摘要:
The invention is directed to a method for manufacturing semiconductor device. The method comprises steps of providing a substrate and then forming a dielectric material-containing device over the substrate. A plasma vapor deposition process is performed to form a dielectric layer over the substrate. A first baking process is performed.
摘要:
A method of transferring a wafer is disclosed. The method comprises providing a pedestal and at least one spray orifice extending through the pedestal; disposing a wafer above the pedestal using a first robot, wherein the wafer has a first surface and a second surface, the first surface faces the pedestal, a fluid is sprayed onto the first surface simultaneously to avoid a contact of the first surface with the pedestal, and the fluid contains a charge-forming chemical substance dissolved therein; and taking the wafer using a robot for delivery. Due to the charge-forming chemical substance dissolved in the fluid, the waterfall effect to cause discharge damage on the wafer is avoided in the spraying of the fluid.
摘要:
A built-in FM transmitting antenna applied to a mobile device, includes a substrate unit, a first antenna unit, a conducting unit and a second antenna unit. The substrate unit has a circuit substrate, at least one grounding layer disposed on the circuit substrate, and a plurality of conducting pads disposed on the circuit substrate. The first antenna unit is disposed above the substrate unit and substantially parallel to the substrate unit. The conducting unit is electrically connected between the substrate unit and the first antenna unit. The second antenna unit is directly disposed on the edge of the top surface of the circuit substrate. The second antenna unit has two ends electrically connected between two of the conducting pads, respectively. The two ends of the second antenna unit are electrically connected to an FM chip module and the conducting unit through the two of the conducting pads, respectively.
摘要:
A method of transferring a wafer is disclosed. The method comprises providing a pedestal and at least one spray orifice extending through the pedestal; disposing a wafer above the pedestal using a first robot, wherein the wafer has a first surface and a second surface, the first surface faces the pedestal, a fluid is sprayed onto the first surface simultaneously to avoid a contact of the first surface with the pedestal, and the fluid contains a charge-forming chemical substance dissolved therein; and taking the wafer using a robot for delivery. Due to the charge-forming chemical substance dissolved in the fluid, the waterfall effect to cause discharge damage on the wafer is avoided in the spraying of the fluid.
摘要:
A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.
摘要:
A built-in FM transmitting antenna applied to a mobile device, includes a substrate unit, a first antenna unit, a conducting unit and a second antenna unit. The substrate unit has a circuit substrate, at least one grounding layer disposed on the circuit substrate, and a plurality of conducting pads disposed on the circuit substrate. The first antenna unit is disposed above the substrate unit and substantially parallel to the substrate unit. The conducting unit is electrically connected between the substrate unit and the first antenna unit. The second antenna unit is directly disposed on the edge of the top surface of the circuit substrate. The second antenna unit has two ends electrically connected between two of the conducting pads, respectively. The two ends of the second antenna unit are electrically connected to an FM chip module and the conducting unit through the two of the conducting pads, respectively.
摘要:
The invention is directed to a method for manufacturing semiconductor device. The method comprises steps of providing a substrate and then forming a dielectric material-containing device over the substrate. A plasma vapor deposition process is performed to form a dielectric layer over the substrate. A first baking process is performed.
摘要:
A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.
摘要:
A wafer including a high stressed thin film thereon is lifted, and a pre-heating process is performed while the wafer is lifted. Subsequently, a dielectric layer is deposited on the high stressed thin film.
摘要:
A method of transferring a wafer is disclosed. The method comprises providing a pedestal and at least one spray orifice extending through the pedestal; disposing a wafer above the pedestal using a first robot, wherein the wafer has a first surface and a second surface, the first surface faces the pedestal, a fluid is sprayed onto the first surface simultaneously to avoid a contact of the first surface with the pedestal, and the fluid contains a charge-forming chemical substance dissolved therein; and taking the wafer using a robot for delivery. Due to the charge-forming chemical substance dissolved in the fluid, the waterfall effect to cause discharge damage on the wafer is avoided in the spraying of the fluid.