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公开(公告)号：US08681308B2
公开(公告)日：2014-03-25
申请号：US11898637
申请日：2007-09-13
申请人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。
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公开(公告)号：US20090073395A1
公开(公告)日：2009-03-19
申请号：US11898637
申请日：2007-09-13
申请人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Spruytenburg , Joris Johan Verstraete
发明人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Spruytenburg , Joris Johan Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。
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公开(公告)号：US08860924B2
公开(公告)日：2014-10-14
申请号：US13589841
申请日：2012-08-20
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
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公开(公告)号：US08248577B2
公开(公告)日：2012-08-21
申请号：US11120186
申请日：2005-05-03
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
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5.发明授权公开(公告)号：US08823919B2
公开(公告)日：2014-09-02
申请号：US12946566
申请日：2010-11-15
申请人： Nina Vladimirovna Dziomkina , Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Vijay Kumar Badam , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf
发明人： Nina Vladimirovna Dziomkina , Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Vijay Kumar Badam , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf
CPC分类号： G03F7/70916 , B32B2307/71 , B32B2307/73 , B32B2405/00 , C09J7/385 , G03F7/70341 , G03F7/7095 , Y10T428/28 , Y10T428/2843 , Y10T428/2848 , Y10T428/2852
摘要： A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
摘要翻译： 提供一个构件以防止浸入液体进入部件之间的间隙或粘附到至少一个部件以提供浸入系统特征的表面。 该部件具有粘附到部件上的塑料密封部分。 塑料密封部分对于DUV辐射是不透明的。 它可能通过暴露于DUV辐射来抵抗降解。 它可能具有液体恐怖涂层或性质。
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6.发明授权公开(公告)号：US08659741B2
公开(公告)日：2014-02-25
申请号：US12946618
申请日：2010-11-15
申请人： Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Nina Vladimirovna Dziomkina , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf , Vijay Kumar Badam
发明人： Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Nina Vladimirovna Dziomkina , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf , Vijay Kumar Badam
CPC分类号： C09J7/0217 , B32B2307/546 , B32B2307/56 , B32B2307/71 , B32B2307/73 , B32B2405/00 , C09J7/21 , C09J7/385 , G03F7/70341 , G03F7/70808 , G03F7/70916 , G03F7/7095 , Y10T428/28 , Y10T428/2843 , Y10T428/2848 , Y10T428/2852
摘要： A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
摘要翻译： 提供密封构件以防止浸入液体进入部件之间的间隙。 密封构件具有粘附到形成被密封的间隙的部件的塑料或聚合物密封部分。 密封构件被构造成减少被密封的部件之间的力耦合，特别是与时间有关的力耦合。
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7.发明申请公开(公告)号：US20110116060A1
公开(公告)日：2011-05-19
申请号：US12946566
申请日：2010-11-15
申请人： Nina Vladimirovna Dziomkina , Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Vijay Kumar Badam , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf
发明人： Nina Vladimirovna Dziomkina , Roelof Frederik De Graaf , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Vijay Kumar Badam , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf
CPC分类号： G03F7/70916 , B32B2307/71 , B32B2307/73 , B32B2405/00 , C09J7/385 , G03F7/70341 , G03F7/7095 , Y10T428/28 , Y10T428/2843 , Y10T428/2848 , Y10T428/2852
摘要： A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
摘要翻译： 提供一个构件以防止浸入液体进入部件之间的间隙或粘附到至少一个部件以提供浸入系统特征的表面。 该部件具有粘附到部件上的塑料密封部分。 塑料密封部分对于DUV辐射是不透明的。 它可能通过暴露于DUV辐射来抵抗降解。 它可能具有液体恐怖涂层或性质。
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8.发明授权Methods relating to immersion lithography and an immersion lithographic apparatus 有权涉及浸没式光刻和浸没式光刻设备的方法公开(公告)号：US08587762B2
公开(公告)日：2013-11-19
申请号：US12237557
申请日：2008-09-25
申请人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
发明人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
CPC分类号： G03F7/70916 , G03F7/70341
摘要： A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.
摘要翻译： 公开了一种操作浸没式光刻设备的流体限制系统的方法。 液体限制系统的性能以几种不同的方式测量。 基于性能测量的结果，产生指示例如可能需要采取补救措施的信号。
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9.发明申请METHODS RELATING TO IMMERSION LITHOGRAPHY AND AN IMMERSION LITHOGRAPHIC APPARATUS 有权与倾斜光刻相关的方法和静态光刻设备公开(公告)号：US20090086175A1
公开(公告)日：2009-04-02
申请号：US12237557
申请日：2008-09-25
申请人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
发明人： Bob Streefkerk , Roelof Frederik De Graaf , Johannes Catharinus Hubertus Mulkens , Marcel Beckers , Paul Petrus Joannes Berkvens , David Lucien Anstotz
CPC分类号： G03F7/70916 , G03F7/70341
摘要： A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.
摘要翻译： 公开了一种操作浸没式光刻设备的流体限制系统的方法。 液体限制系统的性能以几种不同的方式测量。 基于性能测量的结果，产生指示例如可能需要采取补救措施的信号。
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公开(公告)号：US07928407B2
公开(公告)日：2011-04-19
申请号：US11603228
申请日：2006-11-22
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G21K5/10
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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