System and method for vacuum deposition of thin films
    9.
    发明授权
    System and method for vacuum deposition of thin films 失效
    真空沉积薄膜的系统和方法

    公开(公告)号:US4882198A

    公开(公告)日:1989-11-21

    申请号:US202830

    申请日:1988-06-03

    CPC classification number: C23C14/32

    Abstract: A substrate holder is mounted within the vacuum chamber for carrying at least one substrate; an electrically conductive crucible is positioned within said vacuum chamber and is electrically insulated therefrom but has a low electrical resistance connection therebetween. The crucible is adapted to contain a preselected material for evaporation onto a substrate on the substrate holder. A high voltage electron beam source is positioned within said vacuum chamber in the vicinity of said crucible and includes a high voltage electron gun and a deflection magnet system arranged for bending electrons from said gun into said crucible for evaporating the preselected material therein, the magnet system forms a magnet field of prearranged characteristics in the region above said crucible. A low voltage, high current plasma source, including a separate plasma generating chamber is positioned relative to said vacuum chamber to produce an intense first plasma of a selected activation gas species in said plasma generating chamber for injection into said vacuum chamber. The plasma source is positioned at any convenient location relative to the crucible and the electron beam source and is electrically interconnected with the crucible for current flow therebetween. The plasma source fills the vacuum chamber with a generally distributed plasma. The distributed plasma coacts with the magnetic field above said crucible and evaporant material leaving the crucible to form an intense second plasma in the region above said crucible, thereby activating the evaporant material passing through the region toward the substrate to produce a vacuum deposited thin film having improved thin film characteristics.

    Abstract translation: 衬底保持器安装在真空室内以承载至少一个衬底; 导电坩埚定位在所述真空室内并与之电绝缘,但是在它们之间具有低电阻连接。 坩埚适于容纳用于蒸发到衬底保持器上的衬底上的预选材料。 高电压电子束源位于所述坩埚附近的所述真空室内,并且包括高压电子枪和偏转磁体系统,其布置成用于将电子从所述枪弯曲到所述坩埚中,用于蒸发其中的预选材料,磁体系统 在所述坩埚上方的区域中形成预定特性的磁场。 包括单独的等离子体产生室的低电压,高电流等离子体源相对于所述真空室定位,以在所述等离子体发生室中产生用于注入所述真空室的所选激活气体种类的强烈的第一等离子体。 等离子体源位于相对于坩埚和电子束源的任何方便的位置,并且与坩埚电互连,用于其间的电流。 等离子体源以大致分布的等离子体填充真空室。 分布式等离子体与坩埚上方的磁场和离开坩埚的蒸发材料共同作用,在坩埚上方的区域中形成强烈的第二等离子体,从而使通过该区域的蒸发材料活动到衬底,以产生真空沉积的薄膜, 改善薄膜特性。

    System and method for vacuum deposition of thin films
    10.
    发明授权
    System and method for vacuum deposition of thin films 失效
    真空沉积薄膜的系统和方法

    公开(公告)号:US4777908A

    公开(公告)日:1988-10-18

    申请号:US935292

    申请日:1986-11-26

    CPC classification number: C23C14/32

    Abstract: A substrate holder is mounted within the vacuum chamber for carrying at least one substrate; an electrically conductive crucible is positioned within said vacuum chamber and is electrically insulated therefrom but has a low electrical resistance connection therebetween. The crucible is adapted to contain a preselected material for evaporation onto a substrate on the substrate holder. A high voltage electron beam source is positioned within said vacuum chamber in the vicinity of said crucible and includes a high voltage electron gun and a deflection magnet system arranged for bending electrons from said gun into said crucible for evaporating the preselected material therein, the magnet system forms a magnet field of prearranged characteristics in the region above said crucible. A low voltage, high current plasma source, including a separate plasma generating chamber is positioned relative to said vacuum chamber to produce an intense first plasma of a selected activation gas species in said plasma generating chamber for injection into said vacuum chamber. The plasma source is positioned at any convenient location relative to the crucible and the electron beam source and is electrically interconnected with the crucible for current flow therebetween. The plasma source fills the vacuum chamber with a generally distributed plasma. The distributed plasma coacts with the magnetic field above said crucible and evaporant material leaving the crucible to form an intense second plasma in the region above said crucible, thereby activating the evaporant material passing through the region toward the substrate to produce a vacuum deposited thin film having improved thin film characteristics.

    Abstract translation: 衬底保持器安装在真空室内以承载至少一个衬底; 导电坩埚定位在所述真空室内并与之电绝缘,但是在它们之间具有低电阻连接。 坩埚适于容纳用于蒸发到衬底保持器上的衬底上的预选材料。 高电压电子束源位于所述坩埚附近的所述真空室内,并且包括高压电子枪和偏转磁体系统,其布置成用于将电子从所述枪弯曲到所述坩埚中,用于蒸发其中的预选材料,磁体系统 在所述坩埚上方的区域中形成预定特性的磁场。 包括单独的等离子体产生室的低电压,高电流等离子体源相对于所述真空室定位,以在所述等离子体发生室中产生用于注入所述真空室的所选激活气体种类的强烈的第一等离子体。 等离子体源位于相对于坩埚和电子束源的任何方便的位置,并且与坩埚电互连,用于其间的电流。 等离子体源以大致分布的等离子体填充真空室。 分布式等离子体与坩埚上方的磁场和离开坩埚的蒸发材料共同作用,在坩埚上方的区域中形成强烈的第二等离子体,从而使通过该区域的蒸发材料活动到衬底,以产生真空沉积的薄膜, 改善薄膜特性。

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