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11 条记录 (耗时 0.015 秒)

    Recording apparatus
    4.
    发明授权
    Recording apparatus 失效
    记录装置

    公开(公告)号：US4471365A

    公开(公告)日：1984-09-11

    申请号：US463983

    申请日：1983-02-04

    申请人： Keigo Kobayashi

    发明人： Keigo Kobayashi

    IPC分类号： G01D15/24 ,  G01D9/00 ,  G01D9/24 ,  G01D15/04

    CPC分类号： G01D9/24

    摘要： Herein disclosed is a battery-operated, dot type recording apparatus which comprises a drive mechanism unit having its number of revolutions regulated by the output of a quartz oscillator, a circuit for connecting a d.c. power source with a meter only when a measured value is to be recorded, and delay switching means for causing the tip of a pointer of a meter to hit the recording paper at the time when that meter becomes stable. Thus, the dot type recording apparatus is so constructed of a small number of mechanical means that it can reliably operate for a long time, while having its adjustment and maintenance facilitated, with little influence from changes in circumstances.

    摘要翻译： 这里公开的是电池供电的点式记录装置，其包括具有由石英振荡器的输出调节的转数的驱动机构单元，用于连接直流电路的电路。 具有计量器的电源，仅当要记录测量值时，以及延迟切换装置，用于在仪表变得稳定时使仪表的指针的尖端撞击记录纸。 因此，点式记录装置由少量的机械装置构成，可以在不影响环境变化的情况下，使调整和维护变得容易，能够长时间可靠地运行。

    METHOD FOR MANUFACTURING CERAMIC COVERING MEMBER FOR SEMICONDUCTOR PROCESSING APPARATUS
    8.
    发明申请
    METHOD FOR MANUFACTURING CERAMIC COVERING MEMBER FOR SEMICONDUCTOR PROCESSING APPARATUS 审中-公开
    用于制造半导体加工装置的陶瓷覆盖件的方法

    公开(公告)号：US20090208667A1

    公开(公告)日：2009-08-20

    申请号：US12293974

    申请日：2007-03-16

    申请人： Yoshio Harada ,  Junichi Takeuchi ,  Ryo Yamasaki ,  Keigo Kobayashi

    发明人： Yoshio Harada ,  Junichi Takeuchi ,  Ryo Yamasaki ,  Keigo Kobayashi

    IPC分类号： B05D3/06

    CPC分类号： C23C4/02 ,  C23C4/11 ,  C23C4/18 ,  C23C26/00 ,  C23C28/042

    摘要： Producing a ceramic coating member for a semiconductor processing apparatus with a purpose of improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment and as a means for solution, forming a porous layer by irradiating an oxide of an element in Group IIIa of the Periodic Table to be coated directly or through an undercoat on the surface of the substrate of a metal or non-metal and further forming a secondary recrystallized layer of the oxide on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.

    摘要翻译： 制造用于半导体处理装置的陶瓷涂层构件，其目的是提高容器内部的构件和部件的阻力，例如用于在强腐蚀性环境中进行等离子体蚀刻处理的半导体处理装置和作为溶液的手段，形成多孔 通过在金属或非金属的基板的表面上直接或通过底涂层照射周期表的IIIa族元素的氧化物，并进一步在多孔层上形成氧化物的二次再结晶层 通过电子束和激光束等高能量的照射处理。

    CERAMIC COATING MEMBER FOR SEMICONDUCTOR PROCESSING APPARATUS
    9.
    发明申请
    CERAMIC COATING MEMBER FOR SEMICONDUCTOR PROCESSING APPARATUS 有权
    用于半导体加工设备的陶瓷涂层组件

    公开(公告)号：US20070218302A1

    公开(公告)日：2007-09-20

    申请号：US11688565

    申请日：2007-03-20

    申请人： Yoshiyuki Kobayashi ,  Takahiro Murakami ,  Yoshio Harada ,  Junichi Takeuchi ,  Ryo Yamasaki ,  Keigo Kobayashi

    发明人： Yoshiyuki Kobayashi ,  Takahiro Murakami ,  Yoshio Harada ,  Junichi Takeuchi ,  Ryo Yamasaki ,  Keigo Kobayashi

    IPC分类号： B32B15/04

    CPC分类号： C23C4/02 ,  C23C4/18 ,  C23C28/042 ,  Y10T428/12

    摘要： Improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment.A ceramic coating member for a semiconductor processing apparatus comprises a porous layer made of an oxide of an element in Group IIIa of the Periodic Table coated directly or through an undercoat on the surface of the substrate of a metal or non-metal and a secondary recrystallized layer of the oxide formed on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.

    摘要翻译： 改善设置在容器内部的部件和部件的电阻，例如用于在强腐蚀性环境中进行等离子体蚀刻处理的半导体处理装置。 用于半导体处理装置的陶瓷涂层构件包括由直接涂覆的元素周期表Ⅲa族元素的氧化物或金属或非金属基材表面上的底涂层和二次再结晶的多孔层 通过高能量的照射处理如电子束和激光束在多孔层上形成的氧化物层。

    Work roll for use in rolling apparatus
    10.
    发明授权
    Work roll for use in rolling apparatus 失效
    辊轧机用辊

    公开(公告)号：US06739167B2

    公开(公告)日：2004-05-25

    申请号：US10355249

    申请日：2003-01-31

    申请人： Keigo Kobayashi ,  Norikazu Inaba ,  Takashi Tamura

    发明人： Keigo Kobayashi ,  Norikazu Inaba ,  Takashi Tamura

    IPC分类号： B21H802

    CPC分类号： B21B27/005 ,  B21B1/227 ,  B21B13/00 ,  B21B27/02 ,  B21B2003/001

    摘要： A work roll for use in rolling apparatus for producing from a metal blank sheet articles having a deformed cross section and comprising, for example, a plate portion, and a plurality of upright walls formed on one surface of the plate portion integrally therewith and arranged as spaced apart from one another, such as flat heat exchange tube component members, heat sinks and lead frames. The work roll assures more simplified production work and provides surface finishes with higher accuracy than conventionally. The work roll comprises different kinds of disks having different diameters and arranged alternately on an axis into juxtaposed layers as secured to one another. Large disks 20A, 20B, are arranged at respective portions not forming the upright walls, and small disks 21A, 21B smaller than the large disks 20A, 20B in radius by an amount corresponding to the height of the upright walls are arranged at respective portions for forming the upright walls. Each of the disks 20A, 20B, 21A, 21B has an outer peripheral surface serving as a working surface.

    摘要翻译： 一种用于从具有变形横截面并且包括例如板部分的金属坯料制品制造的轧制设备中使用的工作辊和与板部分的一个表面一体形成的多个直立壁，并且被布置为 彼此间隔开，例如平坦的热交换管部件，散热器和引线框架。 工作辊确保更简化的生产工作，并提供比传统更高精度的表面处理。 工作辊包括具有不同直径的不同种类的盘，并且在轴上交替地布置成彼此固定的并列的层。 大盘20A，20B布置在不形成直立壁的相应部分处，并且小于大圆盘20A，20B的小圆盘21A，21B的半径相当于直立壁的高度的量布置在各自的部分 形成直立的墙壁。 每个盘20A，20B，21A，21B具有用作工作表面的外周表面。