公开(公告)号：US20090073395A1

公开(公告)日：2009-03-19

申请号：US11898637

申请日：2007-09-13

申请人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Spruytenburg ,  Joris Johan Verstraete

发明人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Spruytenburg ,  Joris Johan Verstraete

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。

公开(公告)号：US20070242245A1

公开(公告)日：2007-10-18

申请号：US11730749

申请日：2007-04-03

申请人： Maurice Wijckmans ,  Martinus Agnes Cuijpers ,  Martinus Hendrikus Leenders ,  Frits Van Der Meulen ,  Joost Ottens ,  Theodorus Cadee ,  Frederik De Jong ,  Wilhelmus Franciscus Simons ,  Edwin Augustinus Van Gompel ,  Martin Smeets ,  Rob Jansen ,  Gerardus Adrianus Kusters ,  Martijn Van Baren

发明人： Maurice Wijckmans ,  Martinus Agnes Cuijpers ,  Martinus Hendrikus Leenders ,  Frits Van Der Meulen ,  Joost Ottens ,  Theodorus Cadee ,  Frederik De Jong ,  Wilhelmus Franciscus Simons ,  Edwin Augustinus Van Gompel ,  Martin Smeets ,  Rob Jansen ,  Gerardus Adrianus Kusters ,  Martijn Van Baren

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

摘要翻译： 公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。

公开(公告)号：US20050285550A1

公开(公告)日：2005-12-29

申请号：US10874691

申请日：2004-06-24

申请人： Wilhelmus Franciscus Simons ,  Henrikus Herman Cox ,  Sven Antoin Hol

发明人： Wilhelmus Franciscus Simons ,  Henrikus Herman Cox ,  Sven Antoin Hol

IPC分类号： G03F7/20 ,  H02K41/00 ,  H02K41/03 ,  H02P1/00

CPC分类号： G03F7/70758 ,  G03F7/70725 ,  H02K41/03 ,  H02K2201/18 ,  H02P25/06 ,  Y10S414/135

摘要： A planar motor is controlled by supplying a three-phase alternating current to a coil assembly. Each phase is supplied to one of three coils. The coils are positioned in a magnetic field generated by a magnet plate having alternating magnet poles at its surface for generating an alternating magnetic field. In operation, the phase of each current flowing through each coil determines the direction of a force generated due to the current in the magnetic field. For correct operation, the phase angle of each current is to be adapted to the local direction of the magnetic field by determining a commutation-offset angle. The commutation-offset angle is determined by generating a force in an unknown direction and varying the commutation-angle, and determining when the generated force is directed perpendicular to the magnet plate, while ensuring that the generated force does not exceed a horizontal friction force. By determining a maximum compression of end stops of the coil assembly, or determining a maximum pressure, it may be determined when the generated force is directed perpendicular to the magnet plate.

摘要翻译： 通过向线圈组件提供三相交流电来控制平面电动机。 每相提供给三个线圈中的一个。 线圈位于由其表面上具有交替磁极的磁板产生的磁场中，用于产生交变磁场。 在操作中，流过每个线圈的每个电流的相位确定由于磁场中的电流而产生的力的方向。 为了正确的操作，通过确定换向偏移角度，每个电流的相位角将适应于磁场的局部方向。 通过产生未知方向的力并改变换向角来确定换向偏移角，并且确定所产生的力何时垂直于磁体板定向，同时确保所产生的力不超过水平摩擦力。 通过确定线圈组件的端部止动件的最大压缩或确定最大压力，可以确定何时生成的力垂直于磁体板定向。