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1.发明申请Spray coating member having excellent heat emmision property and so on and method for producing the same 审中-公开具有优异的发热性等的喷涂部件及其制造方法公开(公告)号：US20090130436A1
公开(公告)日：2009-05-21
申请号：US11990755
申请日：2006-08-21
申请人： Yoshio Harada , Junichi Takeuchi , Ryo Yamasaki , Keigo Kobayashi
发明人： Yoshio Harada , Junichi Takeuchi , Ryo Yamasaki , Keigo Kobayashi
CPC分类号： C23C4/18 , C23C4/02 , C23C4/11 , Y10T428/26
摘要： For the purpose of solving problems inherent to a plasma spray coating of white base Al2O3—Y2O3 composite oxide, i.e. drawbacks that the corrosion resistance, heat resistance and abrasion resistance are poor and the light reflectance is high because the coating is porous and weak in the bonding force among particles, a spray coating member having an excellent heat emission property and the like is proposed wherein a surface of a substrate is covered with a spray coating of a colored composite oxide made of a low luminosity, achromatic or chromatic Al2O3—Y2O3.
摘要翻译： 为了解决白色Al 2 O 3 -Y 2 O 3复合氧化物的等离子喷涂所固有的问题，即耐腐蚀性，耐热性和耐磨性差，光反射率高，因为涂层多孔性差， 提出了颗粒之间的结合力，具有优异的发热性能的喷涂构件等，其中用低发光度，无色或有色Al 2 O 3 -Y 2 O 3制成的着色复合氧化物的喷涂层覆盖基板的表面。
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公开(公告)号：US07648782B2
公开(公告)日：2010-01-19
申请号：US11688565
申请日：2007-03-20
申请人： Yoshiyuki Kobayashi , Takahiro Murakami , Yoshio Harada , Junichi Takeuchi , Ryo Yamasaki , Keigo Kobayashi
发明人： Yoshiyuki Kobayashi , Takahiro Murakami , Yoshio Harada , Junichi Takeuchi , Ryo Yamasaki , Keigo Kobayashi
IPC分类号： H01L29/04 , H01L21/473 , H01L21/461 , H01L21/3105 , B01J3/08 , B01J19/08 , B05D3/06 , B05D1/06 , C08J7/18 , C23C4/10 , C01F17/00 , C04B35/505
CPC分类号： C23C4/02 , C23C4/18 , C23C28/042 , Y10T428/12
摘要： Improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment. A ceramic coating member for a semiconductor processing apparatus comprises a porous layer made of an oxide of an element in Group IIIb of the Periodic Table coated directed or through an undercoat on the surface of the substrate of a metal or non-metal and a secondary recrystallized layer of the oxide formed on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.
摘要翻译： 改善设置在容器内部的部件和部件的电阻，例如用于在强腐蚀性环境中进行等离子体蚀刻处理的半导体处理装置。 一种用于半导体处理装置的陶瓷涂层构件包括由元素周期表IIIb中元素的氧化物构成的多孔层，其被涂覆在金属或非金属基底的表面上或通过底涂层和二次重结晶 通过高能量的照射处理如电子束和激光束在多孔层上形成的氧化物层。
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3.发明申请METHOD FOR MANUFACTURING CERAMIC COVERING MEMBER FOR SEMICONDUCTOR PROCESSING APPARATUS 审中-公开用于制造半导体加工装置的陶瓷覆盖件的方法公开(公告)号：US20090208667A1
公开(公告)日：2009-08-20
申请号：US12293974
申请日：2007-03-16
申请人： Yoshio Harada , Junichi Takeuchi , Ryo Yamasaki , Keigo Kobayashi
发明人： Yoshio Harada , Junichi Takeuchi , Ryo Yamasaki , Keigo Kobayashi
IPC分类号： B05D3/06
CPC分类号： C23C4/02 , C23C4/11 , C23C4/18 , C23C26/00 , C23C28/042
摘要： Producing a ceramic coating member for a semiconductor processing apparatus with a purpose of improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment and as a means for solution, forming a porous layer by irradiating an oxide of an element in Group IIIa of the Periodic Table to be coated directly or through an undercoat on the surface of the substrate of a metal or non-metal and further forming a secondary recrystallized layer of the oxide on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.
摘要翻译： 制造用于半导体处理装置的陶瓷涂层构件，其目的是提高容器内部的构件和部件的阻力，例如用于在强腐蚀性环境中进行等离子体蚀刻处理的半导体处理装置和作为溶液的手段，形成多孔 通过在金属或非金属的基板的表面上直接或通过底涂层照射周期表的IIIa族元素的氧化物，并进一步在多孔层上形成氧化物的二次再结晶层 通过电子束和激光束等高能量的照射处理。
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公开(公告)号：US20070218302A1
公开(公告)日：2007-09-20
申请号：US11688565
申请日：2007-03-20
申请人： Yoshiyuki Kobayashi , Takahiro Murakami , Yoshio Harada , Junichi Takeuchi , Ryo Yamasaki , Keigo Kobayashi
发明人： Yoshiyuki Kobayashi , Takahiro Murakami , Yoshio Harada , Junichi Takeuchi , Ryo Yamasaki , Keigo Kobayashi
IPC分类号： B32B15/04
CPC分类号： C23C4/02 , C23C4/18 , C23C28/042 , Y10T428/12
摘要： Improving the resistance of members and parts disposed inside of vessels such as semiconductor processing devices for conducting plasma etching treatment in a strong corrosive environment.A ceramic coating member for a semiconductor processing apparatus comprises a porous layer made of an oxide of an element in Group IIIa of the Periodic Table coated directly or through an undercoat on the surface of the substrate of a metal or non-metal and a secondary recrystallized layer of the oxide formed on the porous layer through an irradiation treatment of a high energy such as electron beam and laser beam.
摘要翻译： 改善设置在容器内部的部件和部件的电阻，例如用于在强腐蚀性环境中进行等离子体蚀刻处理的半导体处理装置。 用于半导体处理装置的陶瓷涂层构件包括由直接涂覆的元素周期表Ⅲa族元素的氧化物或金属或非金属基材表面上的底涂层和二次再结晶的多孔层 通过高能量的照射处理如电子束和激光束在多孔层上形成的氧化物层。
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公开(公告)号：US07364798B2
公开(公告)日：2008-04-29
申请号：US11072448
申请日：2005-03-07
CPC分类号： H01J37/32477 , B01J19/02 , B01J2219/0218 , B01J2219/0236 , B01J2219/024 , B01J2219/0263 , B01J2219/0286 , B01J2219/0894 , C09D1/00 , C23C4/00 , C23C4/02 , C23C4/11 , Y10T428/12458 , Y10T428/12479 , Y10T428/12549 , Y10T428/12618 , Y10T428/24999
摘要： It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.
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6.发明授权公开(公告)号：US06884516B2
公开(公告)日：2005-04-26
申请号：US10849797
申请日：2004-05-21
IPC分类号： H01L21/302 , B01J19/02 , C23C4/00 , C23C4/02 , C23C4/10 , C23C14/00 , C23C16/06 , H01J37/32 , H01L21/3065 , H01L21/31 , H01L21/00 , B32B3/10
CPC分类号： H01J37/32477 , B01J19/02 , B01J2219/0218 , B01J2219/0236 , B01J2219/024 , B01J2219/0263 , B01J2219/0286 , B01J2219/0894 , C09D1/00 , C23C4/00 , C23C4/02 , C23C4/11 , Y10T428/12458 , Y10T428/12479 , Y10T428/12549 , Y10T428/12618 , Y10T428/24999
摘要： It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.
摘要翻译： 本发明提供一种等离子体处理容器的内部构件，该等离子体处理容器在含有卤素气体的环境下具有优异的耐化学腐蚀和等离子体侵蚀性，并且其制造方法是通过将基材的表面覆盖而形成的构件 由在作为中间层的底涂层上形成的作为底涂层形成的金属涂层和Al 2 O 3 O 3膜组成的多层复合层和Y 2 N / > O 3喷涂涂层形成在中间层上作为顶涂层。
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公开(公告)号：US20080070028A1
公开(公告)日：2008-03-20
申请号：US11882463
申请日：2007-08-01
CPC分类号： H01J37/32477 , B01J19/02 , B01J2219/0218 , B01J2219/0236 , B01J2219/024 , B01J2219/0263 , B01J2219/0286 , B01J2219/0894 , C09D1/00 , C23C4/00 , C23C4/02 , C23C4/11 , Y10T428/12458 , Y10T428/12479 , Y10T428/12549 , Y10T428/12618 , Y10T428/24999
摘要： It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.
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公开(公告)号：US5695883A
公开(公告)日：1997-12-09
申请号：US741399
申请日：1996-10-29
申请人： Yoshio Harada , Junichi Takeuchi , Shigeki Okunishi , Tetsuro Tojo , Jiro Hiraiwa , Koji Kuroda
发明人： Yoshio Harada , Junichi Takeuchi , Shigeki Okunishi , Tetsuro Tojo , Jiro Hiraiwa , Koji Kuroda
CPC分类号： C04B41/009 , C04B41/5133 , C04B41/88 , C23C4/08 , Y10T428/24479 , Y10T428/24521 , Y10T428/24545 , Y10T428/24942 , Y10T428/26 , Y10T428/30 , Y10T428/31678
摘要： A carbon member having an excellent bonding property is provided at its surface with a metal spray coating layer, and comprises a carbon substrate and a spray coating layer made from at least one metal selected from Cr, Ti, V, W, Mo, Zr, Nb and Ta or an alloy thereof, in which the coating layer has a ratio of linear expansion coefficient to carbon of 0.73-1.44 and a large chemical affinity to carbon at its interface.
摘要翻译： 在其表面上设置金属喷涂层，具有优异的粘合性的碳构件，并且包括碳基板和由选自Cr，Ti，V，W，Mo，Zr中的至少一种金属制成的喷涂层， Nb和Ta或其合金，其中涂层的线性膨胀系数与碳的比率为0.73-1.44，并且在其界面处与碳具有很大的化学亲和力。
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公开(公告)号：US20080070051A1
公开(公告)日：2008-03-20
申请号：US11882462
申请日：2007-08-01
CPC分类号： H01J37/32477 , B01J19/02 , B01J2219/0218 , B01J2219/0236 , B01J2219/024 , B01J2219/0263 , B01J2219/0286 , B01J2219/0894 , C09D1/00 , C23C4/00 , C23C4/02 , C23C4/11 , Y10T428/12458 , Y10T428/12479 , Y10T428/12549 , Y10T428/12618 , Y10T428/24999
摘要： It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.
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10.发明授权公开(公告)号：US06783863B2
公开(公告)日：2004-08-31
申请号：US09890251
申请日：2001-08-03
IPC分类号： H01L2100
CPC分类号： H01J37/32477 , B01J19/02 , B01J2219/0218 , B01J2219/0236 , B01J2219/024 , B01J2219/0263 , B01J2219/0286 , B01J2219/0894 , C09D1/00 , C23C4/00 , C23C4/02 , C23C4/11 , Y10T428/12458 , Y10T428/12479 , Y10T428/12549 , Y10T428/12618 , Y10T428/24999
摘要： It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.
摘要翻译： 本发明提供一种等离子体处理容器的内部构件，该等离子体处理容器在含有卤素气体的环境下具有优异的耐化学腐蚀和等离子体侵蚀性，并且其制造方法是通过将基材的表面覆盖而形成的构件 由作为底涂层形成的金属涂层，在作为中间层的底涂层上形成的Al 2 O 3膜和在中间层上形成的作为顶涂层的Y 2 O 3喷涂层构成的多层复合层。
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