Patent search ap:"Mathieus Anna Karel Van Lierop" Page 1

1.

发明授权
Lithographic apparatus and device manufacturing method 有权
Title translation: 平版印刷设备和器件制造方法

公开(公告)号：US08634053B2

公开(公告)日：2014-01-21

申请号：US11987569

申请日：2007-11-30

Applicant: Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete

Inventor： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete

IPC: G03B27/52

CPC classification number: G03F7/70866 , G03F7/70341

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Abstract translation: 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。弯液面钉扎特征包括以多边形形式布置的多个分立出口。

2.

发明申请
Lithographic apparatus and device manufacturing method 失效
Title translation: 平版印刷设备和器件制造方法

公开(公告)号：US20090073395A1

公开(公告)日：2009-03-19

申请号：US11898637

申请日：2007-09-13

Applicant: Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Spruytenburg , Joris Johan Verstraete

Inventor： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Spruytenburg , Joris Johan Verstraete

IPC: G03B27/52

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

Abstract translation: 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。