摘要:
A thin-film piezoelectric resonator including a substrate (6); a piezoelectric layer (2), a piezoelectric resonator stack (12) with a top electrode (10) and bottom electrode (8), and a cavity (4). The piezoelectric resonator stack (12) has a vibration region (40) where the top electrode and bottom electrode overlap in the thickness direction, and the vibration region comprises a first vibration region, second vibration region, and third vibration region. When seen from the thickness direction, the first vibration region is present at the outermost side, the third vibration region is present at the innermost side and does not contact the first vibration region, and the second vibration region is interposed between the first vibration region and third vibration region. The resonance frequency of the primary thickness-longitudinal vibration of the vibration region (40) is f1 at the first vibration region, is f2 at the third vibration region, wherein f1 and f2 satisfy a relationship of f1
摘要:
Provided is a thin film piezoelectric resonator which includes a piezoelectric resonator stack (12) having a piezoelectric layer (2), an upper electrode (10) and a lower electrode (8); and a substrate (6) which supports the piezoelectric resonator stack. The piezoelectric resonator stack (12) is provided with a vibration region (18) wherein the upper electrode (10) and the lower electrode (8) face each other through a piezoelectric layer (2) and primary thickness vertical vibration can be performed; and a supporting region (19) supported by the substrate (6). The vibration region (18) has an oval shape with a ratio a/b of 1.1 or more but not more than 1.7, where (a) is a long diameter and (b) is a short diameter. The piezoelectric resonator stack (12) is further provided with an upper dielectric layer (20) formed on the upper electrode (10). When the total of the thickness of the upper electrode (10) and that of the upper dielectric layer (20) in the vibration region (18) is expressed as (c), and the thickness of the piezoelectric layer (2) in the vibration region (18) is expressed as (d), a ratio c/d is 0.25 or more but not more than 0.45.
摘要:
A dielectric ceramic composition for high frequency wave having a composition comprising Al, Zr, Ti, Sn and O as a basic composition and represented by compositional formula: aAl2O3-bZrO2-cTiO2-dSnO2 (in which 0.4068
摘要:
A thin-film piezoelectric resonator including a substrate (6); a piezoelectric layer (2), a piezoelectric resonator stack (12) with a top electrode (10) and bottom electrode (8), and a cavity (4). The piezoelectric resonator stack (12) has a vibration region (40) where the top electrode and bottom electrode overlap in the thickness direction, and the vibration region comprises a first vibration region, second vibration region, and third vibration region. When seen from the thickness direction, the first vibration region is present at the outermost side, the third vibration region is present at the innermost side and does not contact the first vibration region, and the second vibration region is interposed between the first vibration region and third vibration region. The resonance frequency of the primary thickness-longitudinal vibration of the vibration region (40) is f1 at the first vibration region, is f2 at the third vibration region, wherein f1 and f2 satisfy a relationship of f1
摘要:
A thin film piezoelectric resonator suppresses deterioration of impedance at antiresonant frequency and has a high Q value. The thin film piezoelectric resonator is provided with a semiconductor substrate (8); an insulating layer (6) formed on the semiconductor substrate (8) in contact with the surface of the semiconductor substrate; and a piezoelectric resonator stack (14) formed above the insulating layer and having a lower electrode (10), a piezoelectric layer (2) and an upper electrode (12) in this order from the insulating layer side. An oscillation space (4) is formed corresponding to an oscillation region where the lower electrode (10) and the upper electrode (12) of the piezoelectric resonator stack (14) overlap each other in the thickness direction. The fixed charge density in the insulating layer (6) is 1×1011 cm−2 or less. At the time of manufacturing the thin film piezoelectric resonator, the insulating layer is formed in contact with the semiconductor substrate and then, heat treatment at 300° C. or higher is performed under non-oxygenated atmosphere.
摘要:
A thin film piezoelectric resonator suppresses deterioration of impedance at antiresonant frequency and has a high Q value. The thin film piezoelectric resonator is provided with a semiconductor substrate (8); an insulating layer (6) formed on the semiconductor substrate (8) in contact with the surface of the semiconductor substrate; and a piezoelectric resonator stack (14) formed above the insulating layer and having a lower electrode (10), a piezoelectric layer (2) and an upper electrode (12) in this order from the insulating layer side. An oscillation space (4) is formed corresponding to an oscillation region where the lower electrode (10) and the upper electrode (12) of the piezoelectric resonator stack (14) overlap each other in the thickness direction. The fixed charge density in the insulating layer (6) is 1×1011 cm−2 or less. At the time of manufacturing the thin film piezoelectric resonator, the insulating layer is formed in contact with the semiconductor substrate and then, heat treatment at 300° C. or higher is performed under non-oxygenated atmosphere.
摘要翻译:薄膜压电谐振器抑制反谐振频率下的阻抗恶化并具有高Q值。 薄膜压电谐振器设置有半导体衬底(8); 形成在与半导体衬底的表面接触的半导体衬底上的绝缘层; 以及在绝缘层的上方形成有绝缘层侧依次具有下电极(10),压电层(2)和上电极(12)的压电谐振器叠层(14)。 对应于压电谐振器叠层(14)的下电极(10)和上电极(12)在厚度方向上彼此重叠的振荡区域形成振荡空间(4)。 绝缘层(6)中的固定电荷密度为1×10 11 cm -2以下。 在制造薄膜压电谐振器时,绝缘层形成为与半导体衬底接触,然后在非氧化气氛下进行300℃以上的热处理。