公开(公告)号：US06670022B1

公开(公告)日：2003-12-30

申请号：US09706028

申请日：2000-11-03

申请人： Stephen Wallace ,  Douglas M. Smith ,  Teresa Ramos ,  Kevin H. Rodrick ,  James S. Drage

发明人： Stephen Wallace ,  Douglas M. Smith ,  Teresa Ramos ,  Kevin H. Rodrick ,  James S. Drage

IPC分类号： B32B300

CPC分类号： H01L21/31695 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/02343 ,  H01L21/7682 ,  H01L23/5222 ,  H01L23/5329 ,  H01L2221/1047 ,  H01L2924/0002 ,  Y10T428/24479 ,  Y10T428/24595 ,  Y10T428/249953 ,  Y10T428/249969 ,  H01L2924/00

摘要： The present invention relates to nanoporous dielectric films and to a process for their manufacture. A substrate having a plurality of raised lines on its surface is provided with a relatively high porosity, low dielectric constant, silicon containing polymer composition positioned between the raised lines and a relatively low porosity, high dielectric constant, silicon containing composition positioned on the lines.