公开(公告)号：US20080137047A1

公开(公告)日：2008-06-12

申请号：US12007240

申请日：2008-01-08

申请人： Takeyuki Mizutani ,  Masahiko Okumura ,  Hirotaka Kohno

发明人： Takeyuki Mizutani ,  Masahiko Okumura ,  Hirotaka Kohno

IPC分类号： G03B27/52

CPC分类号： G03F7/70716 ,  G03F7/70733 ,  G03F7/70925 ,  G03F7/70975

摘要： An exposure apparatus is provided with a first stage and a second stage. A maintenance apparatus carries out maintenance on the second stage during exposure processing of a wafer held on the first stage.

摘要翻译： 曝光装置具有第一阶段和第二阶段。 维护装置在保持在第一平台上的晶片的曝光处理期间在第二阶段进行维护。

公开(公告)号：US07982857B2

公开(公告)日：2011-07-19

申请号：US10582268

申请日：2004-12-15

申请人： Yasufumi Nishii ,  Kenichi Shiraishi ,  Hirotaka Kohno

发明人： Yasufumi Nishii ,  Kenichi Shiraishi ,  Hirotaka Kohno

IPC分类号： G03B27/58

CPC分类号： G03F7/70341

摘要： A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.

摘要翻译： 台架设备PST设置有保持器PH，其具有保持基板P的基板保持表面33A; 支撑并移动支架PH的台52; 以及回收装置60，其设置在保持器PH附近，并且其亲液部分3,5和5的至少一部分是亲液性的，其使用亲液部分3,5回收液体1.作为 结果，即使通过用液体填充投影光学系统和基板之间的空间进行曝光处理，也可以防止液体进入基板和保持器之间的空间。

公开(公告)号：US20110080574A1

公开(公告)日：2011-04-07

申请号：US12926763

申请日：2010-12-08

申请人： Yasufumi Nishii ,  Kenichi Shiraishi ,  Hirotaka Kohno

发明人： Yasufumi Nishii ,  Kenichi Shiraishi ,  Hirotaka Kohno

IPC分类号： G03B27/58

CPC分类号： G03F7/70341

摘要： A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.

摘要翻译： 台架设备PST设置有保持器PH，其具有保持基板P的基板保持表面33A; 支撑并移动支架PH的台52; 以及回收装置60，其设置在保持器PH附近，并且其亲液部分3,5和5的至少一部分是亲液性的，其使用亲液部分3,5回收液体1.作为 结果，即使通过用液体填充投影光学系统和基板之间的空间进行曝光处理，也可以防止液体进入基板和保持器之间的空间。

公开(公告)号：US20090015816A1

公开(公告)日：2009-01-15

申请号：US12232064

申请日：2008-09-10

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/58

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

公开(公告)号：US08208117B2

公开(公告)日：2012-06-26

申请号：US12232063

申请日：2008-09-10

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/54 ,  G03B27/60

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

摘要翻译： 曝光装置通过液体将图案图像投影到基板上来曝光基板。 曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。 至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

公开(公告)号：US20090015808A1

公开(公告)日：2009-01-15

申请号：US12232063

申请日：2008-09-10

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

摘要翻译： 曝光装置通过液体将图案图像投影到基板上来曝光基板。 曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。 至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

公开(公告)号：US09798245B2

公开(公告)日：2017-10-24

申请号：US12926763

申请日：2010-12-08

申请人： Yasufumi Nishii ,  Kenichi Shiraishi ,  Hirotaka Kohno

发明人： Yasufumi Nishii ,  Kenichi Shiraishi ,  Hirotaka Kohno

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.

公开(公告)号：US20060139614A1

公开(公告)日：2006-06-29

申请号：US11297324

申请日：2005-12-09

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/58

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

公开(公告)号：US08488099B2

公开(公告)日：2013-07-16

申请号：US11578719

申请日：2005-04-14

申请人： Hiroyuki Nagasaka ,  Hirotaka Kohno ,  Yasufumi Nishii

发明人： Hiroyuki Nagasaka ,  Hirotaka Kohno ,  Yasufumi Nishii

IPC分类号： G03B27/52 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70341 ,  G03F7/2041

摘要： An exposure apparatus is provided that performs well a liquid supply operation for forming a liquid immersion region and a liquid recovery operation to form a liquid immersion region in a desired state, thereby allowing high exposure accuracy and high measurement accuracy. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a liquid (LQ), and includes a liquid supply mechanism (10) that has a supply port (13) capable of supplying the liquid (LQ) substantially in parallel with a surface of the substrate (P).

摘要翻译： 提供一种曝光装置，其良好地进行用于形成液浸区域的液体供给操作和液体回收操作，以形成期望状态的液浸区域，从而允许高曝光精度和高测量精度。 曝光装置（EX）通过经由液体（LQ）将曝光光（EL）照射到基板（P）上而使基板（P）露出，并且包括具有供给口（13）的液体供给机构 基本上与衬底（P）的表面平行地供应液体（LQ）。

公开(公告)号：US20080018866A1

公开(公告)日：2008-01-24

申请号：US11578719

申请日：2005-04-14

申请人： Hiroyuki Nagasaka ,  Hirotaka Kohno ,  Yasufumi Nishii

发明人： Hiroyuki Nagasaka ,  Hirotaka Kohno ,  Yasufumi Nishii

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041

摘要： An exposure apparatus is provided that performs well a liquid supply operation for forming a liquid immersion region and a liquid recovery operation to form a liquid immersion region in a desired state, thereby allowing high exposure accuracy and high measurement accuracy. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a liquid (LQ), and includes a liquid supply mechanism (10) that has a supply port (13) capable of supplying the liquid (LQ) substantially in parallel with a surface of the substrate (P).

摘要翻译： 提供一种曝光装置，其良好地进行用于形成液浸区域的液体供给操作和液体回收操作，以形成期望状态的液浸区域，从而允许高曝光精度和高测量精度。 曝光装置（EX）通过经由液体（LQ）将曝光光（EL）照射到基板（P）上而使基板（P）露出，并且包括具有供给口（13）的液体供给机构 基本上与衬底（P）的表面平行地供应液体（LQ）。