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公开(公告)号：US06969572B2
公开(公告)日：2005-11-29
申请号：US10706091
申请日：2003-11-13
Applicant: Kiyohisa Tateyama , Masafumi Nomura , Taketora Shinogi
Inventor： Kiyohisa Tateyama , Masafumi Nomura , Taketora Shinogi
CPC classification number: G03D3/065 , G03D3/06 , G03F7/30 , G03F7/3071 , H01L21/6715 , H01L21/67253
Abstract: In this developing method and apparatus, a concentration measuring unit 222 picks part of developing fluid in a blending tank 186 to measure the resist concentration by an absorption photometry and feeds the detected resist concentration to a control unit 240. The control unit 240 controls respective valves 210, 212, 216 of a TMAH concentrate solution 200, a solvent pipe 204 and a drain pipe 208 in a manner that the developing fluid in the blending tank 186 has a TMAH concentration corresponding to a measured resist-concentration value to accomplish a constant developing rate, performing component control of the developing fluid. The developing fluid transferred from the blending tank 186 to a supply tank 188 is fed to a developer nozzle DN in a developing section 126 through a developer pipe 224 owing to the drive of a pump 228. Accordingly, even if the developing fluid is reused in the developing process in multiple times, it is possible to make sure of the uniformity in development.
Abstract translation: 在该显影方法和装置中，浓度测量单元222拾取混合罐186中的显影液的一部分，通过吸收测光法测量抗蚀剂浓度，并将检测到的抗蚀剂浓度供给到控制单元240。 控制单元240以这样的方式控制TMAH浓缩液200，溶剂管204和排水管208的各个阀210,212,216，使得混合罐186中的显影流体具有对应于测量的抗蚀剂层的TMAH浓度， 浓度值以实现恒定的显影速率，进行显影液的成分控制。 通过泵228的驱动，从混合罐186向供给罐188输送的显影液通过显影剂管道224被供给到显影部分126中的显影剂喷嘴DN。 因此，即使显影液在显影过程中重复使用多次，也可以确保显影的均匀性。
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公开(公告)号：US06207231B1
公开(公告)日：2001-03-27
申请号：US09066603
申请日：1998-04-27
Applicant: Kiyohisa Tateyama
Inventor： Kiyohisa Tateyama
IPC: B05D312
CPC classification number: H01L21/6715 , B05C11/08 , B05D1/005 , B05D3/10 , G03F7/162
Abstract: In forming a resist film by supplying a resist liquid onto a surface of an LCD substrate loaded in a rotation cup, a coating liquid is coated on the surface of the substrate by spraying the resist liquid onto the surface thereof while not rotating the substrate to thus form the coating film on the overall surface of the substrate, then the substrate is sealed into the rotation cup by closing the processing vessel by a lid member, and then a film thickness of the coating film is regulated by rotating the rotation cup and the substrate.
Abstract translation: 在通过将抗蚀剂液体供给到装载在旋转杯中的LCD基板的表面上来形成抗蚀剂膜时，通过将抗蚀剂液体喷涂到其表面上而在基板的表面上涂覆涂布液体，同时不旋转基板 在基板的整个表面上形成涂膜，然后通过盖构件封闭处理容器将基板密封到旋转杯中，然后通过旋转旋转杯和基板来调节涂膜的膜厚度 。
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公开(公告)号：US6159288A
公开(公告)日：2000-12-12
申请号：US935917
申请日：1997-09-23
Applicant: Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
Inventor： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
CPC classification number: B05C11/08 , Y10S134/902
Abstract: An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.
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公开(公告)号：US6090205A
公开(公告)日：2000-07-18
申请号：US152340
申请日：1998-09-14
Applicant: Mitsuhiro Sakai , Kiyohisa Tateyama
Inventor： Mitsuhiro Sakai , Kiyohisa Tateyama
CPC classification number: G03F7/40 , G03F7/3021 , B05C11/08
Abstract: A method of processing a substrate having the steps of placing a substrate for forming an LCD on a support, mounting a cover on the substrate in such a manner that a clearance is formed from at least either surface of the substrate placed on the support, introducing developer or pure water into the clearance, bringing the developer or pure water into contact with at least either surface of the substrate, processing the substrate with the developer or pure water, removing the cover from the substrate, and discharging the substrate from the support.
Abstract translation: 一种处理基板的方法，该方法具有以下步骤：将用于形成LCD的基板放置在支撑体上，将盖安装在基板上，使得从放置在支撑体上的基板的至少任一表面形成间隙， 显影剂或纯水进入间隙，使显影剂或纯水与基材的至少任一表面接触，用显影剂或纯水处理基材，从基材上除去盖子，并从载体上排出基材。
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公开(公告)号：US6013317A
公开(公告)日：2000-01-11
申请号：US40267
申请日：1998-03-16
Applicant: Kimio Motoda , Kiyohisa Tateyama
Inventor： Kimio Motoda , Kiyohisa Tateyama
IPC: B05C5/00 , B05C11/08 , B05D1/40 , B08B3/00 , B08B9/00 , G03F7/16 , H01L21/00 , H01L21/027 , B05D3/12
CPC classification number: H01L21/6715 , B05C11/08 , B08B3/00 , B08B9/00 , G03F7/162 , Y10S134/902
Abstract: A coating apparatus comprises a rotary container rotatable about a rotational axis as the center, a rotary rest table, located in the rotary container to be movable vertically and rotatable about the rotational axis as the center, for supporting a target substrate thereon, coating solution supply pipe for applying a coating solution to the target substrate, cleaning solution supply pipe for spraying a cleaning solution to an inner surface of the rotary container, a seal member provided between the rotary rest table and the bottom wall of the rotary container and capable of sealing a gap between the rotary rest table and the bottom wall of the rotary container, and connecting mechanism for connecting the rotary container and the rotary rest table so as to rotate together. The cleaning solution supply pipe projects from a through hole formed in the upper portion of the rotary container to be coaxial with the rotational axis, and the coating solution supply pipe projects from the through hole of the rotary container to be coaxial with the rotational axis.
Abstract translation: 一种涂覆装置，包括以围绕作为中心的旋转轴线可旋转的旋转容器，旋转托架，位于旋转容器中，以可旋转轴线为中心垂直移动并可旋转，用于将目标基板支撑在其上， 用于将涂布溶液施加到目标基板的管道，用于将清洗溶液喷射到旋转容器的内表面的清洁溶液供给管，设置在旋转托架和旋转容器的底壁之间并且能够密封的清洁溶液供给管 旋转托架和旋转容器的底壁之间的间隙，以及用于连接旋转容器和旋转托架一起旋转的连接机构。 清洗液供给管从形成在旋转容器的上部的贯通孔突出成与旋转轴线同轴，涂布液供给管从旋转容器的贯通孔突出成与旋转轴线同轴。
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Patent Agency Ranking
公开(公告)号：US5762708A
公开(公告)日：1998-06-09
申请号：US525342
申请日：1995-09-07
Applicant: Kimio Motoda , Kiyohisa Tateyama
Inventor： Kimio Motoda , Kiyohisa Tateyama
IPC: B05C5/00 , B05C11/08 , B05D1/40 , B08B3/00 , B08B9/00 , G03F7/16 , H01L21/00 , H01L21/027 , B05C11/02
CPC classification number: H01L21/6715 , B05C11/08 , B08B3/00 , B08B9/00 , G03F7/162 , Y10S134/902
Abstract: A coating apparatus comprises a rotary container rotatable about a rotational axis as the center, a rotary rest table, located in the rotary container to be movable vertically and rotatable about the rotational axis as the center, for supporting a target substrate thereon, coating solution supply pipe for applying a coating solution to the target substrate, cleaning solution supply pipe for spraying a cleaning solution to an inner surface of the rotary container, a seal member provided between the rotary rest table and the bottom wall of the rotary container and capable of sealing a gap between the rotary rest table and the bottom wall of the rotary container, and connecting mechanism for connecting the rotary container and the rotary rest table so as to rotate together. The cleaning solution supply pipe projects from a through hole formed in the upper portion of the rotary container to be coaxial with the rotational axis, and the coating solution supply pipe projects from the through hole of the rotary container to be coaxial with the rotational axis.
Abstract translation: 一种涂覆装置，包括以围绕作为中心的旋转轴线可旋转的旋转容器，旋转托架，位于旋转容器中，以可旋转轴线为中心垂直移动并可旋转，用于将目标基板支撑在其上， 用于将涂布溶液施加到目标基板的管道，用于将清洗溶液喷射到旋转容器的内表面的清洁溶液供给管，设置在旋转托架和旋转容器的底壁之间并且能够密封的清洁溶液供给管 旋转托架和旋转容器的底壁之间的间隙，以及用于连接旋转容器和旋转托架一起旋转的连接机构。 清洗液供给管从形成在旋转容器的上部的贯通孔突出成与旋转轴线同轴，涂布液供给管从旋转容器的贯通孔突出成与旋转轴线同轴。
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公开(公告)号：US5421056A
公开(公告)日：1995-06-06
申请号：US229675
申请日：1994-04-19
Applicant: Kiyohisa Tateyama , Michiaki Matsushita
Inventor： Kiyohisa Tateyama , Michiaki Matsushita
IPC: B05C11/08 , B08B11/02 , G03F7/16 , G03F7/30 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/304 , H01L21/306 , H01L21/683
CPC classification number: H01L21/67028 , B08B11/02 , Y10S134/902 , Y10T279/18
Abstract: A cleaning apparatus for cleaning a semiconductor wafer comprises a spin chuck having a turn table. A gas supplying passage is formed in a shaft for supporting the turn table to supply a protecting gas to the rear surface of the wafer. A conical movable member, arranged to cover an end off the shaft, is movable upward and downward in accordance with the flow off the protecting gas supplied thereto. Inner ends of three reciprocating arms, supported by the turn table and extending in radial directions, abut against an outer surface of the movable member and biased by springs. Fixed pins are arranged on the turn table at positions which divide the circumference of the turn table into three equal parts, along the edge of the wafer. Three swingable levers are arranged such that one is provided between two adjacent fixed pins. One end of each swingable lever is connected to the outer end of each reciprocating arm and the other end of the lever has a pin brought into contact with the edge of the wafer. When the protecting gas is supplied, the movable member is moved upward to a working position, and the reciprocating arms are pressed by the movable member and moved outward. As a result, the swingable levers are moved so as to bring their pins into contact with the edge of the wafer, thereby clamping the wafer among the pins.
Abstract translation: 用于清洁半导体晶片的清洁装置包括具有转台的旋转卡盘。 气体供给通道形成在用于支撑转台的轴中，以将保护气体供应到晶片的后表面。 根据从其供应的保护气体的流动，可将上述端部从该轴上覆盖的圆锥形可移动部件向上和向下移动。 由转台支撑并在径向方向上延伸的三个往复臂的内端部抵靠可动件的外表面并被弹簧偏压。 固定销布置在转台上，沿着晶圆的边缘将转台的圆周分成三个相等的部分。 三个可摆动的杆被布置成使得一个设置在两个相邻的固定销之间。 每个可摆动杆的一端连接到每个往复臂的外端，并且杆的另一端具有与晶片的边缘接触的销。 当提供保护气体时，可动件向上移动到工作位置，并且往复臂由可动件按压并向外移动。 结果，摆动杆被移动以使它们的销与晶片的边缘接触，从而将晶片夹在销中。
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公开(公告)号：US5339128A
公开(公告)日：1994-08-16
申请号：US31464
申请日：1993-03-15
Applicant: Kiyohisa Tateyama , Masami Akimoto , Mitsuru Ushijima
Inventor： Kiyohisa Tateyama , Masami Akimoto , Mitsuru Ushijima
CPC classification number: G03F7/7075 , B29C31/00 , G03F7/16 , G03F7/26 , G03F7/3021 , H01L21/67173 , H01L21/67178 , H01L21/67742 , Y10S134/902 , Y10S414/136
Abstract: A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.
Abstract translation: 本发明的抗蚀剂处理系统包括至少两个用于输送晶片的机器人，机器人可以移动的通道，沿着通道布置的多个处理单元和用于临时保持待处理的晶片的等待单元。 等待单元布置在通道旁边和处理单元之间，并且其包括分隔在其中的多个隔室。
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公开(公告)号：US07101646B2
公开(公告)日：2006-09-05
申请号：US11229534
申请日：2005-09-20
Applicant: Kiyohisa Tateyama , Masafumi Nomura , Taketora Shinogi
Inventor： Kiyohisa Tateyama , Masafumi Nomura , Taketora Shinogi
IPC: G03F7/30
CPC classification number: G03D3/065 , G03D3/06 , G03F7/30 , G03F7/3071 , H01L21/6715 , H01L21/67253
Abstract: In this developing method and apparatus, a concentration measuring unit 222 picks part of developing fluid in a blending tank 186 to measure the resist concentration by an absorption photometry and feeds the detected resist concentration to a control unit 240. The control unit 240 controls respective valves 210, 212, 216 of a TMAH concentrate solution 200, a solvent pipe 204 and a drain pipe 208 in a manner that the developing fluid in the blending tank 186 has a TMAH concentration corresponding to a measured resist-concentration value to accomplish a constant developing rate, performing component control of the developing fluid. The developing fluid transferred from the blending tank 186 to a supply tank 188 is fed to a developer nozzle DN in a developing section 126 through a developer pipe 224 owing to the drive of a pump 228. Accordingly, even if the developing fluid is reused in the developing process in multiple times, it is possible to make sure of the uniformity in development.
Abstract translation: 在该显影方法和装置中，浓度测量单元222拾取混合罐186中的显影液的一部分，通过吸收测光法测量抗蚀剂浓度，并将检测到的抗蚀剂浓度供给到控制单元240。 控制单元240以这样的方式控制TMAH浓缩液200，溶剂管204和排水管208的各个阀210,212,216，使得混合罐186中的显影流体具有对应于测量的抗蚀剂层的TMAH浓度， 浓度值以实现恒定的显影速率，进行显影液的成分控制。 通过泵228的驱动，从混合罐186向供给罐188输送的显影液通过显影剂管道224被供给到显影部分126中的显影剂喷嘴DN。 因此，即使显影液在显影过程中重复使用多次，也可以确保显影的均匀性。
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公开(公告)号：US06706322B2
公开(公告)日：2004-03-16
申请号：US10062506
申请日：2002-02-05
Applicant: Kiyohisa Tateyama , Tsutae Omori
Inventor： Kiyohisa Tateyama , Tsutae Omori
IPC: B05D312
CPC classification number: H01L21/6715 , B05C11/08 , Y10T74/19074 , Y10T74/19102
Abstract: A drive pulley is disposed to a driving motor. A plurality of follower pulleys are disposed to a rotating shaft of a spin chuck that vacuum sucks a substrate. A belt is passed from one follower pulley to the drive pulley. Belts are passed from the other follower pulleys to the drive shafts of a plurality of air motors. Since the air motors assist the driving of the driving motor, a large substrate can be rotated at a predetermined rotating acceleration. Thus, a film forming apparatus and a film forming method that allow the quantity of process solution supplied to be reduced and a film of process solution to be equally formed on a substrate can be provided.
Abstract translation: 驱动皮带轮设置在驱动马达上。 多个从动带轮设置在旋转卡盘的旋转轴上，真空吸附基板。 皮带从一个从动轮传递到驱动皮带轮。 皮带从其他从动滑轮传递到多个气动马达的驱动轴。 由于空气马达有助于驱动马达的驱动，因此可以以预定的旋转加速度旋转大的基板。 因此，可以提供允许提供的处理溶液量减少并且可以在基板上同样形成处理溶液膜的成膜装置和成膜方法。
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