摘要:
Disclosed is an image processing apparatus composed in a hierarchical architecture of a hardware resource, a first control program over the hardware resource, a second control program and an application program over the first control program. The first control program includes a first API for receiving a first request relating to image processing from the second control program and a second request relating to image processing from the application program, and controls, on receiving either of the first and second requests, the hardware resource to perform image processing based on the received request. The second control program includes a second API publicly released in advance for receiving a third request relating to image processing from an external source, converts the received third request to a command supported by the first API, and passes the command as the first request to the first control program.
摘要:
An MFP (A) on a document transmission side transmits a document to an MFP (B) on a document reception side. The MFP (A) stores the transmitted document. The MFP (A) acquires a status of the transmitted document from the MFP (B). If the MFP (B) deletes the document in an unread state, the MFP (A) retransmits the stored document to the MFP (B).
摘要:
A multifunction peripheral that can set appropriate criteria of security levels for another device, and improves usability while lowering a risk of data alteration, information leakage and the like by including a holding part 11 holding therein security criteria set for the image processing functions in one-to-one correspondence; a receiver 12 that receives, from an external terminal, a request for an access that is necessary for executing at least one of the image processing functions; an acquisition part 13 that acquires, from the external terminal, security information that is a security indicator regarding the access from the external terminal; a judgment part 15 that judges whether or not one of the security criteria set for the at least one of the image processing functions is met, based on the acquired security information; an access controller 16 that permits the access if the judgment part 15 judges affirmatively, and prohibits the access or permit the access with a limitation if the judgment part 15 judges negatively; and an execution part 19 that executes the at least one of the image processing functions, if the access controller permits the access.
摘要:
The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.
摘要:
(OBJECT) The object is to provide a lightened semiconductor device and a manufacturing method thereof by pasting a layer to be peeled to various base materials.(MEANS FOR SOLVING THE PROBLEM) In the present invention, a layer to be peeled is formed on a substrate, then a seal substrate provided with an etching stopper film is pasted with a binding material on the layer to be peeled, followed by removing only the seal substrate by etching or polishing. The remaining etching stopper film is functioned as a blocking film. In addition, a magnet sheet may be pasted as a pasting member.
摘要:
The invention provides an evaporation apparatus, which is able to improve an efficiency of evaporation materials, uniformity of deposited films, and throughput of the evaporation process. Disclosed is an evaporation source holder, which is installed in an evaporation chamber and configured to hold an evaporation material, and a moving mechanism, which is configured to move the evaporation source holder during evaporation of the evaporation material. The evaporation apparatus is further characterized by a shutter over the evaporation source holder, a filter over the shutter, and a heater surrounding the filter.
摘要:
Disclosed is a compound represented by the following general formula (1), wherein, in the formula, M1 represents Sb or Bi; X1 and X2 each independently represent a sulfur atom or an oxygen atom; R1 represents a divalent organic group; Y1 represents a monovalent inorganic or organic group; a represents a number of 1 or 2; b represents a number of 0 or an integer of not less than 1; c represents an integer of not less than 1 and not more than d; d represents a valence of M1; when d−c is not less than 2, a plurality of Y1s each independently represent a monovalent inorganic or organic group and may be bonded to each other to form an M1-containing ring; and e represents a number of 0 or an integer of not less than 1.
摘要:
The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.
摘要:
To provide a light emitting device high in reliability with a pixel portion having high definition with a large screen. According to a light emitting device of the present invention, on an insulator (24) provided between pixel electrodes, an auxiliary electrode (21) made of a metal film is formed, whereby a conductive layer (20) made of a transparent conductive film in contact with the auxiliary electrode can be made low in resistance and thin. Also, the auxiliary electrode (21) is used to achieve connection with an electrode on a lower layer, whereby the electrode can be led out with the transparent conductive film formed on an EL layer. Further, a protective film (32) made of a film containing hydrogen and a silicon nitride film which are laminated is formed, whereby high reliability can be achieved.
摘要:
An image forming apparatus is provided with an attribution information obtaining portion for obtaining application module list information on a function that resides in another image forming apparatus when the image forming apparatus is connected to the other image forming apparatus via a communication line, an unequipped function determining portion for determining whether or not the other image forming apparatus has a predetermined function that resides in the image forming apparatus based on the obtained application module list information of the other image forming apparatus, and a function expansion commanding portion for instructing the other image forming apparatus to perform a function expansion process to provide the other image forming apparatus with the predetermined function when the other image forming apparatus does not have the predetermined function.