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公开(公告)号：US20080212046A1
公开(公告)日：2008-09-04
申请号：US11987569
申请日：2007-11-30
申请人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Josef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Josef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
摘要翻译： 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。
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公开(公告)号：US08634053B2
公开(公告)日：2014-01-21
申请号：US11987569
申请日：2007-11-30
申请人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
摘要翻译： 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。
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公开(公告)号：US08681308B2
公开(公告)日：2014-03-25
申请号：US11898637
申请日：2007-09-13
申请人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。
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4.发明申请FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权流体处理结构，平面设备和设备制造方法公开(公告)号：US20110005603A1
公开(公告)日：2011-01-13
申请号：US12820991
申请日：2010-06-22
申请人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendricus Martinus Johannes Bloks
发明人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendricus Martinus Johannes Bloks
IPC分类号： F03B11/00
CPC分类号： H01L21/6715 , Y10T137/0318 , Y10T137/8593
摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。
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5.发明授权Fluid handling structure, lithographic apparatus and device manufacturing method 有权流体处理结构，光刻设备和器件制造方法公开(公告)号：US08472003B2
公开(公告)日：2013-06-25
申请号：US12820991
申请日：2010-06-22
申请人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Geradus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendrikus Martinus Johannes Bloks
发明人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul Petrus Joannes Berkvens , Gert-Jan Geradus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Matheus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Ruud Hendrikus Martinus Johannes Bloks
CPC分类号： H01L21/6715 , Y10T137/0318 , Y10T137/8593
摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。
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公开(公告)号：US20090073395A1
公开(公告)日：2009-03-19
申请号：US11898637
申请日：2007-09-13
申请人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Spruytenburg , Joris Johan Verstraete
发明人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Spruytenburg , Joris Johan Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。
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公开(公告)号：US08259283B2
公开(公告)日：2012-09-04
申请号：US12408392
申请日：2009-03-20
申请人： Daniël Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
发明人： Daniël Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
摘要翻译： 描述了一种浸没式光刻设备，其中液滴去除装置从基板去除液滴。 在曝光期间，使用来自气刀的倾斜流动的气体。
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公开(公告)号：US20090237632A1
公开(公告)日：2009-09-24
申请号：US12408392
申请日：2009-03-20
申请人： Daniel Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
发明人： Daniel Jozef Maria Direcks , Nicolaas Rudolf Kemper , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Danny Maria Hubertus Philips , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Marcus Johannes Van Der Zanden , Pieter Mulder
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
摘要翻译： 描述了一种浸没式光刻设备，其中液滴去除装置从基板去除液滴。 在曝光期间，使用来自气刀的倾斜流动的气体。
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公开(公告)号：US20080316441A1
公开(公告)日：2008-12-25
申请号：US11812507
申请日：2007-06-19
申请人： Paulus Martinus Maria Liebregts , Menno Fien , Erik Roelof Loopstra , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens
发明人： Paulus Martinus Maria Liebregts , Menno Fien , Erik Roelof Loopstra , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens
IPC分类号： G03B27/42
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/70866 , G03F7/70975 , G03F7/70983
摘要： A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.
摘要翻译： 公开了一种光刻设备，其具有在设备的至少一部分上承载涂层的可移除的粘合剂膜。 在一个实施例中，公开了一种液体供应系统，其具有沿着投影系统和基板支撑件之间的空间的边界的至少一部分的边界延伸的液体限制结构，其中承载涂层的膜位于液体限制的至少一部分 结构体。
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10.发明授权公开(公告)号：US07561250B2
公开(公告)日：2009-07-14
申请号：US11812507
申请日：2007-06-19
申请人： Paulus Martinus Maria Liebregts , Menno Fien , Erik Roelof Loopstra , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens
发明人： Paulus Martinus Maria Liebregts , Menno Fien , Erik Roelof Loopstra , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/70866 , G03F7/70975 , G03F7/70983
摘要： A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.
摘要翻译： 公开了一种光刻设备，其具有在设备的至少一部分上承载涂层的可移除的粘合剂膜。 在一个实施例中，公开了一种液体供应系统，其具有沿着投影系统和基板支撑件之间的空间的边界的至少一部分的边界延伸的液体限制结构，其中承载涂层的膜位于液体限制的至少一部分 结构体。
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