公开(公告)号：US20120067522A1

公开(公告)日：2012-03-22

申请号：US13022232

申请日：2011-02-07

Applicant: Takahiro Shimomura ,  Yutaka Kudou ,  Masakazu Isozaki ,  Takashi Uemura

Inventor： Takahiro Shimomura ,  Yutaka Kudou ,  Masakazu Isozaki ,  Takashi Uemura

IPC: C23F1/08 ,  B05C13/00 ,  B05C11/00

CPC classification number: H01L21/67167 ,  H01L21/67109

Abstract: A vacuum processing apparatus having an atmospheric-pressure transport chamber for conveying samples, lock chambers that accommodate the samples conveyed in and have an ambient capable of being switched between an atmospheric ambient and a vacuum ambient, a vacuum transport chamber coupled to the lock chambers, and at least one vacuum chamber for processing the samples. The apparatus further includes cooling portions operable to cool the high-temperature samples processed by the vacuum chamber. Each cooling portion has: a sample stage over which the high-temperature samples are placed and which has a coolant channel; gas-blowing tubes disposed closer to the inlet/exit port and acting to blow gas toward the sample stage; and an exhaust port disposed on the opposite side of the sample stage with regard to the inlet/exit port and acting to discharge the gas blown from the gas-blowing tubes.

Abstract translation: 一种真空处理装置，具有用于输送样品的大气压输送室，容纳输送的样品的锁定室，以及能够在大气环境和真空环境之间切换的环境，耦合到锁定室的真空输送室， 以及用于处理样品的至少一个真空室。 该装置还包括可操作以冷却由真空室处理的高温样品的冷却部分。 每个冷却部分具有：样品台，高温样品放置在该样品台上，并具有冷却剂通道; 设置在入口/出口附近并用于向样品台吹气的气体吹送管; 以及排气口，其相对于入口/出口设置在样品台的相对侧上，并用于排出从气体吹送管吹出的气体。

公开(公告)号：US20070044916A1

公开(公告)日：2007-03-01

申请号：US11214951

申请日：2005-08-31

Applicant: Masakazu Isozaki ,  Seiichiro Kanno ,  Hideki Kihara ,  Hiroho Kitada

Inventor： Masakazu Isozaki ,  Seiichiro Kanno ,  Hideki Kihara ,  Hiroho Kitada

IPC: C23F1/00 ,  C23C16/00

CPC classification number: H01L21/6831 ,  C23C4/02 ,  C23C28/00 ,  C23C28/04 ,  H01J37/32431 ,  H01J2237/2001

Abstract: A ceramic film is formed by a spray method on a base material of an electrostatic attraction device. Electrode films for electrostatic attraction are formed by a spray method on a surface of the ceramic film. A ringular heater film is formed in a spray method between the electrode films in a radial direction of the electrode films. In addition, a ceramic film is formed by a spray method on upper surfaces of the electrode films and the heater film.

Abstract translation: 通过喷雾法在静电吸引装置的基材上形成陶瓷膜。 通过喷涂法在陶瓷膜的表面上形成用于静电吸引的电极膜。 在电极膜的电极膜的径向上以喷射方式形成环形加热器膜。 此外，通过喷涂法在电极膜和加热膜的上表面上形成陶瓷膜。

公开(公告)号：US5463444A

公开(公告)日：1995-10-31

申请号：US125654

申请日：1993-09-23

Applicant: Naoki Watanabe ,  Hirokazu Okutsu ,  Masakazu Isozaki ,  Kenji Inoue

Inventor： Naoki Watanabe ,  Hirokazu Okutsu ,  Masakazu Isozaki ,  Kenji Inoue

IPC: G03D13/00 ,  H05B3/00 ,  G03B27/32 ,  H05B1/00

CPC classification number: G03D13/002 ,  H05B3/0095

Abstract: A heat development processor includes a heat roller whose peripheral surface is heated to a predetermined temperature, the heat roller being adapted to transport in close contact therewith a heat-developable light-sensitive material with a latent image formed thereon, so as to heat develop the heat-developable light-sensitive material; and a backup roller disposed in face-to-face relation with the heat roller and having a gap between the same and the heat roller, the gap corresponding to or greater than the thickness of the heat-developable light-sensitive material. Since a gap is provided between the heat roller and the backup roller, a nipping force does not act between them, making it possible to squeeze out steam from between the heat-developable light-sensitive material and the peripheral surface of the heat roller.

Abstract translation: 热显影处理器包括加热辊，其加热到预定温度的加热辊，加热辊适于与其上形成有潜像的可热显影的感光材料紧密接触地输送，以便热显影 热显影光敏材料; 以及与所述加热辊面对面地配置并且在所述加热辊之间具有间隙的支承辊，所述间隙对应于或大于所述可热显影的感光材料的厚度。 由于在加热辊和支撑辊之间设置有间隙，因此夹紧力不会在它们之间起作用，从而可以从可热显影的感光材料和加热辊的周面之间挤出蒸汽。

公开(公告)号：US5337499A

公开(公告)日：1994-08-16

申请号：US984487

申请日：1992-12-02

Applicant: Masakazu Isozaki

Inventor： Masakazu Isozaki

IPC: F26B13/18 ,  G03D15/02 ,  F26B19/00

CPC classification number: F26B13/183 ,  G03D15/022

Abstract: A drier apparatus for drying sheets of photosensitive material processed with processing solutions while the photosensitive material is being transported. Rollers are provided along a transport passage for transporting the photosensitive material, and the rollers transport the photosensitive material and dry the photosensitive material by heating. The rollers are heated by heaters, respectively. The surface temperature of each roller is detected by a temperature detector, and a controller controls the heaters in such a manner that the range of fluctuation of the surface temperature of each roller falls within a predetermined range of values on the basis of the change with time of the detected surface temperatures of the rollers.

Abstract translation: 一种干燥装置，用于在感光材料被运送时干燥处理溶液的感光材料片材。 滚筒沿传送通道设置，用于传送感光材料，辊子传送感光材料并通过加热干燥感光材料。 滚筒分别由加热器加热。 每个辊的表面温度由温度检测器检测，并且控制器以这样的方式控制加热器，使得每个辊的表面温度的波动范围基于随时间的变化落在预定值范围内 检测辊的表面温度。

公开(公告)号：US08100620B2

公开(公告)日：2012-01-24

申请号：US12203168

申请日：2008-09-03

Applicant: Masakazu Isozaki ,  Akitaka Makino ,  Shingo Kimura ,  Minoru Yatomi

Inventor： Masakazu Isozaki ,  Akitaka Makino ,  Shingo Kimura ,  Minoru Yatomi

IPC: H01L21/677

CPC classification number: H01L21/6719 ,  H01L21/67017 ,  H01L21/67196

Abstract: A vacuum processing apparatus includes vacuum processing vessels each having a processing chamber with a pressure-reduced interior space, a vacuum transfer vessel which is coupled to the vacuum vessels disposed therearound and which has a low-pressure interior space in which a to-be-processed workpiece is conveyed, an atmospheric air transfer vessel which is coupled to the front side of the vacuum transfer vessel and which includes on its front face side cassette tables mounting thereon a cassette with the workpiece received therein for conveying the workpiece in an interior space under an atmospheric pressure, a position-aligning machine disposed within the atmospheric air transfer vessel at one of right and left ends for adjusting a position of the workpiece, and an adjuster disposed between lower part of this machine and a floor face for adjusting the supply of a fluid being fed to the vacuum processing vessels.

Abstract translation: 真空处理装置包括各自具有具有减压内部空间的处理室的真空处理容器，耦合到设置在其周围的真空容器并具有低压内部空间的真空转移容器， 被输送的处理过的工件;大气转移容器，其连接到真空传送容器的前侧，并且其前表面上包括安装在其上的工作台，其中工件被接收在其中，用于将工件传送到内部空间中 大气压力的位置调整机构，位于左右两端之一的大气输送容器内，用于调整工件的位置;以及调节器，其设置在该机器的下部与底面之间， 流体被供给到真空处理容器。

公开(公告)号：US20120067521A1

公开(公告)日：2012-03-22

申请号：US12968357

申请日：2010-12-15

Applicant: Takahiro SHIMOMURA ,  Yutaka Kudou ,  Takashi Uemura ,  Masakazu Isozaki

Inventor： Takahiro SHIMOMURA ,  Yutaka Kudou ,  Takashi Uemura ,  Masakazu Isozaki

IPC: H01L21/3065 ,  C23C16/458

CPC classification number: H01L21/67109 ,  H01L21/67178

Abstract: A vacuum processing system including a cassette holder for setting up cassettes in which samples are stored, an air-transfer chamber for transferring the samples, lock chambers for storing the samples transferred from the air-transfer chamber, the lock chambers being capable of switching between air atmosphere and vacuum atmosphere in their inside, a vacuum transfer chamber connected to the lock chambers, vacuum containers for processing the samples transferred via the vacuum transfer chamber, a cooling chamber for cooling the samples down to a first temperature, the samples being processed in at least one of the vacuum containers, and a cooling unit for cooling the samples down to a second temperature, the samples being cooled in the cooling chamber. The cooling unit is deployed in the air transfer chamber, and has a cooling part for cooling the samples, being cooled in the cooling chamber, down to the second temperature.

Abstract translation: 一种真空处理系统，包括用于设置其中存储样品的盒的盒保持器，用于传送样品的空气传送室，用于存储从空气传送室传送的样品的锁定室，能够在 空气气氛和真空气氛，连接到锁定室的真空传送室，用于处理通过真空传送室传送的样品的真空容器，用于将样品冷却至第一温度的冷却室，将样品加工成 至少一个真空容器和用于将样品冷却至第二温度的冷却单元，样品在冷却室中被冷却。 冷却单元布置在空气传送室中，并且具有冷却部件，用于冷却样品，在冷却室中冷却至第二温度。

公开(公告)号：US20100163185A1

公开(公告)日：2010-07-01

申请号：US12379642

申请日：2009-02-26

Applicant: Michiaki Kobayashi ,  Tsutomu Nakamura ,  Koji Okuda ,  Masakazu Isozaki

Inventor： Michiaki Kobayashi ,  Tsutomu Nakamura ,  Koji Okuda ,  Masakazu Isozaki

IPC: H01L21/3065

CPC classification number: H01L21/67196

Abstract: A vacuum processing apparatus which includes a vacuum vessel having a processing chamber provided therein into which a processing gas is supplied to form a plasma and which processes a wafer located in the processing chamber, and a vacuum transfer vessel having a vacuumed transfer chamber coupled with the vacuum vessel provided therein into which the wafer is transferred. A resin-made film having a plasma resistance is bonded onto a surface of a lid of the vacuum transfer vessel on the side of the transfer chamber.

Abstract translation: 一种真空处理装置，其特征在于，具备：设置有处理室的真空容器，在所述真空容器内设置处理气体，形成等离子体，处理位于所述处理室内的晶片;以及真空转移容器， 其中设置有晶片被转移到其中的真空容器。 将具有耐等离子体电阻的树脂膜粘合到转印室一侧的真空转印容器的盖的表面上。

公开(公告)号：US20090165952A1

公开(公告)日：2009-07-02

申请号：US12039994

申请日：2008-02-29

Applicant: Susumu Tauchi ,  Shingo Kimura ,  Minoru Yatomi ,  Masakazu Isozaki ,  Akitaka Makino

Inventor： Susumu Tauchi ,  Shingo Kimura ,  Minoru Yatomi ,  Masakazu Isozaki ,  Akitaka Makino

IPC: H01L21/306

CPC classification number: H01L21/6719

Abstract: The invention provides a semiconductor manufacturing apparatus having a high productivity per installed area. In a vacuum processing apparatus provided with a plurality of cassettes on which a cassette is stored, a vacuum feed chamber arranged in a back face side of the atmospheric air feed chamber in a state of being coupled thereto, having a polygonal plane shape and structured such that the wafer is fed in a depressurized inner portion, and a plurality of vacuum processing chambers detachably coupled to a side surface of the vacuum feed chamber, arranged in adjacent thereto and processing the wafer fed to an inner portion from the vacuum feed chamber, a plurality of vacuum processing apparatuses includes a plurality of etching processing chamber carrying out an etching process of the wafer and at least one ashing processing chamber carrying out an ashing process of the wafer, the ashing processing chamber is coupled to a side surface in one of right and left sides as seen from the front face of the vacuum feed chamber, and the atmospheric air feed chamber is arranged so as to be biased to the one side to which the ashing processing chamber is coupled.

Abstract translation: 本发明提供了一种具有每个安装面积的高生产率的半导体制造装置。 在设置有多个盒体的真空处理装置中，盒子被存储在该真空处理装置上，一个真空进料腔室被布置在大气供给室的背面侧，处于与之相连的状态，具有多边形平面形状并被构造 晶片被供给到减压内部，以及可拆卸地联接到真空进料室的侧表面的多个真空处理室，与真空进料室相邻布置并处理从真空进料室供给到内部的晶片， 多个真空处理装置包括执行晶片的蚀刻处理的多个蚀刻处理室和进行晶片的灰化处理的至少一个灰化处理室，灰化处理室与右侧的一个侧面 以及从真空进料室的前表面看到的左侧，大气供给室被布置成被偏压到t 灰色处理室与其相连的一侧。

公开(公告)号：USD557226S1

公开(公告)日：2007-12-11

申请号：US29236981

申请日：2005-08-25

Applicant: Takeo Uchino ,  Hiroyuki Shichida ,  Masakazu Isozaki ,  Tsunehiko Tsubone ,  Akitaka Makino

Designer： Takeo Uchino ,  Hiroyuki Shichida ,  Masakazu Isozaki ,  Tsunehiko Tsubone ,  Akitaka Makino

公开(公告)号：US20140044502A1

公开(公告)日：2014-02-13

申请号：US13606109

申请日：2012-09-07

Applicant: Takashi UEMURA ,  Hideaki Kondo ,  Masakazu Isozaki ,  Takahiro Shimomura

Inventor： Takashi UEMURA ,  Hideaki Kondo ,  Masakazu Isozaki ,  Takahiro Shimomura

IPC: H01L21/677

CPC classification number: H01L21/67745

Abstract: In a vacuum processing apparatus including a plurality of vacuum transfer vessels arranged back and forth at the back of a lock chamber, an intermediate chamber arranged between them and capable of accommodating wafers, and processing units connected to respective vacuum transfer vessels, a wafer processed in a pre-processing vessel out of the processing units connected to the respective vacuum transfer vessels is transferred to a post-processing vessel connected to the same vacuum transfer vessel and post-processing is performed.

Abstract translation: 在包括在锁室后部布置的多个真空传送容器的真空处理设备中，布置在它们之间并能够容纳晶片的中间室以及连接到各个真空传送容器的处理单元， 连接到相应的真空转移容器的处理单元中的预处理容器被转移到连接到相同的真空转移容器的后处理容器中，并进行后处理。