Abstract:
A deflection member comprising a patterned framework having a web-side and a backside opposite to the web-side and forming an X-Y plane. The framework comprises a plurality of bases extending from the X-Y plane in a Z-direction perpendicular to the X-Y plane, and a plurality of suspended portions laterally extending from the plurality of bases to form void spaces between the X-Y plane and the suspended portions. The deflection member can comprise a reinforcing element joined to the plurality of bases and positioned between the web-side and at least a portion of the backside of the framework. A process for making the deflection member comprises curing a coating of a liquid photosensitive resin supported by a forming surface through a mask having a pattern of transparent and opaque regions. The opaque regions comprise regions having first opacity and regions having second opacity less than the first opacity. The transparent regions leave coating's areas corresponding thereto unshielded to allow said areas to cure through the entire thickness of the coating, thereby forming the bases. The opaque regions having the first opacity shield first areas of the coating to preclude curing thereof through the entire thickness of the coating. The opaque regions having the second opacity partially shield second areas of the coating to allow them to cure through a predetermined second thickness less than the entire thickness of the coating, thereby forming the suspended portions. The mask can have a gradient opacity that gradually changes in at least one direction to cause the coating to cure though a differential thickness. The mask can also have a three-dimensional topography pattern therein to imprint the coating.
Abstract:
An improved method for bonding webs. The method includes overlapping two webs, slitting the two webs, reoverlapping the two webs and bonding the two webs together. The steps of reoverlapping the two webs may be accomplished with a number of different types of devices including but not limited to: a bumpered roll, a notched roll, a crowned roll, a bowed roll, an out of plane roll, and variable speed rolls.
Abstract:
A process for making the mask can comprise providing a thin transparent material of substantially uniform thickness, forming a pattern of opaque regions on the material according to a first predetermined pattern, and embossing the material according to a second predetermined pattern.
Abstract:
A mask for use in a process for curing a photosensitive material. The mask comprises a structure having a top side and a bottom side opposite to the top side, and a pattern of transparent regions and opaque regions, wherein the opaque regions comprise at least first opaque regions having a first opacity and second opaque regions having a second opacity different from the first opacity. The opaque regions can comprise a substantially continuous pattern, a substantially semi-continuous pattern, a pattern formed by a plurality of discrete areas, or any combination thereof. The opaque regions can comprise a gradient opacity that gradually changes in at least one direction. The mask can have a three-dimensional topography comprising, for example, a pattern of protrusions extending from the bottom side of the mask and/or the top side of the mask. The protrusions can form a substantially continuous pattern, a substantially semi-continuous pattern, a discrete pattern, or any combination thereof. The pattern of protrusions can correlate with the pattern of transparent and opaque regions to form a combined non-random and repeating pattern. The mask can comprise a composite structure, wherein the pattern of transparent and opaque regions can be independent and separable from the pattern of protrusions. A process for making the mask can comprise providing a thin transparent material of substantially uniform thickness, forming a pattern of opaque regions on the material according to a first predetermined pattern, and embossing the material according to a second predetermined pattern.