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    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    1.
    发明授权
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US06906787B2

    公开(公告)日：2005-06-14

    申请号：US10716938

    申请日：2003-11-20

    申请人： Marcus Adrianus Van De Kerhof ,  Wilhelmus Petrus De Boeij ,  Marcel Maurice Hemerik

    发明人： Marcus Adrianus Van De Kerhof ,  Wilhelmus Petrus De Boeij ,  Marcel Maurice Hemerik

    IPC分类号： G21K5/00 ,  G01J1/42 ,  G01J1/58 ,  G01T1/20 ,  G02B5/26 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  G03B27/54 ,  G03B27/72

    CPC分类号： G03F7/70558 ,  G01J1/429 ,  G01J1/58 ,  G03F7/7085

    摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of primary radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, the sensor including a radiation-sensitive material which converts incident primary radiation into secondary radiation, a radiation detector capable of detecting said secondary radiation emerging from said material, and a filter material for preventing secondary radiation from traveling in a direction away from the radiation detector.

    摘要翻译： 光刻投影装置包括用于提供初级辐射的投影光束的辐射系统，用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构，用于保持基板的基板台， 系统，用于将图案化的光束投影到基板的目标部分上，辐射传感器，其可在由投影光束穿过的路径中移动，用于将一次辐射从投影光束接收，该传感器包括转换入射的辐射敏感材料 初级辐射进入次级辐射，能够检测从所述材料出射的所述次级辐射的辐射检测器和用于防止二次辐射沿远离辐射检测器的方向行进的过滤材料。