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    Compositions for microlithography
    2.
    发明授权
    Compositions for microlithography 失效
    用于微光刻的组合物

    公开(公告)号：US06974657B2

    公开(公告)日：2005-12-13

    申请号：US10380922

    申请日：2001-10-16

    申请人： Larry L. Berger ,  Michael Karl Crawford ,  Jerald Feldman ,  Lynda Kaye Johnson ,  Frank Leonard Schadt, III ,  Fredrick Claus Zumsteg, Jr.

    发明人： Larry L. Berger ,  Michael Karl Crawford ,  Jerald Feldman ,  Lynda Kaye Johnson ,  Frank Leonard Schadt, III ,  Fredrick Claus Zumsteg, Jr.

    IPC分类号： C08F232/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/038

    CPC分类号： G03F7/0395 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/106 ,  Y10S430/108

    摘要： A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1′-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: —C(Rf)(Rf′)Orb wherein Rf and Rf′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is an integer ranging from 2 to about 10 and Rb is a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4.0 mm−1 at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.

    摘要翻译： 由至少选自乙烯，α-烯烃，1,1'-二取代的烯烃，乙烯醇，乙烯基醚和1,3-二烯的间隔基组成的含氟聚合物; 和含有具有以下结构的官能团的降冰片基：-C（R）f（= O）或其中R是＆lt; SUB＆gt; F 1和R 2'是相同或不同的1至约10个碳原子的氟代烷基或一起为（CF 2） 其中n为2至约10的整数，R b为氢原子或酸或碱不稳定保护基; r为0-4以内的整数。 含氟聚合物在157nm的波长下的吸收系数小于4.0mm -1。 这些聚合物可用于微光刻的光致抗蚀剂组合物中。 它们在这种短波长下表现出高透明度，并且还具有其他关键性能，包括良好的等离子体耐蚀刻性和粘合性。

    Multilayer elements containing photoresist compositions and their use in microlithography
    3.
    发明授权
    Multilayer elements containing photoresist compositions and their use in microlithography 失效
    含有光致抗蚀剂组合物的多层元件及其在微光刻中的应用

    公开(公告)号：US07205086B2

    公开(公告)日：2007-04-17

    申请号：US10398872

    申请日：2001-11-26

    申请人： Larry L. Berger ,  Frank L. Schadt, III

    发明人： Larry L. Berger ,  Frank L. Schadt, III

    IPC分类号： G03F7/004 ,  G03F7/03

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/11 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A photoresist element comprising a substrate; an etch resistant layer; and at least one photoresist layer prepared from a photoresist composition comprising a polymer selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: —C(Rf)(Rf′)OH, wherein Rf and Rf′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2═CY2 where X═F or CF3 and Y═—H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2═CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.

    摘要翻译： 一种光致抗蚀剂元件，包括基底; 耐蚀刻层; 和由光致抗蚀剂组合物制备的至少一个光致抗蚀剂层，所述光致抗蚀剂组合物包含选自以下的聚合物：（a）包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯键式不饱和化合物 是多环的 （b）含有保护的酸基团的支化聚合物，所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; （c）具有至少一个具有以下结构的氟代醇基的含氟聚合物：-C（R f）f（R f）f OH，其中R f 和R 1是相同或不同的1至约10个碳原子的氟代烷基或一起为（CF 2 N 2）n，其中n为2至10; （d）全氟（2,2-二甲基-1,3-间二氧杂环戊烯）或CX 2 - CY 2 2的无定形乙烯基均聚物，其中XF或CF 3 < 和/或Y-H或全氟（2,2-二甲基-1,3-间二氧杂环戊烯）和CX 2-CY 2 2的无定形乙烯基共聚物。 和（e）由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; 和（B）至少一种光活性组分。

    Polymers blends and their use in photoresist compositions for microlithography
    4.
    发明授权
    Polymers blends and their use in photoresist compositions for microlithography 失效
    聚合物共混物及其在光刻胶组合物中的应用用于微光刻

    公开(公告)号：US07045268B2

    公开(公告)日：2006-05-16

    申请号：US10398871

    申请日：2001-11-21

    申请人： Larry L. Berger ,  Frank L. Schadt, III

    发明人： Larry L. Berger ,  Frank L. Schadt, III

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0382 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A photoresist composition having (A) at least two polymers selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: —C(Rf)(Rf′)OH wherein Rf and Rf′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10;(d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole or CX2═CY2 where X=F or CF3 and Y=H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2═CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.

    摘要翻译： 一种光致抗蚀剂组合物，其具有（A）至少两种选自以下的聚合物：（a）包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的; （b）含有保护的酸基团的支化聚合物，所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; （c）具有至少一个具有以下结构的氟代醇的含氟聚合物：其中R f和R f'为相同或不同的具有1至约10个碳原子的氟代烷基或它们一起为（CF 2） ）n其中n为2至10;（d）全氟（2,2-二甲基-1,3-间二氧杂环戊烯或CX2-CY2）其中X = F或CF 3和Y = H的无定形乙烯基均聚物或全氟（ 2,2-二甲基-1,3-二氧杂环戊烯）和CX2-CY2;和（e）由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物;和（B）至少一种光活性组分。

    Methods and materials for obtaining phenotypic females despite androgen administration
    5.
    发明授权
    Methods and materials for obtaining phenotypic females despite androgen administration 失效
    尽管雄激素给药，获得表型雌性的方法和材料

    公开(公告)号：US5238928A

    公开(公告)日：1993-08-24

    申请号：US774584

    申请日：1991-10-10

    申请人： Larry L. Berger ,  Darrel Kesler

    发明人： Larry L. Berger ,  Darrel Kesler

    IPC分类号： A23K1/165 ,  A23K1/18

    CPC分类号： A23K50/30 ,  A23K20/168

    摘要： Methods for producing phenotypic female mammals intended for human or animal consumption despite androgen administration to obtain the benefits thereof, which methods include prenatally exposing said female mammals to androgen by administering to the mother an effectively constant amount of androgen sufficient to achieve and maintain a level of circulating androgen in the mother's bloodstream approximately equivalent to that of a normal adult male of the same species.

    摘要翻译： 用于生产用于人或动物消费的表型雌性哺乳动物的方法，尽管雄激素给药以获得其益处，所述方法包括通过向母亲施用足够的有效恒定量的雄激素来将所述雌性哺乳动物暴露于雄激素，以达到和保持水平 母体血液中的循环雄激素大致相当于同一物种的正常成年男性。