METHOD FOR IDENTIFICATION OF ORGANISM BY DNA TAG
    2.
    发明申请
    METHOD FOR IDENTIFICATION OF ORGANISM BY DNA TAG 审中-公开
    通过DNA标签识别有机体的方法

    公开(公告)号:US20100248221A1

    公开(公告)日:2010-09-30

    申请号:US12223928

    申请日:2007-11-13

    IPC分类号: C12Q1/68

    CPC分类号: C12Q1/68 C12Q2563/185

    摘要: The object is to provide a novel organism identification method which can be used as an alternative method to a conventional organism identification method which utilizes DNA and requires enormous labor. Developed is an organism identification method for determining whether or not an organism of interest is identical to a specific organism or a progeny thereof, which is characterized by introducing a DNA tag(s) in advance into a cell(s) of the specific organism, or a parasite or a symbiont with the specific organism, and determining whether or not the organism of interest is identical to the specific organism or a progenitor thereof based on the detection or non-detection of the DNA tag in DNA extracted from the organism of interest, or the parasite or the symbiont with the organism of interest.

    摘要翻译: 目的是提供一种新型的生物体鉴定方法,其可以用作利用DNA并需要巨大劳动的常规生物体鉴定方法的替代方法。 开发的是用于确定感兴趣的生物体是否与特定生物体或其后代相同的生物体鉴定方法,其特征在于将DNA标签预先引入特定生物体的细胞中, 或具有特定生物体的寄生虫或共生体,并且基于从感兴趣的生物体中提取的DNA中DNA标签的检测或不检测来确定感兴趣的生物体是否与特定生物体或其祖细胞相同 ,或与感兴趣的生物体的寄生虫或共生体。

    Method of manufacturing semiconductor device
    3.
    发明授权
    Method of manufacturing semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号:US5068704A

    公开(公告)日:1991-11-26

    申请号:US520446

    申请日:1990-05-08

    摘要: A method of manufacturing a semiconductor device comprising the steps of bringing a mirror-polished surface of a first semiconductor substrate of a first conductivity type into contact with a mirror-polished surface of a second semiconductor substrate of a second conductivity type having an impurity concentration which is lower than that of said first conductivity type, in a clean atmosphere, and thermally heating said first and second semiconductor substrates so that they unite. Impurity is diffused from said first semiconductor substrate into said second semiconductor substrate, thereby forming a diffusion layer of a first conductivity type in said second semiconductor substrate. A total amount of impurity of said diffusion layer is 1.times.10.sup.13 /cm.sup.2 to 2.times.10.sup.15 /cm.sup.2, to form a pn junction in said second semiconductor substrate.

    摘要翻译: 一种制造半导体器件的方法,包括以下步骤:将具有第一导电类型的第一半导体衬底的镜面抛光表面与具有杂质浓度的第二导电类型的第二半导体衬底的镜面抛光表面接触, 在清洁的气氛中低于所述第一导电类型,并且热加热所述第一和第二半导体衬底以使它们团结起来。 杂质从所述第一半导体衬底扩散到所述第二半导体衬底中,从而在所述第二半导体衬底中形成第一导电类型的扩散层。 所述扩散层的杂质的总量为1×10 13 / cm 2至2×10 15 / cm 2,以在所述第二半导体衬底中形成pn结。

    Trimming process by a laser beam
    6.
    发明授权
    Trimming process by a laser beam 失效
    通过激光束修整过程

    公开(公告)号:US4928838A

    公开(公告)日:1990-05-29

    申请号:US293278

    申请日:1989-01-04

    申请人: Kaoru Imamura

    发明人: Kaoru Imamura

    摘要: A trimming process by a laser beam is disclosed. The trimming process comprises two steps. In a first step, a laser shield layer is formed over an untrimmed region of a trimmed material adjacent to a trimmed region. The laser shield layer has a higher heat conductivity than the trimmed material and a large reflectivity for laser beam. In a second step, the trimmed material is cut off. To cut off, a laser beam is applied onto the upper surface of the trimmed region of the trimmed material to vaporize the trimmed material in the trimmed region.

    Breakdown protected planar transistor device
    7.
    发明授权
    Breakdown protected planar transistor device 失效
    分解保护的平面晶体管器件

    公开(公告)号:US4716489A

    公开(公告)日:1987-12-29

    申请号:US813841

    申请日:1985-12-27

    CPC分类号: H01L29/7302 H01L27/0248

    摘要: A protection circuit is provided for a planar transistor device. The protection circuit comprises a variable resistor device formed of a junction type field effect transistor. The resistor device is connected in series with the base of the planar transistor. The drain electrode of the J-FET is connected to the base of the planar transistor while the collector of the planar transistor is connected to the gate of the J-FET. Due to this interconnected scheme, base input resistance of the planar transistor is increased to reduce its base current when a high voltage is applied accidentally to the collector. The base current is not eliminated, however, and the device is protected but can still operate.

    摘要翻译: 为平面晶体管器件提供保护电路。 保护电路包括由结型场效应晶体管形成的可变电阻器件。 电阻器件与平面晶体管的基极串联连接。 J-FET的漏电极连接到平面晶体管的基极,而平面晶体管的集电极连接到J-FET的栅极。 由于这种相互连接的方案,当将高电压意外施加到集电极时,平面晶体管的基极输入电阻增加以降低其基极电流。 然而,基极电流不被消除,器件受到保护但仍可以工作。

    Method of manufacturing semiconductor device including substrate bonding
and outdiffusion by thermal heating
    8.
    发明授权
    Method of manufacturing semiconductor device including substrate bonding and outdiffusion by thermal heating 失效
    制造半导体器件的方法包括基底粘合和通过热加热的扩散扩散

    公开(公告)号:US4935386A

    公开(公告)日:1990-06-19

    申请号:US161097

    申请日:1988-02-26

    摘要: A method of manufacturing a semiconductor device comprising the steps of bringing a mirror-polished surface of a first semiconductor substrate of a first conductivity type into contact with a mirror-polished surface of a second semiconductor substrate of a second conductivity type having an impurity concentration which is lower than that of said first conductivity type, in a clean atmosphere, and thermally heating said first and second semiconductor substrates so that they unite. Impurity is diffused from said first semicondutor substrate into said second semiconductor substrate, thereby forming a diffusion layer of a first conductivity type in said second semiconductor substrate. A total amount of impurity of said diffusion layer is 1.times.10.sup.13 /cm.sup.2 to 2.times.10.sup.15 /cm.sup.2, to form a pn junction in said second semiconductor substrate.

    摘要翻译: 一种制造半导体器件的方法,包括以下步骤:将具有第一导电类型的第一半导体衬底的镜面抛光表面与具有杂质浓度的第二导电类型的第二半导体衬底的镜面抛光表面接触, 在清洁的气氛中低于所述第一导电类型,并且热加热所述第一和第二半导体衬底以使它们团结起来。 杂质从所述第一半导体基板扩散到所述第二半导体衬底中,从而在所述第二半导体衬底中形成第一导电类型的扩散层。 所述扩散层的杂质的总量为1×10 13 / cm 2至2×10 15 / cm 2,以在所述第二半导体衬底中形成pn结。

    Trimming resistor network
    9.
    发明授权
    Trimming resistor network 失效
    微调电阻网络

    公开(公告)号:US4906966A

    公开(公告)日:1990-03-06

    申请号:US305811

    申请日:1989-02-03

    IPC分类号: H01C13/00 H01C17/23 H01C17/24

    CPC分类号: H01C17/23

    摘要: A trimming resistor network includes first and second external connection terminals, a first resistor having two ends acting as first and second connection terminals, a first coupling body for connecting the first external connection terminal to the first connection terminal via series-connected resistors, a second coupling body for connecting the second external connection terminal to the second connection terminal directly or via series-connected resistors, and parallel trimming resistors having two ends respectively connected to the first and second coupling bodies. The combined resistance between the first and second external connection terminals is increased by substantially a preset amount each time one of the parallel trimming resistors is cut off.