摘要:
A gas discharge panel in which cell filled with a discharge gas are arranged as a matrix between a pair of opposed plates, and in which a pair of display electrodes on a surface of one of the pair of opposed plates extend across a plurality of cells in the direction of rows, where a gap between the pair of display electrodes has two discharge gap widths one of which is larger than the other. The voltage is lowered and the power consumption is properly restricted by starting the discharge at the discharge gap at a space having the smaller gap width. An excellent discharge efficiency is secured by sustaining the discharge at a space having the larger gap width.
摘要:
A method of producing a gas discharge panel includes forming a surrounding unit by positioning a first panel and a second panel together with barrier ribs to partition the space between the panels into cells for light emission when charged with a plasma gas and appropriately addressed. An anti-sealing material inflow rib surrounds the barrier ribs. Sealing material is positioned outside the anti-sealing material inflow rib. The pressure inside the surrounding unit is adjusted to be lower than pressure outside the surrounding unit while applying heat to fuse the sealing material between the first panel and the second panel whereby sealing material is prevented from inflowing into the cells between the barrier ribs during production.
摘要:
A PDP does not suffer from dielectric breakdown even though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 .mu.m layer of a metallic oxide on whose surface OH groups exist, such as ZnO, ZrO.sub.2, MgO, TiO.sub.2, Al.sub.2 O.sub.3, and Cr.sub.2 O.sub.3. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is than coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.
摘要翻译:即使电介质层较薄,PDP也不会受到电介质击穿,同时避免了在制造PDP期间在玻璃基板中出现的常规PDP的问题。 为此,PDP的银电极的表面涂覆有其表面存在OH基的金属氧化物如ZnO,ZrO 2,MgO,TiO 2,Al 2 O 3和Cr 2 O 3的0.1-10μm层。 然后用电介质层涂覆金属氧化物层。 优选用CVD法形成金属氧化物层。 金属电极的表面可以涂覆有被涂覆有介电层的金属氧化物。 电介质层可以用真空处理方法或等离子体热喷涂方法由金属氧化物制成。 用CVD法形成在电极上的电介质层非常薄且无瑕疵。 当使用真空处理方法或等离子喷涂方法形成电介质层时,防止了通常由电介质层烘烤引起的翘曲和裂纹。 这里可以使用包含6.5重量%以下的碱的硼硅酸盐玻璃作为玻璃基板。
摘要:
A method is provided to steadily produce a gas discharge panel, such as a PDP, in which a panel and the top of the barrier ribs are in intimate contact in entirety. First a surrounding unit for the gas discharge panel is formed, then a process for sealing the surrounding unit with a sealing material inserted between two panels at the rim is performed while pressure is adjusted so that pressure inside the surrounding unit is lower than pressure outside. With this construction, the panels constituting the surrounding unit are bonded together while they are pressurized from outside. As a result, a panel and the top of the barrier ribs on the other panel are bonded together while they are in intimate contact in entirety. To fully acquire these effects, it is preferable that the adjustment of pressure starts before the sealing material hardens. During, before, or after the sealing step, an energy such as laser beams or ultrasonic waves may be radiated onto the top of the barrier ribs to bond a panel and the top of the barrier ribs in entirety almost without a gap between them.
摘要:
A method is provided to steadily produce a gas discharge panel, such as a PDP, in which a panel and the top of the barrier ribs are in intimate contact in entirety. First a surrounding unit for the gas discharge panel is formed, then a process for sealing the surrounding unit with a sealing material inserted between two panels at the rim is performed while pressure is adjusted so that pressure inside the surrounding unit is lower than pressure outside. With this construction, the panels constituting the surrounding unit are bonded together while they are pressurized from outside. As a result, a panel and the top of the barrier ribs on the other panel are bonded together while they are in intimate contact in entirety. To fully acquire these effects, it is preferable that the adjustment of pressure starts before the sealing material hardens. During, before, or after the sealing step, an energy such as laser beams or ultrasonic waves may be radiated onto the top of the barrier ribs to bond a panel and the top of the barrier ribs in entirety almost without a gap between them.
摘要:
A PDP does not suffer from dielectric breakdown even though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 &mgr;m layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO2, MgO, TiO2, Al2O3, and Cr2O3. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.
摘要翻译:即使电介质层较薄,PDP也不会受到电介质击穿,同时避免了在制造PDP期间在玻璃基板中出现的常规PDP的问题。 为了这样做,PDP的银电极的表面涂覆有0.1-10μm的金属氧化物层,其表面上存在OH基团,例如ZnO,ZrO 2,MgO,TiO 2,Al 2 O 3和Cr 2 O 3。 然后用电介质层涂覆金属氧化物层。 优选用CVD法形成金属氧化物层。 金属电极的表面可以涂覆有金属氧化物,然后涂覆有介电层。 电介质层可以用真空处理方法或等离子体热喷涂方法由金属氧化物制成。 用CVD法形成在电极上的电介质层非常薄且无瑕疵。 当使用真空处理方法或等离子喷涂方法形成电介质层时,防止了通常由电介质层烘烤引起的翘曲和裂纹。 这里可以使用包含6.5重量%以下的碱的硼硅酸盐玻璃作为玻璃基板。
摘要:
A PDP does not suffer from dielectric breakdown though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 &mgr;m layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO2, MgO, TiO2, Al2O3, and Cr2O3. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.
摘要翻译:尽管电介质层较薄,PDP不会遭受电介质击穿,而在PDP的制造过程中出现玻璃基板中的裂纹等常规PDP的问题。 为了这样做,PDP的银电极的表面涂覆有0.1-10μm的金属氧化物层,其表面上存在OH基团,例如ZnO,ZrO 2,MgO,TiO 2,Al 2 O 3和Cr 2 O 3。 然后用电介质层涂覆金属氧化物层。 优选用CVD法形成金属氧化物层。 金属电极的表面可以涂覆有金属氧化物,然后涂覆有介电层。 电介质层可以用真空处理方法或等离子体热喷涂方法由金属氧化物制成。 用CVD法形成在电极上的电介质层非常薄且无瑕疵。 当使用真空处理方法或等离子喷涂方法形成电介质层时,防止了通常由电介质层烘烤引起的翘曲和裂纹。 这里可以使用包含6.5重量%以下的碱的硼硅酸盐玻璃作为玻璃基板。