公开(公告)号：US20060102077A1

公开(公告)日：2006-05-18

申请号：US11272216

申请日：2005-11-10

申请人： Markus Esselbach ,  Martin Zaech ,  Orlaw Massler ,  Martin Grischke

发明人： Markus Esselbach ,  Martin Zaech ,  Orlaw Massler ,  Martin Grischke

IPC分类号： C23C14/00 ,  B01J19/08 ,  C23C16/00

CPC分类号： H01J37/3405 ,  C23C14/0605 ,  C30B23/02 ,  C30B30/04 ,  C30B35/00 ,  E05B51/02 ,  E05B51/023 ,  E05B65/001 ,  H01J37/3447

摘要： A vacuum treatment system (1) for treating workpieces has a treatment chamber (10) that can be evacuated and in which a low-volt arc-discharge device is placed, with at least one locking loading/unloading aperture and at least one coating source placed on one side wall of the treatment chamber. It also has a device for producing a magnetic field to create a remote magnetic field and at least one workpiece holder to hold workpieces. A target-shutter arrangement (8, 8′) is designed so that when uncovered, the distance between the shutter (8) and the target (12) is less than 35 mm, thus allowing ignition and operation of a magnetron or cathode spark discharge behind the target, but preventing ignition of auxiliary plasma when the target (8) is turned off.

摘要翻译： 一种用于处理工件的真空处理系统（1）具有可以抽真空的处理室（10），其中放置有低压灭弧装置，具有至少一个锁定装载/卸载孔和至少一个涂覆源 放置在处理室的一个侧壁上。 它还具有用于产生磁场以产生远程磁场的装置和用于保持工件的至少一个工件保持器。 目标快门装置（8,8'）被设计成当未被覆盖时，快门（8）和目标（12）之间的距离小于35mm，从而允许点火和操作磁控管或阴极火花放电 在目标之后，但是当目标（8）关闭时，防止辅助等离子体的点燃。

公开(公告)号：US20050072266A1

公开(公告)日：2005-04-07

申请号：US10601734

申请日：2003-06-23

申请人： Martin Zaech ,  Anton Kunz

发明人： Martin Zaech ,  Anton Kunz

IPC分类号： C23C14/50 ,  F16H37/00 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68764 ,  C23C14/505 ,  H01J2237/202 ,  H01L21/6715 ,  H01L21/68771 ,  Y10T74/19

摘要： A planet system workpiece support for a vacuum treatment apparatus includes a sun system rotatable in the vacuum treatment apparatus about a sun system axle to be coupled to a drive. At least one planet system is rotatable on planet axle and is supported on the sun system. The planet system has a driving coupling for driving the planet system and the support has at least one moon system supported on the planet system and rotatable about a moon axle with a driving connection to the sun system. At least one workpiece is received on the moon system and the driving connection is established, at least during operation, uninterruptedly between sun system and moon system.

摘要翻译： 用于真空处理设备的行星系统工件支撑件包括可在真空处理设备中围绕要耦合到驱动器的太阳系轴线旋转的太阳系。 至少一个行星系统可以在行星轴上旋转并被支撑在太阳系统上。 行星系统具有用于驱动行星系统的驱动联接器，并且支撑件具有支撑在行星系统上的至少一个月球系统，并且能够围绕具有与太阳系统的驱动连接的月球轴旋转。 在月球系统上至少接收一个工件，至少在运行期间建立驱动连接，太阳系和月球系统之间不间断。

公开(公告)号：US06620254B2

公开(公告)日：2003-09-16

申请号：US09879527

申请日：2001-06-12

申请人： Martin Zaech ,  Anton Kunz

发明人： Martin Zaech ,  Anton Kunz

IPC分类号： C23C1600

CPC分类号： C23C14/505

摘要： A vacuum treatment workpiece support and method for a vacuum treatment apparatus, uses a sun system that is rotatable with respect to the apparatus about a sun system axle. The sun system is coupled to an apparatus-side drive. At least one planet system supported on the sun system, is rotatable about a planet axle and is provided with a driving coupling with respect to the apparatus. At least one moon system is supported on the planet system, and is rotatable about a moon axle with a driving connection to the sun system. A receiver for at least one workpiece is provided on the moon system. The driving connection is established, at least during operation of the apparatus, in an uninterrupted manner, between the sun system and the moon system.

公开(公告)号：US06471837B1

公开(公告)日：2002-10-29

申请号：US09537293

申请日：2000-03-29

申请人： Michael Hans ,  Martin Zaech

发明人： Michael Hans ,  Martin Zaech

IPC分类号： C23C1434

CPC分类号： C23C14/505 ,  B01J3/03 ,  C23C14/566 ,  C23C14/568

摘要： A vacuum coating installation has at least a central distribution station which can be evacuated and has a transport arrangement driven in a controlled manner essentially along a plane, for the material to be treated. One operating station for the distribution station as well as at least two processing stations for the material to be treated are provided. The three or more stations communicate by way of operating openings with the distribution station, through which openings the material to be treated can be transported from one station into the other by the transport arrangement for the material to be treated. The material to be treated is formed by individual workpiece holders of the installation, each having a plurality of workpiece supports. On at least one of the processing stations, a drive and a driving connection, which can be established and released in a controlled manner, between the drive and the workpiece supports of a workpiece holder introduced in the processing station is provided for ensuring a three-dimensional workpiece processing in the processing station.

摘要翻译： 真空镀膜装置至少具有一个中央分配站，该中心分配站可被排空，并且具有以受控方式驱动的输送装置，基本上沿平面驱动待处理材料。 提供了用于配送站的一个操作站以及用于待处理材料的至少两个处理站。 三个或更多个站通过与分配站的操作开口进行通信，通过该开口，待处理材料可以通过待处理材料的输送装置从一个站传送到另一个站。 待处理的材料由安装的各个工件保持器形成，每个具有多个工件支撑件。 在至少一个处理站中，提供可以以受控的方式建立和释放的驱动和驱动连接在驱动器和引入到处理站中的工件保持件的工件支撑件之间， 在加工站的三维工件加工。

公开(公告)号：US07905991B2

公开(公告)日：2011-03-15

申请号：US11272216

申请日：2005-11-10

申请人： Markus Esselbach ,  Martin Zaech ,  Orlaw Massler ,  Martin Grischke

发明人： Markus Esselbach ,  Martin Zaech ,  Orlaw Massler ,  Martin Grischke

IPC分类号： C23C14/35

CPC分类号： H01J37/3405 ,  C23C14/0605 ,  C30B23/02 ,  C30B30/04 ,  C30B35/00 ,  E05B51/02 ,  E05B51/023 ,  E05B65/001 ,  H01J37/3447

摘要： A vacuum treatment system (1) for treating workpieces has a treatment chamber (10) that can be evacuated and in which a low-volt arc-discharge device is placed, with at least one locking loading/unloading aperture and at least one coating source placed on one side wall of the treatment chamber. It also has a device for producing a magnetic field to create a remote magnetic field and at least one workpiece holder to hold workpieces. A target-shutter arrangement (8, 8′) is designed so that when uncovered, the distance between the shutter (8) and the target (12) is less than 35 mm, thus allowing ignition and operation of a magnetron or cathode spark discharge behind the target, but preventing ignition of auxiliary plasma when the target (8) is turned off.

摘要翻译： 一种用于处理工件的真空处理系统（1）具有可以抽真空的处理室（10），其中放置有低压灭弧装置，具有至少一个锁定装载/卸载孔和至少一个涂覆源 放置在处理室的一个侧壁上。 它还具有用于产生磁场以产生远程磁场的装置和用于保持工件的至少一个工件保持器。 目标快门装置（8,8'）被设计成当未被覆盖时，快门（8）和目标（12）之间的距离小于35mm，从而允许点火和操作磁控管或阴极火花放电 在目标之后，但是当目标（8）关闭时，防止辅助等离子体的点燃。

公开(公告)号：US07081166B2

公开(公告)日：2006-07-25

申请号：US10601734

申请日：2003-06-23

申请人： Martin Zaech ,  Anton Kunz

发明人： Martin Zaech ,  Anton Kunz

IPC分类号： C23C16/00 ,  C23C13/08

CPC分类号： H01L21/68764 ,  C23C14/505 ,  H01J2237/202 ,  H01L21/6715 ,  H01L21/68771 ,  Y10T74/19

摘要： A planet system workpiece support for a vacuum treatment apparatus includes a sun system rotatable in the vacuum treatment apparatus about a sun system axle to be coupled to a drive. At least one planet system is rotatable on planet axle and is supported on the sun system. The planet system has a driving coupling for driving the planet system and the support has at least one moon system supported on the planet system and rotatable about a moon axle with a driving connection to the sun system. At least one workpiece is received on the moon system and the driving connection is established, at least during operation, uninterruptedly between sun system and moon system.

摘要翻译： 用于真空处理设备的行星系统工件支撑件包括可在真空处理设备中围绕要耦合到驱动器的太阳系轴线旋转的太阳系。 至少一个行星系统可以在行星轴上旋转并被支撑在太阳系统上。 行星系统具有用于驱动行星系统的驱动联接器，并且支撑件具有支撑在行星系统上的至少一个月球系统，并且能够围绕具有与太阳系统的驱动连接的月球轴旋转。 在月球系统上至少接收一个工件，至少在运行期间建立驱动连接，太阳系和月球系统之间不间断。