处于迭代中，其改变分配给子单元的相位值的排列，直到它们会聚到将为相位光栅提供设计的相位光栅，其将产生最佳的修改形式的照明，以用于形成目标图案 ）在晶圆上。

公开(公告)号：US6064684A

公开(公告)日：2000-05-16

申请号：US84794

申请日：1998-05-27

申请人： Tai Hyun Yoon ,  Jong Rak Park ,  Myung Sai Chung ,  Hai-Woong Lee

发明人： Tai Hyun Yoon ,  Jong Rak Park ,  Myung Sai Chung ,  Hai-Woong Lee

IPC分类号： H01S3/05 ,  H01S3/06 ,  H01S3/083 ,  H01S3/098

CPC分类号： H01S3/083 ,  H01S3/0615 ,  H01S3/08031 ,  H01S3/08054 ,  H01S3/09415 ,  H01S3/1066

摘要： A unidirectionally operating laser apparatus using a semi-monolithic ring cavity having a compact structure capable of achieving a high frequency stability and a high-speed laser frequency tuning and modulation. The laser apparatus includes a laser active medium having a curved surface exhibiting an anti-reflection characteristic for a pump laser beam from a pump laser incident thereon while exhibiting a high reflection characteristic for an oscillating laser beam, a planar surface exhibiting an anti-reflection characteristic for the oscillating laser beam, and an optically-active polarization rotator attached to one side portion of the planar surface. The laser apparatus also includes an output mirror separated from the laser active medium, the output mirror having a curved surface with a coating exhibiting a higher reflectance coefficient for S-polarized beams than that for P-polarized beams, and a piezo-electric transducer. The laser apparatus is applicable to a variety of scientific fields using continuous-wave wavelength-tunable lasers.

摘要翻译： 使用具有能够实现高频稳定性和高速激光频率调谐和调制的紧凑结构的半单片环形腔的单向操作的激光装置。 该激光装置包括激光活性介质，该激光活性介质具有对从入射到其上的泵浦激光器的泵激光束具有抗反射特性的弯曲表面，同时具有用于振荡激光束的高反射特性，具有抗反射特性的平面 用于振荡激光束，以及附着在平面表面的一侧部分的光学活性偏振旋转器。 激光装置还包括与激光活性介质分离的输出镜，输出镜具有弯曲表面，其中对于S偏振光束具有比P偏振光束更高的反射系数的涂层，以及压电换能器。 激光装置适用于使用连续波长可调激光器的各种科学领域。

公开(公告)号：US6131527A

公开(公告)日：2000-10-17

申请号：US347549

申请日：1999-07-06

申请人： Jong Rak Park ,  Paul Kim

发明人： Jong Rak Park ,  Paul Kim

IPC分类号： A47L7/00 ,  D05B65/06 ,  D05B81/00 ,  A47B1/10 ,  A47L5/36

CPC分类号： A47L7/0047 ,  A47L7/0095 ,  D05B65/06 ,  D05B81/00 ,  D05D2305/50

摘要： A vacuum box having features ideal for utilization with an overlock sewing machine housed in a flat-bed table in a garment factory setting. The vacuum flat-bed table of an overlock sewing machine. The vacuum box is a receptacle having bottom, top, left, right, front, and rear walls. A portion of the front wall can have an opening covered by a hingably mounted door panel. The receptacle has a first compartment and a second compartment. The first compartment is sealed-off from the first compartment and has a electric outlet placed therein placed along the left or right wall. A suction fan is located in the second compartment. A horizontally sliding top panel is placed above the top surface of the top wall. The top panel is pivotally connected to guide slots placed along the front and back wall of the receptacle in a manner which allows the top panel to be extended horizontally to increase the top surface and drawn in to reduce the top surface. The vacuum box of the present invention uses dual flexible vacuum hoses for maximal suction effect. A first vacuum hose and a second vacuum hose each connects at its first end to the receptacle and extends into the second compartment. Each vacuum hose connects at a second end to predetermined point on the sewing machine.

摘要翻译： 一种真空箱，具有理想的用于装在衣服工厂环境中的平躺台上的包缝机。 包缝机的真空平床台。 真空箱是具有底部，顶部，左，右，前壁和后壁的容器。 前壁的一部分可以具有由可铰接地安装的门板覆盖的开口。 容器具有第一隔室和第二隔室。 第一隔室与第一隔间密封，并且具有放置在其中的电插座沿着左壁或右壁放置。 吸风机位于第二隔间。 水平滑动的顶板放置在顶壁的顶表面上方。 顶板以可允许顶板水平延伸的方式枢转地连接到沿着容器的前壁和后壁放置的导槽，以增加顶表面并被拉入以减小顶表面。 本发明的真空箱采用双重柔性真空软管，实现最大吸力。 第一真空软管和第二真空软管各自在其第一端连接到容器并延伸到第二隔室中。 每个真空软管在第二端连接到缝纫机上的预定点。

公开(公告)号：US07001697B2

公开(公告)日：2006-02-21

申请号：US10623616

申请日：2003-07-22

申请人： Jong-Rak Park ,  Seong-Woon Choi ,  Gi-Sung Yeo ,  Sung-Hoon Jang

发明人： Jong-Rak Park ,  Seong-Woon Choi ,  Gi-Sung Yeo ,  Sung-Hoon Jang

IPC分类号： G01F9/00

CPC分类号： G02B27/0927 ,  G02B5/1871 ,  G02B27/09 ,  G02B27/0938 ,  G02B27/46 ,  G03F1/50 ,  G03F7/70191

摘要： A photomask for use in photolithography has substrate, a main pattern at one side of the substrate, and a transparency-adjusting layer at the other side of the substrate. The transparency-adjusting layer has a characteristic that allows it to change the intensity of the illumination incident on the main pattern during the exposure process accordingly. In manufacturing the photomask, a first exposure process is carried out on a wafer using just the substrate and main pattern. The critical dimensions of elements of the pattern formed on the wafer as a result of the first exposure process are measured. Differences between these critical dimensions and a reference critical dimension are then used in designing a layout of the transparency-adjusting layer in which the characteristic of the layer is varied to compensate for such differences.

摘要翻译： 用于光刻的光掩模具有衬底，衬底一侧的主图案和衬底另一侧的透明度调节层。 透明度调整层具有允许其在曝光处理期间改变在主图案上入射的照明强度的特性。 在制造光掩模时，仅使用基板和主图案在晶片上进行第一曝光处理。 测量作为第一曝光处理的结果在晶片上形成的图案的元件的临界尺寸。 然后在设计透明度调整层的布局时，将这些关键尺寸与参考临界尺寸之间的差异用于改变层的特性以补偿这种差异。