Deflection member having suspended portions and process for making same
    1.
    发明授权
    Deflection member having suspended portions and process for making same 失效
    具有悬挂部分的偏转构件及其制造方法

    公开(公告)号:US06576090B1

    公开(公告)日:2003-06-10

    申请号:US09694915

    申请日:2000-10-24

    Abstract: A deflection member comprising a patterned framework having a web-side and a backside opposite to the web-side and forming an X-Y plane. The framework comprises a plurality of bases extending from the X-Y plane in a Z-direction perpendicular to the X-Y plane, and a plurality of suspended portions laterally extending from the plurality of bases to form void spaces between the X-Y plane and the suspended portions. The deflection member can comprise a reinforcing element joined to the plurality of bases and positioned between the web-side and at least a portion of the backside of the framework. A process for making the deflection member comprises curing a coating of a liquid photosensitive resin supported by a forming surface through a mask having a pattern of transparent and opaque regions. The opaque regions comprise regions having first opacity and regions having second opacity less than the first opacity. The transparent regions leave coating's areas corresponding thereto unshielded to allow said areas to cure through the entire thickness of the coating, thereby forming the bases. The opaque regions having the first opacity shield first areas of the coating to preclude curing thereof through the entire thickness of the coating. The opaque regions having the second opacity partially shield second areas of the coating to allow them to cure through a predetermined second thickness less than the entire thickness of the coating, thereby forming the suspended portions. The mask can have a gradient opacity that gradually changes in at least one direction to cause the coating to cure though a differential thickness. The mask can also have a three-dimensional topography pattern therein to imprint the coating.

    Abstract translation: 偏转构件包括具有腹板侧和与腹板侧相对的背面并形成X-Y平面的图案化框架。 该框架包括从X-Y平面沿垂直于X-Y平面的Z方向延伸的多个基体以及从多个基部横向延伸的多个悬置部分,以在X-Y平面和悬挂部分之间形成空隙。 所述偏转构件可以包括加强元件,所述加强元件连接到所述多个基座并且定位在所述腹板侧和所述框架的所述背侧的至少一部分之间。 制造偏转构件的方法包括通过具有透明和不透明区域的图案的掩模固化由成形表面支撑的液体感光性树脂的涂层。 不透明区域包括具有第一不透明度的区域和具有小于第一不透明度的第二不透明度的区域。 透明区域使涂层相对应的区域不被屏蔽,从而允许所述区域通过涂层的整个厚度固化,从而形成基底。 具有第一不透明度的不透明区域屏蔽涂层的第一区域,以排除其在涂层的整个厚度上的固化。 具有第二不透明度的不透明区域部分地屏蔽涂层的第二区域,以允许它们通过小于涂层的整个厚度的预定的第二厚度固化,从而形成悬浮部分。 掩模可以具有在至少一个方向上逐渐变化的梯度不透明度,以使涂层通过不同的厚度固化。 掩模也可以具有其中的三维形貌图案以印刷涂层。

    Mask for differential curing and process for making same
    4.
    发明授权
    Mask for differential curing and process for making same 有权
    差异固化面膜及其制造方法

    公开(公告)号:US06743571B1

    公开(公告)日:2004-06-01

    申请号:US09695155

    申请日:2000-10-24

    CPC classification number: G03F7/12 D21F11/006

    Abstract: A mask for use in a process for curing a photosensitive material. The mask comprises a structure having a top side and a bottom side opposite to the top side, and a pattern of transparent regions and opaque regions, wherein the opaque regions comprise at least first opaque regions having a first opacity and second opaque regions having a second opacity different from the first opacity. The opaque regions can comprise a substantially continuous pattern, a substantially semi-continuous pattern, a pattern formed by a plurality of discrete areas, or any combination thereof. The opaque regions can comprise a gradient opacity that gradually changes in at least one direction. The mask can have a three-dimensional topography comprising, for example, a pattern of protrusions extending from the bottom side of the mask and/or the top side of the mask. The protrusions can form a substantially continuous pattern, a substantially semi-continuous pattern, a discrete pattern, or any combination thereof. The pattern of protrusions can correlate with the pattern of transparent and opaque regions to form a combined non-random and repeating pattern. The mask can comprise a composite structure, wherein the pattern of transparent and opaque regions can be independent and separable from the pattern of protrusions. A process for making the mask can comprise providing a thin transparent material of substantially uniform thickness, forming a pattern of opaque regions on the material according to a first predetermined pattern, and embossing the material according to a second predetermined pattern.

    Abstract translation: 用于固化感光材料的方法中的掩模。 掩模包括具有与顶侧相反的顶侧和底侧的结构,以及透明区域和不透明区域的图案,其中不透明区域包括具有第一不透明度的至少第一不透明区域和具有第二不透明区域的第二不透明区域 不透明度与第一不透明度不同。 不透明区域可以包括基本上连续的图案,基本上半连续的图案,由多个离散区域形成的图案,或其任何组合。 不透明区域可以包括在至少一个方向上逐渐变化的梯度不透明度。 掩模可以具有三维形貌,其包括例如从掩模的底侧和/或掩模的顶侧延伸的突起图案。 突起可以形成基本连续的图案,基本上半连续的图案,离散图案或其任何组合。 突起的图案可以与透明和不透明区域的图案相关联,以形成非随机和重复组合的组合。 掩模可以包括复合结构,其中透明和不透明区域的图案可以是独立的并且可以与突起图案分离。 制造掩模的方法可以包括提供基本均匀厚度的薄透明材料,根据第一预定图案在材料上形成不透明区域的图案,并根据第二预定图案压印材料。

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