公开(公告)号：US20060072088A1

公开(公告)日：2006-04-06

申请号：US10957751

申请日：2004-10-05

申请人： Matthew Lipson ,  Marcel Mathijs Dierichs ,  Sjoerd Nicolaas Donders ,  Johannes Catharinus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

发明人： Matthew Lipson ,  Marcel Mathijs Dierichs ,  Sjoerd Nicolaas Donders ,  Johannes Catharinus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.

摘要翻译： 提供了一种光刻设备，其中通过突出通过碱金属卤化物的水溶液进行曝光，该溶液与待暴露的基板接触。

公开(公告)号：US20070103655A1

公开(公告)日：2007-05-10

申请号：US11642912

申请日：2006-12-21

申请人： Marcel Mathijs Dierichs ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Marcel Mathijs Dierichs ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/32

CPC分类号： G03F7/70958 ,  G03F7/70341

摘要： A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.

摘要翻译： 基板设置有对投影光束的波长基本透明的材料涂层。 涂层可以比投影光束的波长厚，并且具有涂层的折射率，使得投影光束的波长在其通过时被缩短。 这允许在衬底上成像较小的特征。 或者，涂层可以与液体供应系统一起使用，并且用于保持气泡远离基底的辐射敏感层。

公开(公告)号：US20050042554A1

公开(公告)日：2005-02-24

申请号：US10898674

申请日：2004-07-26

申请人： Marcel Mathijs Dierichs ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Marcel Mathijs Dierichs ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03C1/52 ,  G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70341

摘要： A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.

摘要翻译： 基板设置有对投影光束的波长基本透明的材料涂层。 涂层可以比投影光束的波长厚，并且具有涂层的折射率，使得投影光束的波长在其通过时被缩短。 这允许在衬底上成像较小的特征。 或者，涂层可以与液体供应系统一起使用，并且用于保持气泡远离基底的辐射敏感层。

公开(公告)号：US20070046915A1

公开(公告)日：2007-03-01

申请号：US11355192

申请日：2006-02-16

申请人： Bob Streefkerk ,  Marcel Mathijs Dierichs ,  Wendy Gehoel-Van Ansem

发明人： Bob Streefkerk ,  Marcel Mathijs Dierichs ,  Wendy Gehoel-Van Ansem

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70866 ,  G03F7/70958

摘要： A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.

摘要翻译： 提供了一种光刻设备和设备的制造方法，其中通过突发通过pH小于7的液体进行曝光，液体与待暴露的基板接触。 液体有利地包括抗反射面漆。

公开(公告)号：US20050007570A1

公开(公告)日：2005-01-13

申请号：US10852681

申请日：2004-05-25

申请人： Bob Streefkerk ,  Marcel Mathijs Dierichs ,  Wendy Gehoel-Van Ansem

发明人： Bob Streefkerk ,  Marcel Mathijs Dierichs ,  Wendy Gehoel-Van Ansem

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70866 ,  G03F7/70958

摘要： A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.

摘要翻译： 提供了一种光刻设备和设备的制造方法，其中通过突发通过pH小于7的液体进行曝光，液体与要暴露的基板接触。 液体有利地包括抗反射面漆。

公开(公告)号：US20090002652A1

公开(公告)日：2009-01-01

申请号：US12153276

申请日：2008-05-15

申请人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Antonius Theodorus Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Mulkens ,  Roelof Aeilko Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。

公开(公告)号：US20050263068A1

公开(公告)日：2005-12-01

申请号：US10966110

申请日：2004-10-18

申请人： Christiaan Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Mulkens ,  Erik Theodorus Bijlaart ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Jeroen Johannes Sophia Mertens ,  Bernardus Slaghekke ,  Patricius Aloysius Tinnemans ,  Helmar Van Santen

发明人： Christiaan Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Mulkens ,  Erik Theodorus Bijlaart ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Jeroen Johannes Sophia Mertens ,  Bernardus Slaghekke ,  Patricius Aloysius Tinnemans ,  Helmar Van Santen

IPC分类号： G03F7/20 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00 ,  H01L21/027

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US20060197927A1

公开(公告)日：2006-09-07

申请号：US11071579

申请日：2005-03-04

申请人： Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70058 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70358 ,  G03F2007/2067

摘要： In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.

公开(公告)号：US20060007419A1

公开(公告)日：2006-01-12

申请号：US10885489

申请日：2004-07-07

申请人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens

发明人： Bob Streefkerk ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

公开(公告)号：US20050219483A1

公开(公告)日：2005-10-06

申请号：US11092964

申请日：2005-03-30

申请人： Johannes Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： H01L21/027 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7096 ,  G03F7/70341

摘要： An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.

摘要翻译： 公开了一种浸没式光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充投影系统的最终元件和基板台之间的空间与第一液体，以及测量系统，其被配置为测量每个 多个点在基板上，测量系统布置成使得通过第二液体进行测量，第二液体不由液体供应系统供应。